Substrate processing apparatus having cooling member

Patent metadata

Field	Value
Publication number	US-10679845-B2
Application number	US-201715443306-A
Country	US
Kind code	B2
Filing date	Feb 27, 2017
Priority date	Mar 3, 2016
Publication date	Jun 9, 2020
Grant date	Jun 9, 2020

Abstract

Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a container body, and a holding member that conveys the substrate from an outside of the container body into the container body and holds the substrate inside the container body during the processing. A substrate support pin supporting a wafer and a cooling plate cooling the holding member are provided outside the container body.

First claim

What is claimed is:

1. A substrate processing apparatus comprising:
a container body in which a processing is performed on a substrate;
a substrate holder that conveys the substrate from an outside of the container body into the container body and holds the substrate inside the container body during the processing;
a first lift table positioned outside the container body having a plurality of cooling member support pins extending therefrom and supporting a cooling member including a cooling plate configured to cool the substrate holder and the substrate;
a second lift table positioned outside the container body that supports a plurality of substrate support pins extending upwardly from the second lift table, the plurality of substrate support pins configured to directly support the substrate;
a base that supports the first lift table and the second lift table; and
a stationary vertical guide having a first end fixed to the base and a second end opposite the first end that extends vertically from the base,
wherein the first lift table is configured to move the plurality of cooling member support pins up and down relative to the plurality of substrate support pins and the second lift table, the second lift table is configured to move the plurality of substrate support pins up and down relative to the plurality of cooling member support pins and the first lift table, and both the first lift table and the second lift table are configured to move up and down along the stationary vertical guide, and
wherein the second end of the stationary vertical guide is positioned vertically above the first lift table and the second lift table.

2. The substrate processing apparatus of claim 1 , wherein the cooling member is configured to be moved up by the first lift table to contact the substrate holder and thereby cool the substrate holder by being in direct contact with the substrate holder.

3. The substrate processing apparatus of claim 2 , wherein the cooling member includes a buffer material positioned on a top surface of the cooling plate, the buffer material having an elasticity such that an impact between the cooling member and the substrate holder, when the cooling member is moved upward by the first lift table to directly contact the substrate holder, is relieved.

4. The substrate processing apparatus of claim 1 , wherein each cooling member support pin supports the cooling plate via a spring.

5. The substrate processing apparatus of claim 1 , wherein the cooling plate includes a plurality of openings through which the substrate support pins extend thereby penetrating the cooling plate to support the substrate.

6. The substrate processing apparatus of claim 1 , wherein the container body is a substrate processing container for a supercritical processing.

7. The substrate processing apparatus of claim 1 , wherein the first lift table has a first opening therein, the second lift table has a second opening therein, and the stationary vertical guide extends through the first opening in the first lift table and the second opening in the second lift table.

8. A substrate processing method comprising:
providing a substrate processing apparatus that includes: a container body in which a processing is performed on a substrate; a substrate holder that conveys the substrate from an outside of the container body into the container body and holds the substrate inside the container body during the processing; a first lift table positioned outside the container body and having a plurality of cooling member support pins extending therefrom and supporting a cooling member including a cooling plate configured to cool the substrate holder and the substrate; and a second lift table positioned outside the container body supporting a plurality of substrate support pins that extend upwardly from the second lift table and configured to directly support the substrate;
conveying the substrate from the outside of the container body into the container body by the substrate holder;
performing a processing while holding the substrate inside the container body by the substrate holder;
cooling the substrate holder by discharging the substrate on the substrate holder outside the container body and operating the first lift table to move the plurality of cooling member support pins upward relative to the plurality of substrate support pins, and simultaneously causing the cooling member including the cooling plate to approach the substrate holder; and
placing a new substrate on the substrate holder,
wherein the first lift table is configured to move the plurality of cooling member support pins up and down relative to the plurality of substrate support pins and the second lift table, the second lift table is configured to move the plurality of substrate support pins up and down relative to the plurality of cooling member support pins and the first lift table, and both the first lift table and the second lift table are supported by a base and are each configured to move up and down along a stationary vertical guide having a first end fixed to the base and a second end opposite the first end extending vertically therefrom, and
wherein the second end of the stationary vertical guide is positioned vertically above the first lift table and the second lift table.

9. A non-transitory computer-readable storage medium storing a computer executable program that, when executed, causes a computer to control a substrate processing method including:
providing a substrate processing apparatus that includes: a container body in which a processing is performed on a substrate; a substrate holder that conveys the substrate from an outside of the container body into the container body and holds the substrate inside the container body during the processing; a first lift table positioned outside the container body and having a plurality of cooling member support pins extending therefrom and supporting a cooling member including a cooling plate configured to cool the substrate holder and the substrate; and a second lift table positioned outside the container body supporting a plurality of substrate support pins that extend upwardly from the second lift table and configured to directly support the substrate;
conveying the substrate from the outside of the container body into the container body by the substrate holder;
performing a processing while holding the substrate inside the substrate processing container by the substrate holder;
cooling the substrate holder by discharging the substrate on the substrate holder outside the container body and operating the first lift table to move the plurality of cooling member support pins upward relative to the plurality of substrate support pins, and simultaneously causing the cooling member including the cooling plate to approach the substrate holder; and placing a new substrate on the substrate holder,
wherein the first lift table is configured to move the plurality of cooling member support pins up and down relative to the plurality of substrate support pins and the second lift table, the second lift table is configured to move the plurality of substrate support pins up and down relative to the plurality of cooling member support pins and the first lift table, and both the first lift table and the second lift table are supported by a base and are each configured to move up and down along a stationary vertical guide having a first end fixed to the base and a second end opposite the first end extending vertically therefrom, and
wherein the second end of the stationary vertical guide is positioned vertically above the first lift table and the second lift table.

Assignees

• Tokyo Electron Ltd

Inventors

• Inadomi Hiroaki
• Okamura Satoshi
• Biwa Satoshi

Classifications

• H01L21/02101 Primary

  Electricity · mapped topic

• B08B7/0021 Primary

  by liquid gases or supercritical fluids · CPC title

• H01L21/68785

  Electricity · mapped topic

• H01L21/67742

  Electricity · mapped topic

• H01L21/67109

  Electricity · mapped topic