Gas abatement apparatus

US10675581B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10675581-B2
Application numberUS-201816055929-A
CountryUS
Kind codeB2
Filing dateAug 6, 2018
Priority dateAug 6, 2018
Publication dateJun 9, 2020
Grant dateJun 9, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Embodiments of the present disclosure relate to gas abatement apparatus and effluent management. The apparatus described herein include a high pressure process chamber and a containment chamber surrounding the process chamber. A high pressure fluid delivery module is in fluid communication with the high pressure process chamber and is configured to deliver a high pressure fluid to the process chamber. An effluent management module includes a muffler assembly to effluent pressure reduction and a plurality of scrubbers provide for treatment of effluent.

First claim

Opening claim text (preview).

What is claimed is: 1. An effluent management apparatus, comprising: a muffler assembly, comprising: a first muffler defining a first volume therein, the first muffler having a first port formed in a first end and a second port formed in a second end opposite the first port; a second muffler defining a second volume therein, the second muffler having a third port formed in a third end and a fourth port formed in the second muffler opposite the third port; a third muffler defining a third volume therein, the third muffler having a fifth port formed therein and a sixth port formed therein opposite the fifth port; a fourth muffler defining a fourth volume therein, the fourth muffler having a seventh port formed therein and an eighth port formed through a fourth end opposite the seventh port; a first conduit extending between the seventh port and the fifth port; and a second conduit extending between the fourth port and the sixth port; a third conduit extending from the third port to a valve; a first scrubber in fluid communication with the valve; and a second scrubber in fluid communication with the valve via a fourth conduit. 2. The apparatus of claim 1 , wherein a flow restrictor is disposed on the fourth conduit between the valve and the second scrubber. 3. The apparatus of claim 1 , further comprising: an exhaust conduit; a pump coupled to the exhaust conduit; a fifth conduit extending from the second port to the exhaust conduit; and a sixth conduit extending from the pump to the eighth port. 4. The apparatus of claim 1 , wherein each of the first muffler, the second muffler, the third muffler, and the fourth muffler is cylindrical. 5. The apparatus of claim 4 , wherein a length of each of the first muffler, the second muffler, the third muffler, and the fourth muffler is between 60 inches and 100 inches. 6. The apparatus of claim 5 , wherein a diameter of each of the first muffler, the second muffler, the third muffler, and the fourth muffler is between 20 inches and 40 inches. 7. A high-pressure processing apparatus, comprising: a first chamber; a second chamber defining a process volume therein, the second chamber disposed within the first chamber; a muffler assembly, comprising: a first muffler defining a first volume therein, the first muffler having a first port formed in a first end and a second port formed in a second end opposite the first port; a second muffler defining a second volume therein, the second muffler having a third port formed in a third end and a fourth port formed in the second muffler opposite the third port; a third muffler defining a third volume therein, the third muffler having a fifth port formed therein and a sixth port formed therein opposite the fifth port; a fourth muffler defining a fourth volume therein, the fourth muffler having a seventh port formed therein and an eighth port formed through a fourth end opposite the seventh port; a first conduit extending between the seventh port and the fifth port; and a second conduit extending between the fourth port and the sixth port; a third conduit extending from the third port to a valve; a first scrubber in fluid communication with the valve; a second scrubber in fluid communication with the valve via a fourth conduit; and a fifth conduit disposed between the process volume and the first port of the first muffler. 8. The apparatus of claim 7 , further comprising: an exhaust conduit extending from the first chamber; a pump coupled to the exhaust conduit; a sixth conduit extending from the second port to the exhaust conduit; and a seventh conduit extending from the pump to the eighth port. 9. The apparatus of claim 7 , wherein each of the first muffler, the second muffler, the third muffler, and the fourth muffler is cylindrical. 10. The apparatus of claim 9 , wherein a length of each of the first muffler, the second muffler, the third muffler, and the fourth muffler is between 60 inches and 100 inches. 11. The apparatus of claim 10 , wherein a diameter of each of the first muffler, the second muffler, the third muffler, and the fourth muffler is between 20 inches and 40 inches. 12. The apparatus of claim 7 , further comprising: a ninth port formed in the first muffler adjacent to the second port; a tenth port formed in the second muffler adjacent to the fourth port; an eleventh port formed in the third muffler adjacent to the sixth port; and a twelfth port formed in the fourth muffler adjacent to the eighth port. 13. The apparatus of claim 7 , further comprising: a first slit valve formed in the second chamber; and a first slit valve door coupled to an internal surface of the second chamber. 14. The apparatus of claim 13 , further comprising: a second slit valve formed in the first chamber; and a second slit valve door coupled to an external surface of the first chamber.

Assignees

Inventors

Classifications

  • Constructional details of adsorbing systems · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

  • characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier · CPC title

  • Apparatus for applying a liquid, a resin, an ink or the like · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10675581B2 cover?
Embodiments of the present disclosure relate to gas abatement apparatus and effluent management. The apparatus described herein include a high pressure process chamber and a containment chamber surrounding the process chamber. A high pressure fluid delivery module is in fluid communication with the high pressure process chamber and is configured to deliver a high pressure fluid to the process c…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification B01D53/0407. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 09 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).