Selective etch of silicon nitride
US-8956980-B1 · Feb 17, 2015 · US
Processing systems and methods for halide scavenging
US9153442B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9153442-B2 |
| Application number | US-201414248143-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 8, 2014 |
| Priority date | Mar 15, 2013 |
| Publication date | Oct 6, 2015 |
| Grant date | Oct 6, 2015 |
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Abstract
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Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of processing a substrate, the method comprising: transferring a substrate from a holding chamber to a loading chamber through a factory interface with a first transfer device; evacuating the loading chamber such that the substrate is maintained in a vacuum environment; transferring the substrate from the evacuated loading chamber to a process chamber with a second transfer device; transferring the substrate from the process chamber to the loa…
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Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US9153442B2 cover?
- Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, pre…
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification H10P50/242. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Oct 06 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).