Image sensor

US10651219B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10651219-B2
Application numberUS-201916436447-A
CountryUS
Kind codeB2
Filing dateJun 10, 2019
Priority dateFeb 1, 2017
Publication dateMay 12, 2020
Grant dateMay 12, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An image sensor and a method for fabricating the same are provided, in which the image sensor includes a substrate including a first sensing region having a photoelectric device therein, a boundary isolation film partitioning the first sensing region, an inner reflection pattern film within the substrate in the sensing region, an infrared filter on the substrate, and a micro lens on the infrared filter.

First claim

Opening claim text (preview).

What is claimed is: 1. An image sensor comprising: a first sensing region having a color filter; a second sensing region; a side anti-reflection film between the first sensing region and the second sensing region; a boundary isolation trench having a first length from a top surface of a substrate and disposed between the first sensing region and the second sensing region; a boundary isolation film filling the boundary isolation trench; a first inner reflection pattern film having a second length from the top surface of the substrate and disposed between a first boundary of the second sensing region and a second boundary of the second sensing region; and a planarizing film on the top surface of the substrate, wherein the second length is shorter than the first length, wherein the planarizing film includes a silicon nitride, and wherein the color filter is disposed on the planarizing film, and a bottom surface of the color filter is coplanar with a bottom surface of the side anti-reflection film. 2. The image sensor of claim 1 , wherein the color filter is a green color filter. 3. The image sensor of claim 1 , wherein the color filter is a blue color filter. 4. The image sensor of claim 1 , wherein the boundary isolation film includes hafnium oxide. 5. The image sensor of claim 1 , wherein the boundary isolation film includes aluminum oxide. 6. The image sensor of claim 5 , wherein the boundary isolation trench does not connect the top surface and a bottom surface of the substrate. 7. The image sensor of claim 5 , wherein the boundary isolation trench connects the top surface and a bottom surface of the substrate. 8. The image sensor of claim 1 , wherein the side anti-reflection film includes tungsten. 9. The image sensor of claim 1 , further comprising a second inner reflection pattern film between a first boundary of the first sensing region and a second boundary of the first sensing region. 10. The image sensor of claim 9 , wherein the boundary isolation trench does not connect the top surface and a bottom surface of the substrate. 11. The image sensor of claim 9 , wherein the boundary isolation trench connects the top surface and a bottom surface of the substrate. 12. An image sensor, comprising a first sensing region having a color filter; a second sensing region; a side anti-reflection film between the first sensing region and the second sensing region; a boundary isolation trench having a first length from a top surface of a substrate and disposed between the first sensing region and the second sensing region; a boundary isolation film filling the boundary isolation trench; an inner reflection pattern film having a second length from the top surface of the substrate and disposed between a first boundary of the second sensing region and a second boundary of the second sensing region; and a first planarizing film on the top surface of the substrate, wherein the second length is shorter than the first length, wherein the inner reflection pattern film includes a hafnium oxide, and wherein the color filter is disposed on the first planarizing film, and a bottom surface of the color filter is coplanar with a bottom surface of the side anti-reflection film. 13. The image sensor of claim 12 , further comprising a second planarizing film on the first planarizing film. 14. The image sensor of claim 12 , wherein the boundary isolation trench does not connect the top surface and a bottom surface of the substrate. 15. The image sensor of claim 12 , wherein the boundary isolation trench connects the top surface and a bottom surface of the substrate. 16. The image sensor of claim 13 , further comprising a micro-lens on the second planarizing film and a protection film on the micro-lens. 17. The image sensor of claim 16 , wherein the protection film is a silicon oxide film. 18. The image sensor of claim 12 , wherein the color filter is a green color filter. 19. The image sensor of claim 12 , wherein the color filter is a blue color filter.

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What does patent US10651219B2 cover?
An image sensor and a method for fabricating the same are provided, in which the image sensor includes a substrate including a first sensing region having a photoelectric device therein, a boundary isolation film partitioning the first sensing region, an inner reflection pattern film within the substrate in the sensing region, an infrared filter on the substrate, and a micro lens on the infrare…
Who is the assignee on this patent?
Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01L27/14627. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 12 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).