Packages for coil actuated position sensors

US10649042B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10649042-B2
Application numberUS-201916394338-A
CountryUS
Kind codeB2
Filing dateApr 25, 2019
Priority dateMay 26, 2017
Publication dateMay 12, 2020
Grant dateMay 12, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An apparatus comprises a first substrate and two coils supported by the first substrate and arranged next to each other, the coils configured to each generate a magnetic field which produces eddy currents in and a reflected magnetic field from a conductive target, the two coils arranged so their respectively generated magnetic fields substantially cancel each other in an area between the coils. One or more magnetic field sensing elements are positioned in the area between the coils and configured to detect the reflected magnetic field.

First claim

Opening claim text (preview).

The invention claimed is: 1. An apparatus comprising: a first substrate; two coils supported by the first substrate and arranged next to each other such that a current through each of the coils flows in the same plane, the coils configured to each generate a magnetic field which produces eddy currents in and a reflected magnetic field from a conductive target, the two coils arranged so their respectively generated magnetic fields substantially cancel each other in an area between the coils; and one or more magnetic field sensing elements positioned in the area between the coils and configured to detect the reflected magnetic field in order to detect one or more of a position, speed, rotational angle, or direction of the conductive target. 2. The apparatus of claim 1 wherein the one or more magnetic field sensing elements comprise a bridge circuit. 3. The apparatus of claim 1 wherein the one or more magnetic field sensing elements comprise at least two pairs of magnetic field sensing elements. 4. The apparatus of claim 3 wherein a center area of the conductive target is adjacent to one of the pairs of magnetic field sensing elements and an edge of the conductive target is adjacent to another of the pairs of magnetic field sensing elements. 5. The apparatus of claim 1 further comprising a second substrate, wherein the one or more magnetic field sensing elements and/or a processing circuit are supported by the second substrate. 6. The apparatus of claim 5 wherein the second substrate is centered in the area between the coils. 7. The apparatus of claim 5 wherein the first and/or second substrates comprise one or more of: a semiconductor material, a glass material, or a ceramic material. 8. An apparatus comprising: a first substrate; a conductive trace supported by the first substrate and having a first portion looped in a first direction to form a first coil and a second portion looped in a second direction to form a second coil, wherein the second direction is opposite the first direction and wherein the first and second coils are configured to each generate a magnetic field which produces eddy currents in and a reflected magnetic field from a conductive target, the two coils arranged so their respectively generated magnetic fields substantially cancel each other in an area between the coils; and one or more magnetic field sensing elements positioned in the area between the coils and configured to detect the reflected magnetic field in order to detect one or more of a position, speed, rotational angle, or direction of the conductive target. 9. The apparatus of claim 8 wherein the one or more magnetic field sensing elements comprise a bridge circuit. 10. The apparatus of claim 8 wherein the one or more magnetic field sensing elements comprise at least two pairs of magnetic field sensing elements. 11. The apparatus of claim 10 wherein a center area of the conductive target is adjacent to one of the pairs of magnetic field sensing elements and an edge of the conductive target is adjacent to another of the pairs of magnetic field sensing elements. 12. The apparatus of claim 8 further comprising a second substrate, wherein the one or more magnetic field sensing elements and/or a processing circuit are supported by the second substrate. 13. The apparatus of claim 12 wherein the second substrate is centered in the area between the coils. 14. The apparatus of claim 12 wherein the first and/or second substrates comprise one or more of: a semiconductor material, a glass material, or a ceramic material. 15. An apparatus comprising: a first substrate; two coils supported by the first substrate and arranged next to each other such that a current through each of the coils flows in opposite directions with respect to each other, the coils configured to each generate a magnetic field which produces eddy currents in and a reflected magnetic field from a conductive target, the two coils arranged so their respectively generated magnetic fields substantially cancel each other in an area between the coils; and one or more magnetic field sensing elements positioned in the area between the coils and configured to detect the reflected magnetic field in order to detect one or more of a position, speed, rotational angle, or direction of the conductive target. 16. The apparatus of claim 15 wherein the one or more magnetic field sensing elements comprise a bridge circuit. 17. The apparatus of claim 15 wherein the one or more magnetic field sensing elements comprise at least two pairs of magnetic field sensing elements. 18. The apparatus of claim 17 wherein a center area of the conductive target is adjacent to one of the pairs of magnetic field sensing elements and an edge of the conductive target is adjacent to another of the pairs of magnetic field sensing elements. 19. The apparatus of claim 15 further comprising a second substrate, wherein the one or more magnetic field sensing elements and/or a processing circuit are supported by the second substrate. 20. The apparatus of claim 19 wherein the second substrate is centered in the area between the coils. 21. The apparatus of claim 19 wherein the first and/or second substrates comprise one or more of: a semiconductor material, a glass material, or a ceramic material.

Assignees

Inventors

Classifications

  • for measuring distance between sensor and object (G01B7/082 and G01B7/102 take precedence) · CPC title

  • for measuring position, not involving coordinate determination (coordinate measuring G01B7/004) · CPC title

  • Spin resolved measurements; Influencing spins during measurements, e.g. in spintronics devices · CPC title

  • comprising means, e.g. flux concentrators, flux guides, for guiding or concentrating the magnetic flux, e.g. to the magnetic sensor · CPC title

  • Printed circuit coils · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10649042B2 cover?
An apparatus comprises a first substrate and two coils supported by the first substrate and arranged next to each other, the coils configured to each generate a magnetic field which produces eddy currents in and a reflected magnetic field from a conductive target, the two coils arranged so their respectively generated magnetic fields substantially cancel each other in an area between the coils.…
Who is the assignee on this patent?
Allegro Microsystems Llc
What technology area does this patent fall under?
Primary CPC classification G01R33/0094. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 12 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).