Copper electroplating compositions and methods of electroplating copper on substrates

Patent metadata

Field	Value
Publication number	US-10612148-B2
Application number	US-201816166217-A
Country	US
Kind code	B2
Filing date	Oct 22, 2018
Priority date	Nov 8, 2017
Publication date	Apr 7, 2020
Grant date	Apr 7, 2020

Abstract

Copper electroplating compositions which include a diimidazole compound enables the electroplating of copper having uniform morphology on substrates. The composition and methods of enable copper electroplating of photoresist defined features. Such features include pillars, bond pads and line space features.

First claim

What is claimed is:

1. A composition comprising one or more sources of copper ions, one or more electrolytes, one or more accelerators, one or more suppressors, and one or more imidazole compounds having a formula:

wherein R 1 , R 2 , R 3 and R 4 are independently chosen from hydrogen, linear or branched (C 1 -C 4 )alkyl, and phenyl.

2. The composition of claim 1 , wherein the one or more imidazole compounds are in amounts of 0.25 ppm to 1000 ppm.

3. The composition of claim 1 , wherein R 1 , R 2 , R 3 and R 4 are independently chosen from hydrogen, and (C 1 -C 2 )alkyl.

4. The composition of claim 3 , wherein R 1 , R 2 , R 3 and R 4 are independently chosen from hydrogen, and methyl.

5. A method comprising:
a) providing a substrate,
b) providing a copper electroplating composition comprising one or more sources of copper ions, one or more electrolytes, one or more accelerators, one or more suppressors, and one or more imidazole compounds having a formula:

wherein R 1 , R 2 , R 3 and R 4 are independently chosen from hydrogen, linear or branched (C 1 -C 4 )alkyl, and phenyl,

c) applying the copper electroplating composition to the substrate, and
d) electroplating copper having a uniform morphology on the substrate with the copper electroplating composition.

6. The method of claim 5 , wherein the substrate comprises photoresist defined features and the photoresist defined features are electroplated with copper during electroplating.

7. The method of claim 6 , wherein the photoresist defined features on the substrate are chosen from one or more of pillars, bond pads and line space features.

8. The method of claim 5 , wherein the one or more imidazole compounds are in amounts of 0.25 ppm to 1000 ppm.

9. The method of claim 5 , wherein electroplating is done at a current density of 0.25 ASD to 40 ASD.

Assignees

• Rohm & Haas Elect Mat

Inventors

• Pokhrel Ravi

Classifications

• C25D3/38 Primary

  of copper · CPC title

• H05K3/188

  by direct electroplating · CPC title

• C25D5/022

  using masking means · CPC title

• C25D7/123

  Semiconductors first coated with a seed layer or a conductive layer · CPC title

• H05K2203/0723

  Electroplating, e.g. finish plating · CPC title