Device for coating one or more yarns by a vapor deposition method

Patent metadata

Field	Value
Publication number	US-10597782-B2
Application number	US-201615777492-A
Country	US
Kind code	B2
Filing date	Nov 17, 2016
Priority date	Nov 19, 2015
Publication date	Mar 24, 2020
Grant date	Mar 24, 2020

Abstract

A device for coating one or more yarns by a vapor deposition method, the device including a treatment chamber defining a first and a second treatment zone in which at least one yarn is to be coated by performing a vapor deposition method, the first and second zones being separated by a wall and the first zone surrounding the second zone, or being superposed on the second zone; a conveyor system to transport the at least one yarn through the first and second zones; a first injector device to inject a first treatment gas phase into the first zone and a first removal device configured to remove the residual first gas phase from the first zone; and a second injector device configured to inject a second treatment gas phase into the second zone, and a second removal device configured to remove the residual second gas phase from the second zone.

First claim

The invention claimed is:

1. A device for coating one or more yarns by a vapor deposition method, the device comprising:
a treatment chamber defining at least a first treatment zone and a second treatment zone in which at least one yarn is to be coated by performing a vapor deposition method, the first and second zones extending along a longitudinal direction and being separated by a wall and the first zone completely surrounding the second zone, and the wall completely surrounding the second zone and extending along said longitudinal direction;
a conveyor system configured to transport said at least one yarn through the first and second zones;
a first injector configured to inject a first treatment gas into the first zone and a first removal device configured to remove the residual first treatment gas from the first zone; and
a second injector configured to inject a second treatment gas into the second zone, and a second removal device configured to remove the residual treatment second gas from the second zone.

2. A device according to claim 1 , wherein the first zone extends along a first longitudinal axis and wherein the first injector includes at least a first injection channel that opens out into the first zone, said first injection channel being configured to inject at least a portion of the first treatment gas into the first zone along a first injection direction that is not parallel to the first longitudinal axis.

3. A device according to claim 2 , wherein the first injection direction forms an angle lying in the range 30° to 60° with the first longitudinal axis.

4. A device according to claim 1 , wherein the second zone extends along a second longitudinal axis and wherein the second injector includes at least one second injection channel that opens out into the second zone, said second injection channel being configured to inject at least a portion of the second treatment gas into the second zone along an injection direction that is not parallel to the second longitudinal axis.

5. A device according to claim 4 , wherein the second injection direction forms an angle lying in the range 30° to 60° with the second longitudinal axis.

6. A device according to claim 1 , wherein the first zone extends along a first longitudinal axis and wherein the first injector includes injection orifices opening out into the first zone, the injection orifices being offset along the first longitudinal axis.

7. A device according to claim 1 , wherein the second zone extends along a second longitudinal axis and wherein the second injector includes injection orifices opening out into the second zone, the injection orifices being offset along the second longitudinal axis.

8. A device according to claim 1 , wherein the wall is coated in a layer that reflects infrared radiation and that presents a mean coefficient of reflection lying in the range 5% to 50% over the wavelength range 1000 nm to 8000 nm.

9. A device according to claim 1 , wherein the conveyor system is adapted to adjust a travel speed of said at least one yarn through the treatment chamber.

10. A device according to claim 1 , wherein the second zone extends along a second longitudinal axis, the device further comprising a plurality of sets of guide elements positioned in annular manner around the second longitudinal axis and configured to position the yarns for treatment in circumferential manner in each of the first and second zones.

11. A device according to claim 1 , wherein the wall is an internal circumferential wall, the first treatment zone being present between the internal circumferential wall and an external circumferential wall.

12. A device according to claim 1 , wherein the conveyor system includes one or more first pulleys constructed and arranged to change a direction of transport of said yarn such that the yarn perform two successive passes through the treatment chamber, said two successive passes including a first pass through one of the first and second zones and a second pass through the other one of the first and second zones.

13. A device according to claim 12 , wherein the conveyor system includes one or more second pulleys and one or more third pulleys, wherein the one or more first pulleys, the one or more second pulleys and the one or more third pulleys are constructed and arranged such the yarn is transported between the second one or more pulleys and the first one or more pulleys through the first treatment zone in a first direction and between the third one or more pulleys and the first one or more pulleys through the second treatment zone in a second direction different from the first direction.

14. A device according to claim 13 , wherein the first direction is opposite to the second direction.

15. A method of coating one or more yarns by a vapor deposition method by using a device in accordance with claim 1 , the method comprising:
injecting the first treatment gas into the first zone and the second treatment gas into the second zone;
transporting at least one yarn by means of the conveyor system through the treatment chamber, during which:
said at least one yarn passes through either the first zone or the second zone so as to form a first layer on said at least one yarn by vapor deposition respectively from the first treatment gas or from the second treatment gas; and then
said at least one yarn coated in the first layer passes through the second zone or the first zone so as to form a second layer on said first layer by vapor deposition respectively from the second treatment gas or from the first treatment gas; and

removing the residual first treatment gas from the first zone and the residual second treatment gas from the second zone.

16. A method according to claim 15 , wherein said at least one yarn is transported continuously by the conveyor system through the treatment chamber.

17. A method according to claim 15 , wherein the first layer and/or the second layer is/are formed by chemical vapor deposition or by reactive chemical vapor deposition.

18. A method according to claim 15 , wherein each of the first and second layers comprises an interphase coating layer.

19. A method of fabricating a composite material part, the method comprising:
coating a plurality of yarns with an interphase coating at least by performing a method according to claim 18 ;
forming a fiber preform at least by performing one or more textile operations on yarns coated in this way with the interphase coating; and
densifying the fiber preform with a matrix in order to obtain a composite material part.

Assignees

• Safran Ceram

Inventors

• Buet Emilien
• Thibaud Simon
• Delcamp Adrien
• Descamps Cédric

Classifications

• D06M11/74

  with carbon or graphite; with carbides; with graphitic acids or their salts · CPC title

• D04D3/00

  Chenille trimmings (chenille yarns D02G; making chenille trimmings by weaving D03D) · CPC title

• C23C16/54

  Apparatus specially adapted for continuous coating · CPC title

• C23C16/455

  characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber · CPC title

• C23C16/24

  Deposition of silicon only · CPC title