Cleaning liquid, anticorrosion agent, and method for manufacturing the same

US10597609B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10597609-B2
Application numberUS-201715855173-A
CountryUS
Kind codeB2
Filing dateDec 27, 2017
Priority dateDec 29, 2016
Publication dateMar 24, 2020
Grant dateMar 24, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A cleaning liquid and an anticorrosion agent having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), alkanolamine represented by general formula (2), a solvent, and a basic compound other than the alkanol hydroxyamine and the alkanolamine or an acidic compound. In the general formula (1), R a1 and R a2 each independently represents a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, R a1 and R a2 are not simultaneously a hydrogen atom, and R b1 and R b2 are not simultaneously a hydrogen atom.

First claim

Opening claim text (preview).

What is claimed is: 1. A cleaning liquid comprising alkanol hydroxyamine represented by the following general formula (1), alkanolamine represented by the following general formula (2), a solvent, as well as a basic compound other than the alkanol hydroxyamine and the alkanolamine, or an acidic compound: wherein R a1 and R a2 each independently represent a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, where R a1 and R a2 are not simultaneously a hydrogen atom; wherein R b1 and R b2 each independently represent a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, where R b1 and R b2 are not simultaneously a hydrogen atom. 2. The cleaning liquid according to claim 1 , wherein R a1 in the general formula (1) and R b1 in the general formula (2) are the same group, and R a2 in the general formula (1) and R b2 in the general formula (2) are the same group. 3. The cleaning liquid according to claim 1 , wherein R a1 and R a2 in the general formula (1) are the same group, and R b1 and R b2 in the general formula (2) are the same group. 4. An anticorrosion agent comprising alkanol hydroxyamine represented by the following general formula (1) and alkanolamine represented by the following general formula (2): wherein R a1 and R a2 each independently represent a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, where R a1 and R a2 are not simultaneously a hydrogen atom; wherein R a1 and R b2 each independently represent a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, where R b1 and R b2 are not simultaneously a hydrogen atom. 5. A method for manufacturing a cleaning liquid or an anticorrosion agent comprising alkanol hydroxyamine represented by the following general formula (1), the method comprising: synthesizing the alkanol hydroxyamine by oxidizing alkanolamine represented by the following general formula (2): wherein R a1 and R a2 each independently represent a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, where R a1 and R a2 are not simultaneously a hydrogen atom; wherein R b1 and R b2 each independently represent a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, wherein R b1 and R b2 are not simultaneously a hydrogen atom. 6. A method for cleaning a substrate comprising using the cleaning liquid according to claim 1 . 7. A method for cleaning a substrate comprising using the anticorrosion agent according to claim 4 . 8. A method for cleaning a substrate comprising using the anticorrosion agent manufactured by the method according to claim 5 . 9. The method according to claim 6 , wherein the cleaning of a substrate is cleaning of a substrate in lithography. 10. A method for manufacturing a semiconductor comprising a substrate, the method comprising cleaning the substrate using the method according to claim 6 . 11. A method for inhibiting corrosion of easily corrodible metal, comprising bringing the easily corrodible metal into contact with the cleaning liquid according to claim 1 . 12. A method for inhibiting corrosion of easily corrodible metal, comprising bringing the easily corrodible metal into contact with the anticorrosion agent according to claim 4 . 13. A method for inhibiting corrosion of easily corrodible metal, comprising bringing the easily corrodible metal into contact with the cleaning liquid or anticorrosion agent manufactured by the method according to claim 5 .

Assignees

Inventors

Classifications

  • Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

  • during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers · CPC title

  • by chemical means · CPC title

  • Alkanolamines or alkanolimines · CPC title

  • in markedly alkaline liquids · CPC title

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What does patent US10597609B2 cover?
A cleaning liquid and an anticorrosion agent having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), alkanolamine represented by general formula (2), a solvent, and a basic compound other than the alkanol hydroxyamine and the alkanolamine or an acidic compound. In the genera…
Who is the assignee on this patent?
Tokyo Ohka Kogyo Co Ltd
What technology area does this patent fall under?
Primary CPC classification C11D3/0073. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 24 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).