Resin composition and method of forming resist pattern

Patent metadata

Field	Value
Publication number	US-10534263-B2
Application number	US-201715848404-A
Country	US
Kind code	B2
Filing date	Dec 20, 2017
Priority date	Dec 22, 2016
Publication date	Jan 14, 2020
Grant date	Jan 14, 2020

Abstract

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, which includes a polymeric compound having at least two specific structural units.

First claim

What is claimed is:

1. A resist composition comprising:
a component (A) which exhibits changed solubility in a developing solution under action of acid, and
an acid-generator component (B) which generates acid upon exposure,
the component (A) comprising a polymeric compound having a structural unit represented by formula (1) shown below and a structural unit represented by general formula (2) shown below, wherein the acid-generator component (B) has an anion represented by formula (3) shown below:

wherein in formula (1), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group; La is selected from formula (1-1) or (1-2) shown below:

wherein “*” represents a valence bond; each A1 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxy group, —COOR′, —OC(═O)R′, a hydroxyalkyl group or a cyano group; A2 represents an oxygen atom (—O—), a sulfur atom (—S—) or an alkylene group containing an oxygen atom or a sulfur atom; B1, B2 and B3 each independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxy group, —COOR′, —OC(═O)R′, a hydroxyalkyl group or a cyano group; R′ represents a hydrogen atom or an alkyl group:

Wherein in formula (2), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Z represents a single bond or an alkyl group; and C p is a group represented by general formula (Cp-1) shown below:

wherein R 2 represents a tertiary alkyl group, n p represents a positive integer, and * indicates the bonding position with Z;
Y—COO—(CH 2 ) n —CHF—CF 2 —SO 3 −   (3)

wherein Y represents a monocyclic or polycyclic group of 5 to 30 carbon atoms which may have a substituent, an alkyl group which may have a substituent, or an alkenyl group which may have a substituent; and n represents an integer of 1 to 5.

2. The resist composition according to claim 1 , wherein n p is 1, and R 2 is a tert-butyl group.

3. The resist composition according to claim 1 , wherein A1 is a hydrogen atom and A2 is a methylene group.

4. The resist composition according to claim 1 , wherein each of B1, B2 and B3 is a hydrogen atom.

5. The resist composition according to claim 1 , wherein Y is a polycyclic hydrocarbon group which may be substituted with a hydroxy group, or a polycyclic group which may have at least one carbon atom substituted with a carbonyl group.

6. The resist composition according to claim 1 , wherein the component (A) is a base component which exhibits increased solubility in a developing solution by the action of acid.

7. A method of forming a resist pattern, comprising:
forming a resist film using the resist composition of claim 1 ;
exposing the resist film; and
developing the resist film to form a resist pattern.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Nakamura Tsuyoshi
• Tanno Kazuishi
• Lee Junyeob

Classifications

• G03F7/322

  Aqueous alkaline compositions · CPC title

• G03F7/325

  Non-aqueous compositions · CPC title

• G03F7/038

  Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

• G03F7/0397 Primary

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• C08F232/02

  having no condensed rings · CPC title