Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method
US-9221928-B2 · Dec 29, 2015 · US
Sulfonic acid derivative and photoacid generator
US9714217B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9714217-B2 |
| Application number | US-201113574683-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 13, 2011 |
| Priority date | Jan 28, 2010 |
| Publication date | Jul 25, 2017 |
| Grant date | Jul 25, 2017 |
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Abstract
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Sulfonic acid derivatives of general formula RCOOCH 2 CH 2 CFHCF 2 SO 3 -M+ are provided, wherein R represents a substituted or unsubstituted C 1-30 linear, branched, or cyclic hydrocarbon group, or a substituted or unsubstituted C 6-30 aryl group, and M+ represents a counter cation. Photoacid generators and photoresists containing such sulfonic acid derivatives are also provided.
First claim
Opening claim text (preview).
The invention claimed is: 1. A photoresist, comprising: a photoacid generator of formula (1): RCOOCH 2 CH 2 CFHCF 2 SO 3 − M + (1) wherein R is a linear, branched, or cyclic hydrocarbon group having from 4 to 30 carbon atoms, or an aryl group having from 6 to 30 carbon atoms, the hydrocarbon group and the aryl group are substituted or unsubstituted, and M + is a counter cation; and a polymer. 2. The photoacid generator according to claim 1…
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Physics · mapped topic
Physics · mapped topic
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
- C07C309/12Primary
Chemistry & Metallurgy · mapped topic
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- What does patent US9714217B2 cover?
- Sulfonic acid derivatives of general formula RCOOCH 2 CH 2 CFHCF 2 SO 3 -M+ are provided, wherein R represents a substituted or unsubstituted C 1-30 linear, branched, or cyclic hydrocarbon group, or a substituted or unsubstituted C 6-30 aryl group, and M+ represents a counter cation. Photoacid generators and photoresists containing such sulfonic acid derivatives are also provided.
- Who is the assignee on this patent?
- Hosoi Yasuhiro, Kaneko Yuzuru, Toyo Gosei Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C07C309/12. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jul 25 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).