Optical semiconductor device, semiconductor laser module, and optical fiber amplifier
US-10020638-B2 · Jul 10, 2018 · US
US10511150B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10511150-B2 |
| Application number | US-201816029285-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 6, 2018 |
| Priority date | Apr 6, 2012 |
| Publication date | Dec 17, 2019 |
| Grant date | Dec 17, 2019 |
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A wavelength-variable laser outputting a predetermined wavelength of laser light includes: a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction; a separate confinement heterostructure layer positioned between the quantum well active layer and the n-type cladding layer; and an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and the n-type cladding layer and configured by at least two semiconductor layers having band gap energy greater than band gap energy of a barrier layer constituting the quantum well active layer.
Opening claim text (preview).
What is claimed is: 1. A wavelength-variable laser outputting a predetermined wavelength of laser light comprising: a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction; a separate confinement heterostructure layer positioned between the quantum well active layer and the n-type cladding layer; and an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and the n-type cladding layer and configured by at least two semiconductor layers having band gap energy greater than band gap energy of a barrier layer constituting the quantum well active layer, wherein the wavelength-variable laser has a function to select a specific wavelength by returning a specific wavelength in the wavelength-variable laser. 2. The wavelength-variable laser according to claim 1 , further comprising a current constriction structure positioned at both sides of width direction of the quantum well active layer, wherein the electric-field-distribution-control layer is formed to overlap with the current constriction structure in the thickness direction. 3. The wavelength-variable laser according to claim 1 , wherein the semiconductor layers constituting the electric-field-distribution-control layer are constituted by a first semiconductor layer made from semiconductor material having band gap energy that is the same as the n-type cladding layer and a second semiconductor layer made from semiconductor material having band gap energy greater than the barrier layer constituting the quantum well active layer. 4. The wavelength-variable laser according to claim 3 , wherein the first semiconductor layer is made from InP, and the second semiconductor layer is made from III-V group compound semiconductor including an As atom and a P atom as composition. 5. The wavelength-variable laser according to claim 4 , wherein the second semiconductor layer is made from GaInAsP, and a sum of layer thicknesses of the second semiconductor layers constituting the electric-field-distribution-control layer is equal to or smaller than 1 μm. 6. The wavelength-variable laser according to claim 5 , wherein band gap composition wavelength of GaInAsP constituting the second semiconductor layer is equal to or greater than 1 μm.
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