Method of producing display panel board

Patent metadata

Field	Value
Publication number	US-10497725-B2
Application number	US-201716078280-A
Country	US
Kind code	B2
Filing date	Feb 17, 2017
Priority date	Feb 26, 2016
Publication date	Dec 3, 2019
Grant date	Dec 3, 2019

Abstract

A method includes a conductive film forming process of forming a conductive film 51 covering a gate insulation film IS and a semiconductor film 42, the gate insulation film 45 covering a gate electrode 37G and a gate line 35G formed on a glass substrate 32 and the semiconductor film 42 formed on the gate insulation film 45 while overlapping the gate electrode 37G, a first etching process of etching the conductive film 51 and forming a source conductive film 46S connected to the semiconductor film 42 and a drain conductive film 46D connected to the semiconductor film 42, a resist forming process performed after the first etching process and forming a resist 53R covering the semiconductor film 42, the source conductive film 46S, and the drain conductive film 46D, and a second etching process performed after the resist forming process and performing etching for removing the conductive film 51 while using the resist 53R as a mask.

First claim

The invention claimed is:

1. A method of producing a display panel board comprising:
a conductive film forming process of forming a conductive film covering a gate insulation film and a semiconductor film, the gate insulation film covering a gate electrode and a gate line formed on a substrate and the semiconductor film formed on the gate insulation film while overlapping the gate electrode;
a first etching process performed after the conductive film forming process and etching the conductive film and forming a source conductive film and a drain conductive film, the source conductive film including a source electrode connected to the semiconductor film and the drain conductive film including a drain electrode connected to the semiconductor film;
a resist forming process performed after the first etching process and forming a resist covering the semiconductor film, the source conductive film, and the drain conductive film; and
a second etching process performed after the resist forming process and performing etching for removing the conductive film while using the resist as a mask.

2. The method of producing a display panel board according to claim 1 , wherein in the resist forming process, the resist is formed so as not to be disposed on at least a part of an extending portion of a step portion formed on the gate insulation film, the part of the extending portion extending from the source conductive film to the drain conductive film.

3. The method of producing a display panel board according to claim 1 , wherein
in the first etching process, the source conductive film and the drain conductive film include source conductive films and drain conductive films, and the source conductive films and the drain conductive films are formed and arranged in an extending direction of the gate line, and
in the resist forming process, the resist is formed so as not to be disposed at least on a part of a source in-between extending portion of a step portion formed on the gate insulation film, the part of the source in-between extending portion extending from one to another of two adjacent source conductive films.

4. The method of producing a display panel board according to claim 1 , wherein
in the first etching process, the source conductive film and the drain conductive film include source conductive films and drain conductive films, and the source conductive films and the drain conductive films are formed and arranged in an extending direction of the gate line,
out of two of the source conductive films having the drain conductive film therebetween, one source conductive film disposed on an opposite side from another source conductive film connected to the drain conductive film via the semiconductor film is an opposite-side source conductive film, and
in the resist forming process, the resist is formed so as not to be disposed at least on a part of an opposite-side extending portion of a step portion formed on the gate insulation film, the part of the opposite-side extending portion extending from the drain conductive film to the opposite-side source conductive film.

5. The method of producing a display panel board according to claim 1 , wherein
in the resist forming process, the resist is formed in a shape following a shape of the source conductive film and the drain conductive film.

6. The method of producing a display panel board according to claim 1 , wherein
in the resist forming process, the resist is formed to cover the gate insulation film.

7. The method of producing a display panel board according to claim 1 , wherein the gate electrode and the gate line include aluminum.

Assignees

• Sharp Kk

Inventors

• Saitoh Takao
• Kanzaki Yohsuke
• ITO Kazuatsu
• Kaneko Seiji

Classifications

• H10P76/204

  of organic photoresist masks · CPC title

• H10P50/71

  using masks for conductive or resistive materials · CPC title

• G02F1/136286

  Wiring, e.g. gate line, drain line · CPC title

• G02F1/1368

  in which the switching element is a three-electrode device {(G02F1/136277 takes precedence)} · CPC title

• H01L29/41733

  Electricity · mapped topic