Cyclotronic plasma actuator with arc-magnet for active flow control

US10446373B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10446373-B2
Application numberUS-201916387777-A
CountryUS
Kind codeB2
Filing dateApr 18, 2019
Priority dateMar 17, 2017
Publication dateOct 15, 2019
Grant dateOct 15, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In an embodiment of the invention there is a cyclotronic actuator utilizing a high-voltage plasma driver connected to a first electrode. A second electrode is grounded and the two are isolated from each other by a dielectric plate. A magnet is positioned beneath the dielectric plate such that a coaxial dielectric barrier discharge plasma is formed outwardly between the first electrode across the dielectric plate. The magnet positioned beneath the dielectric plate introduces a magnetic field transverse to the plasma current path, such that the plasma discharge discharges radially and the local magnetic field is oriented vertically in a direction perpendicular to the dielectric plate to create a Lorentz Force, which forces the plasma discharge to move radially outwardly in a curved radial streamer mode pattern.

First claim

Opening claim text (preview).

We claim: 1. A cyclotronic actuator comprising: a high-voltage plasma driver; a first electrode being connected to the high-voltage plasma driver and having an upper portion and an upper section connected to the upper portion; a dielectric barrier defined by a dielectric plate connected to a dielectric cylinder, the dielectric cylinder having a bore through to define an inner surface of the dielectric cylinder, the bore being sized to receive the first electrode within the dielectric cylinder and wherein the upper section of the first electrode is positioned against a portion of the dielectric plate adjacent the bore; a ring magnet having an inner diameter and an outer circumference, wherein the inner diameter of the ring magnet is sized to position adjacent an outside side surface of the dielectric cylinder such that the dielectric cylinder and the dielectric plate isolates the ring magnet from the first electrode; a second electrode grounded and configured to surround the outer circumference of the ring magnet and the ground electrode being positioned beneath the dielectric plate, such that when the high-voltage plasma driver circuit is activated, a coaxial dielectric barrier discharge plasma is formed outwardly between the upper section of the first electrode across a top surface of the dielectric plate that is positioned above the second electrode; and wherein the ring magnet being positioned beneath the dielectric plate introduces a local magnetic field transverse to the coaxial dielectric barrier discharge plasma current path, such that the coaxial dielectric plasma barrier discharge discharges radially and the local magnetic field is oriented vertically in a direction perpendicular to the dielectric plate to create a Lorentz Force, combining electric field and magnetic field forces, which forces charged particles within the coaxial dielectric barrier discharge plasma to move in a curved path along the dielectric top surface, radially outward from the upper section of the first electrode and to cause the coaxial dielectric plasma barrier discharge to discharge out in a curved radial streamer mode pattern, whereby three-dimensional vortical structures are produced by the plasma discharge. 2. The cyclotronic actuator of claim 1 , wherein the high-voltage plasma driver produces a plasma discharge with a voltage of the arc gap within the 500V to 20 kV range or a variable frequency range of the plasma discharge within a 10 Hz to 100 kHz range and a current of the plasma discharge between 5 and 500 mA. 3. The cyclotronic actuator of claim 1 , wherein the high-voltage plasma driver is a high-voltage pulsed plasma driver producing a plasma discharge with a voltage of the arc gap within the 2 kV to 12 kV range or a variable frequency range of the plasma discharge within a 10 Hz to 100 kHz range and a current of the plasma discharge between 10 and 50 A. 4. The cyclotronic actuator of claim 1 , wherein the high-voltage plasma driver is selected from one or more of the following: a high-voltage AC plasma driver, a high-voltage RF circuit, a high-voltage pulsed DC plasma driver, or a bipolar high-voltage circuit. 5. A cyclotronic actuator comprising: a dielectric barrier defined by a dielectric plate connected to a dielectric base, the dielectric base having a cavity; a high-voltage plasma driver; a first electrode being connected to the high-voltage plasma driver and having an annular upper portion, positioned on a top surface of the dielectric plate; a magnet placed in the cavity of the dielectric base and positioned beneath the dielectric plate such that the dielectric plate isolates the magnet from the first electrode; a second electrode grounded and configured to include a portion extending across the annular upper portion of the first electrode and further positioned between the dielectric plate and the magnet, such that when the high-voltage plasma driver is activated, a coaxial dielectric barrier discharge plasma is formed inwardly between the annular upper portion of the first electrode across the top surface of the dielectric plate that is positioned above the second electrode; and wherein the magnet being positioned beneath the dielectric plate introduces a local magnetic field transverse to the coaxial dielectric barrier discharge plasma current path, such that the coaxial dielectric plasma barrier discharge discharges radially and the local magnetic field is oriented vertically in a direction perpendicular to the dielectric plate to create a Lorentz Force, combining electric field and magnetic field forces, which forces charged particles within the coaxial dielectric barrier discharge plasma to move in a curved path along the top surface of the dielectric plate, radially inward from the annular upper portion of the first electrode and to cause the coaxial dielectric plasma barrier discharge to discharge inwardly in a curved radial streamer mode pattern, whereby three-dimensional vortical structures are produced by the plasma discharge. 6. The cyclotronic actuator of claim 5 , wherein the magnet can be a ring magnet, bar magnet, or cylindrical magnet. 7. The cyclotronic actuator of claim 5 , wherein the magnet is positioned against the second electrode beneath the annular upper portion of the first electrode or include a dielectric spacer position between the magnet and the portion of the second electrode extending beneath the first electrode. 8. The cyclotronic actuator of claim 5 , wherein the high-voltage plasma driver produces a plasma discharge with a voltage of the arc gap within the 500V to 20 kV range or a variable frequency range of the plasma discharge within a 10 Hz to 100 kHz range and a current of the plasma discharge between 5 and 500 mA. 9. The cyclotronic actuator of claim 5 , wherein the high-voltage plasma driver is a high-voltage pulsed plasma driver producing a plasma discharge with a voltage of the arc gap within the 2 kV to 12 kV range or a variable frequency range of the plasma discharge within a 10 Hz to 100 kHz range and a current of the plasma discharge between 10 and 50 A. 10. The cyclotronic actuator of claim 5 , wherein the high-voltage plasma driver is selected from one or more of the following: a high-voltage AC plasma driver, a high-voltage RF circuit, a high-voltage pulsed DC plasma driver, or a bipolar high-voltage circuit. 11. A cyclotronic actuator comprising: a dielectric barrier plate having a top surface; a high-voltage plasma driver; a first electrode connected to the high-voltage plasma driver, and the first electrode positioned on the top surface of the dielectric plate; a second electrode grounded and positioned on the top surface of the dielectric plate; wherein both the first and second electrodes are separately configured to have profile edges created from starting edges to ending edges defined in the first and second electrodes and further configured to face each other to create a defined channel there between; a magnet positioned beneath the dielectric plate such that the dielectric plate isolates the magnet from the electrodes, and wherein the magnet is further positioned beneath the defined channel created between the profile edges on the first and second electrodes, such that when the high-voltage plasma driver is activated, a plasma discharge filament is formed between the channel created between the first and second electrodes across the top surface of the dielectric plate; and wherein the magnet being positioned beneath the dielectric plate introduces a local magnetic field transverse to the plasma filament current path, such that the plasma filament discharge discharges in the electrode gap and the local magnetic field is oriented ve

Assignees

Inventors

Classifications

  • Gas control, e.g. control of the gas flow · CPC title

  • Circuits specially adapted for controlling the arc discharge (for plasma torches H01H1/36) · CPC title

  • using transition or level detection · CPC title

  • Relative arrangement or disposition of electrodes; moving means · CPC title

  • and using applied magnetic fields, e.g. for focusing or rotating the arc · CPC title

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What does patent US10446373B2 cover?
In an embodiment of the invention there is a cyclotronic actuator utilizing a high-voltage plasma driver connected to a first electrode. A second electrode is grounded and the two are isolated from each other by a dielectric plate. A magnet is positioned beneath the dielectric plate such that a coaxial dielectric barrier discharge plasma is formed outwardly between the first electrode across th…
Who is the assignee on this patent?
Cu Aerospace Llc, Univ Illinois
What technology area does this patent fall under?
Primary CPC classification H01J37/32064. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 15 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).