Deposition apparatus

Patent metadata

Field	Value
Publication number	US-10011899-B2
Application number	US-201514938513-A
Country	US
Kind code	B2
Filing date	Nov 11, 2015
Priority date	May 23, 2013
Publication date	Jul 3, 2018
Grant date	Jul 3, 2018

Abstract

A deposition apparatus comprises a target unit, an anode unit into which electrons emitted from the target unit flow, a striker configured to come into contact with the target unit to render the target unit and the anode unit conductive, so as to cause arc discharge between the target unit and the anode unit, a striker driving unit configured to drive the striker in one of a direction toward the target unit and a direction to retract from the target unit, a power supply unit configured to supply power to the target unit and the anode unit, and a control unit configured to control the striker driving unit and the power supply unit. The control unit supplies the power to the target unit and the anode unit after bringing the striker into contact with the target unit.

First claim

What is claimed is:

1. A deposition apparatus comprising:
a target unit;
an anode unit into which electrons emitted from the target unit flow;
a striker configured to come into contact with the target unit to render the target unit and the anode unit conductive, so as to cause arc discharge between the target unit and the anode unit;
a striker driving unit configured to drive the striker in one of a direction toward the target unit and a direction to retract from the target unit;
a power supply unit configured to supply power to the target unit and the anode unit;
a detector configured to detect that the striker is in contact with the target unit; and
a controller configured to control the striker driving unit to bring the striker into contact with the target unit, and to control the power supply unit to start supplying the power to the target unit and the anode unit after the detector detects that the striker contacts the target unit.

2. The deposition apparatus according to claim 1 , wherein the controller is further configured to control the power supply unit to supply the power during a time until the detector detects that the striker that is in contact with the target unit changes to a non-contact state.

3. The deposition apparatus according to claim 1 , wherein the controller is further configured to determine that the striker contacts the target unit when a load on the striker detected by the detector exceeds a predetermined threshold.

4. The deposition apparatus according to claim 1 , wherein the controller is further configured to determine that the striker contacts the target unit when a resistance value between the striker and the target unit detected by the detector is not more than a predetermined threshold.

5. The deposition apparatus according to claim 1 , wherein the controller is further configured to determine that the striker contacts the target unit when a moving speed of the striker detected by the detector is not more than a predetermined threshold.

6. The deposition apparatus according to claim 1 , wherein the power supply unit supplies the power by supplying a current or applying a voltage.

7. The deposition apparatus according to claim 1 , further comprising a filter unit connected to the anode unit and configured to guide electrons emitted from the target unit in a direction toward a processing target.

Assignees

• Canon Anelva Corp

Inventors

• Ono Teruaki
• Shibamoto Masahiro

Classifications

• C23C14/325 Primary

  Electric arc evaporation · CPC title

• H01J37/32669

  Particular magnets or magnet arrangements for controlling the discharge · CPC title

• H01J37/32055

  Arc discharge · CPC title

• G11B5/8408

  protecting the magnetic layer · CPC title

• H01J37/3266

  Magnetic control means · CPC title