Polymer frame for a chip, such that the frame comprises at least one via in series with a capacitor

US10446335B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10446335-B2
Application numberUS-201414555633-A
CountryUS
Kind codeB2
Filing dateNov 27, 2014
Priority dateAug 8, 2013
Publication dateOct 15, 2019
Grant dateOct 15, 2019

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A chip socket defined by an organic matrix framework, wherein the organic matrix framework comprises at least one via post layer where at least one via through the framework around the socket includes at least one capacitor comprising a lower electrode, a dielectric layer and an upper electrode in contact with the via post.

First claim

Opening claim text (preview).

What is claimed is: 1. A chip socket for an embedded chip defined by a frame around a socket, the frame having an organic matrix, wherein the frame comprises at least one via post layer comprising at least one via post, wherein at least one capacitor coupled to at least one via post is incorporated within the frame around the chip socket. 2. The chip socket of claim 1 , wherein a dielectric of the capacitor comprises at least one of the group consisting of Ta 2 O 5 , TiO 2 , Ba x Sr 1-x TiO 3 , BaTiO 3 , BaO 4 SrTi and Al 2 O 3 . 3. The chip socket of claim 1 , wherein a lower electrode of the capacitor comprises a noble metal. 4. The chip socket of claim 1 , wherein the lower electrode of the capacitor comprises a metal selected from the group consisting of gold, platinum and tantalum. 5. The chip socket of claim 1 , wherein an upper electrode of the capacitor comprises a metal selected from the group consisting of gold, platinum and tantalum. 6. The chip socket of claim 1 , wherein the capacitor comprises a lower electrode layer, a dielectric layer and an upper electrode layer, and the at least one via post stands on the upper electrode layer. 7. The chip socket of claim 1 , wherein the capacitor comprises a lower electrode layer and a dielectric layer and the at least one via post stands on the dielectric layer and serves as the upper electrode of the capacitor. 8. The chip socket of claim 7 , wherein contact area of the via post in contact with the dielectric layer multipled by dielectric constant of the dielectric layer divided by thickness of the dielectric layer is capacitance of the capacitor. 9. The chip socket of claim 1 , wherein the at least one capacitor has a capacitance of between 1.5 pF and 300 pF. 10. The chip socket of claim 1 , wherein the at least one capacitor has a capacitance of between 5 pF and 45 pF. 11. The chip socket of claim 1 wherein the frame further comprises at least one feature layer. 12. The chip socket of claim 1 , wherein at least one electronic component is embedded within the socket and is electrically coupled to the at least one via. 13. The chip socket of claim 12 , wherein the at least one electronic component comprises a second capacitor. 14. The chip socket of claim 13 , wherein the second capacitor is a discrete component having a metal termination on at least one end. 15. The chip socket of claim 13 , wherein the second capacitor is a Metal-Insulator-Metal (MIM) capacitor. 16. The chip socket of claim 15 , wherein the Metal-Insulator-Metal (MIM) capacitor comprises a dielectric layer consisting of at least one of the group consisting of Ta 2 O 5 , TiO 2 , Ba x Sr 1-x TiO 3 , BaTiO 3 , BaO 4 SrTi and Al 2 O 3 . 17. The chip socket of claim 15 , wherein a lower electrode of the Metal-Insulator-Metal (MIM) capacitor comprises a noble metal. 18. The chip socket of claim 15 , wherein an upper electrode of the Metal-Insulator-Metal (MIM) capacitor comprises a metal selected from the group consisting of gold, platinum and tantalum. 19. The chip socket of claim 13 , wherein the lower electrode comprises a metal selected from the group consisting of gold, platinum and tantalum. 20. The chip socket of claim 13 , wherein electrodes of the Metal-Insulator-Metal (MIM) capacitor are coupled to vias by feature layers. 21. The chip socket of claim 20 , wherein a feature layer on one side of the frame and embedded components comprises an inductor. 22. The chip socket of claim 20 wherein embedded components within the frame, socket and at least one feature within the feature layer provides a filter. 23. The chip socket of claim 22 , wherein the filter is selected from the group consisting of basic LC low pass filters, LC high pass filters, LC series band pass filters, LC parallel band pass filters and Low Pass Parallel-Chebyshev filters. 24. The chip socket of claim 1 , wherein a chip mounted in a socket is protected from electromagnetic radiation by a Faraday cage comprising via posts within the frame, thereby minimizing electromagnetic interference. 25. The chip socket of claim 24 wherein at least some of the via posts extend in the XY plane. 26. The chip socket for an embedded chip of claim 1 wherein there are a plurality of chip sockets, each one of the chip sockets defined by a respective frame around a respective socket, the respective frame having an organic matrix, wherein the respective frame comprises at least on via post layer comprising at least one via post, wherein at least one capacitor coupled to at least one via post is incorporated within the respective frame around the chip socket. 27. The chip socket of claim 26 wherein the plurality of chip sockets are arranged as an array. 28. The chip socket of claim 27 wherein at least one processor chip is embedded in a first of the plurality of sockets. 29. The chip socket of claim 28 wherein a passive chip comprising at least one capacitor is embedded in a second of the plurality of sockets. 30. The chip socket of claim 26 wherein the at least one capacitor is coupled with at least one inductor in series.

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What does patent US10446335B2 cover?
A chip socket defined by an organic matrix framework, wherein the organic matrix framework comprises at least one via post layer where at least one via through the framework around the socket includes at least one capacitor comprising a lower electrode, a dielectric layer and an upper electrode in contact with the via post.
Who is the assignee on this patent?
Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Tech Co Ltd, Zhuhai Access Semiconductor Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01G17/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 15 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).