Antireflective compositions with thermal acid generators

Patent metadata

Field	Value
Publication number	US-10429737-B2
Application number	US-201715711847-A
Country	US
Kind code	B2
Filing date	Sep 21, 2017
Priority date	Sep 21, 2017
Publication date	Oct 1, 2019
Grant date	Oct 1, 2019

Abstract

New methods and substrates are provided that include antireflective compositions that comprise one or more thermal acid generators.

First claim

What is claimed is:

1. A method for forming a photoresist relief image, comprising:
a) applying on a substrate a layer of a coating composition comprising: 1) a resin; and 2) a solvent component; and 3) a thermal acid generator comprising a structure of Formula (I):
X⊖⊕YH  (I)

wherein Y has a structure of Formula (II):

 each R 1 is independently C 1 -C 6 haloalkyl, —CN, —NO 2 , —COR 2 , —COOR 2 , —CONR 2 or —SO 2 R 2 ;
R 2 is independently hydrogen, C 1 -C 6 alkyl, C 3 -C 6 cycloalkyl or phenyl, which may be optionally substituted;
n is an integer from 1 to 5; and
X is an anion component; and

b) applying a layer of a photoresist composition above the coating composition layer; and
c) exposing the photoresist layer to patterned activating radiation and developing the exposed photoresist layer to form a photoresist life image.

2. A method of any one of claim 1 wherein the coating composition comprises a hydrophilic resin.

3. The method of claim 1 wherein each R 1 is independently —COR 2 , —COOR 2 , —CONR 2 or —SO 2 R 2 .

4. The method of claim 1 wherein each R 1 is independently CF 3 , —CN, —NO 2 , acetyl or ester.

5. The method of claim 1 wherein R 1 is ester that is not reactive during lithographic processing.

6. The method of claim 1 wherein the thermal acid generator compound has a structure of the following Formula (A), (B) or (C):

7. The method of claim 1 wherein YH of Formula (II) is one of the following structures:

8. A coated substrate comprising:
a substrate comprising
a) a coating composition comprising: 1) a resin; and 2) a thermal acid generator comprising a structure of Formula (I):
X⊖⊕YH  (I)

wherein Y has a structure of Formula (II):

 each R 1 is independently halogen, C 1 -C 6 haloalkyl, —CN, —NO 2 , —COR 2 , —COOR 2 , —CONR 2 or —SO 2 R 2 ;
R 2 is independently hydrogen, C 1 -C 6 alkyl, C 3 -C 6 cycloalkyl or phenyl, which may be optionally substituted;
n is an integer from 1 to 5; and
X is an anion component; and

b) a layer of a photoresist composition above the coating composition layer.

9. The substrate of claim 8 wherein YH of Formula (I) is one of the following structures:

10. The substrate of claim 8 wherein each R 1 is independently —COR 2 , —COOR 2 , —CONR 2 or —SO 2 R 2 .

11. The substrate of claim 8 wherein each R′ is independently CF 3 , —CN, —NO 2 , acetyl or ester.

12. The substrate of claim 8 wherein R 1 is ester that is not reactive during lithographic processing.

Assignees

• Rohm & Haas Elect Materials Korea Ltd

Inventors

• Lee Jung-June
• Lim Jae Bong

Classifications

• H10P76/4085

  characterised by the processes involved to create the masks · CPC title

• H10P76/2043

  using an anti-reflective coating · CPC title

• H10P76/2041

  Photolithographic processes · CPC title

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• H10P50/28

  of insulating materials · CPC title