Base generator, base-reactive composition containing said base generator, and base generation method

US10428014B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10428014-B2
Application numberUS-201414901525-A
CountryUS
Kind codeB2
Filing dateJun 25, 2014
Priority dateJun 28, 2013
Publication dateOct 1, 2019
Grant dateOct 1, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc.

First claim

Opening claim text (preview).

The invention claimed is: 1. A compound of formula (A′) or (A″): wherein R 1′ to R 5′ each independently is an alkyl group having 1 to 8 carbon atoms, R 6′ is a hydrogen atom; an alkyl group having 1 to 6 carbon atoms which may have a substituent selected from the group consisting of an epoxy group, an alkoxycarbonyl group having 2 to 6 carbon atoms, a coumarinylcarbonyl group, an anthraquinonyl group, a xanthonyl group and a thioxanthonyl group; an alkenyl group having 2 to 6 carbon atoms; or an arylalkyl group having 7 to 15 carbon atoms which may have a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom, and a nitro group, R 7′ is an alkyl group having 1 to 8 carbon atoms which may have an amino group, and Z − is an anion derived from a carboxylic acid of formula (B 1 ), (B 2 ), (B 3 ) or (B 4 ); wherein R 8 to R 16 each independently is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, or a nitro group; wherein R 17 to R 25 each independently is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, or a nitro group, and Y is an oxygen atom or a sulfur atom; wherein R 26 to R 36 each independently is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, or a nitro group, and two pieces of R may form a ring structure by binding to each other; wherein R 37 to R 42 each independently is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, or a nitro group, and two pieces of R may form a ring structure by binding to each other; wherein R 1′″ to R 4′″ each independently is an alkyl group having 1 to 8 carbon atoms, R 5′″ is an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 14 carbon atoms which may have a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom, and a nitro group, R 7′″ is an aryl group having 6 to 14 carbon atoms which may have a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom, and a nitro group, and Z − is the same as described above. 2. The compound according to claim 1 , wherein the anion Z − derived from a carboxylic acid in the general formula (A′) or (A″) is an anion of formula (B 1 ′), (B 2 ′), (B 3 ′) or (B 4 ′): wherein R 8′ to R 16′ each independently is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; wherein R 17′ to R 25′ each independently is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and Y is an oxygen atom or a sulfur atom; wherein R 26′ , R 27′ , and R 29′ to R 36′ each independently is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 28′ is a hydrogen atom or an alkoxy group having 1 to 4 carbon atoms; wherein R 37′ to R 42′ each independently is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. 3. The compound according to claim 1 , wherein the compound of formula (A) is a compound of formula (1), (2), (3), (4), (5), (6), (7), (8), (9), (10), (11) or (12): 4. A base generator comprising the compound according to claim 1 . 5. The base generator according to claim 4 , which is a base generator generating a base by irradiation of active energy ray. 6. A base-reactive composition, which comprises the base generator according to claim 4 and a base-reactive compound, wherein the base reactive compound is a compound selected from the group consisting of an epoxy-based compound, a silicon-based compound, an isocyanate-based compound, and a polyamic acid-based compound. 7. The base-reactive composition according to claim 6 , wherein the composition is a composition further comprising an organic solvent. 8. A method for generating a base, which comprises irradiating active energy ray having a wavelength of 100 to 700 nm to the compound according to claim 1 for an irradiation time of 0.01 to 1,000 seconds.

Assignees

Inventors

Classifications

  • Anthracenes; Hydrogenated anthracenes · CPC title

  • The ring being saturated · CPC title

  • having unsaturation outside the aromatic rings · CPC title

  • with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

  • C07C279/26Primary

    X and Y being nitrogen atoms, i.e. biguanides · CPC title

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Frequently asked questions

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What does patent US10428014B2 cover?
The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc.
Who is the assignee on this patent?
Fujifilm Wako Pure Chemical Corp, Univ Tokyo Science Found
What technology area does this patent fall under?
Primary CPC classification C07C279/26. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 01 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).