Methods for controlling pore morphology in aerogels using electric fields and products thereof
US-9852824-B2 · Dec 26, 2017 · US
US10407792B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10407792-B2 |
| Application number | US-201615236313-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 12, 2016 |
| Priority date | Apr 13, 2010 |
| Publication date | Sep 10, 2019 |
| Grant date | Sep 10, 2019 |
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In one embodiment, a method for forming a ceramic, metal, or cermet includes: providing a first solution comprising a first solvent and a first material to a device including an electrophoretic deposition (EPD) chamber; applying a voltage difference across a first electrode and a second electrode of the device; electrophoretically depositing the first material above the first electrode to form a first layer; introducing a second solution including a second solvent and a second material to the EPD chamber; applying a voltage difference across the first electrode and the second electrode; and electrophoretically depositing the second material above the first electrode to form a second layer. The first layer has a first composition, a first microstructure, and a first density, while the second layer has a second composition, a second microstructure, and a second density. At least one of the foregoing features of the first and second layers are different.
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What is claimed is: 1. A method for forming a ceramic, metal, or cermet using an electrophoretic deposition (EPD) device comprising an EPD chamber, a first electrode positioned toward one end of the EPD chamber, and a second electrode positioned toward an opposite end of the EPD chamber, the method comprising: providing a first solution to the EPD chamber using an automated injection system, the first solution comprising a first solvent and a first material; applying a first voltage difference across the first electrode and the second electrode after providing the first solution to the EPD chamber; electrophoretically depositing the first material above the first electrode to form a first layer, wherein the first layer has a first composition, a first microstructure, and a first density; introducing a second solution to the EPD chamber using the automated injection system, the second solution comprising a second solvent and a second material; applying a second voltage difference across the first electrode and the second electrode after providing the second solution to the EPD chamber; and electrophoretically depositing the second material above the first electrode to form a second layer, wherein the second layer has a second composition, a second microstructure, and a second density, wherein the first and second layers form a composite layer having a gradient in at least one characteristic of the composite layer along a line extending parallel to a plane of deposition of the composite layer, the at least one characteristic being selected from the group consisting of: composition, microstructure, and density, wherein at least one of the following provisos are satisfied: the first and second compositions are different, the first and second microstructures are different, and the first and second densities are different. 2. The method for forming a ceramic, metal, or cermet as recited in claim 1 , comprising: providing light in a first pattern to a photoconductive layer positioned near the first electrode, wherein the first electrode is transparent or semi-transparent and the photoconductive layer is between the first electrode and the second electrode, wherein portions of the photoconductive layer become conductive in response to the light according to the first pattern, and wherein the first material is electrophoretically deposited above the photoconductive layer according to the first pattern. 3. The method for forming a ceramic, metal, or cermet as recited in claim 2 , comprising: providing light in a second pattern to the photoconductive layer after introducing the second solution to the EPD chamber, wherein portions of the photoconductive layer become conductive in response to the light according to the second pattern, wherein the second material is electrophoretically deposited above the photoconductive layer according to the second pattern, and wherein the first and second patterns direct the deposition of the first and second materials to form a gradient in composition, microstructure and/or density in a direction parallel to a surface of the photoconductive layer facing the composite layer. 4. The method for forming a ceramic, metal, or cermet as recited in claim 1 , wherein the first electrode has a non-planar shape. 5. The method for forming a ceramic, metal, or cermet as recited in claim 1 , wherein the first solvent and the second solvent are the same and the first and second materials are different. 6. The method for forming a ceramic, metal, or cermet as recited in claim 1 , wherein the first solvent and the second solvent are different and the first and second materials are the same. 7. The method for forming a ceramic, metal, or cermet as recited in claim 1 , wherein a gradient exists between the first layer and the second layer, the gradient being a transition from the first composition, the first microstructure, and the first density, to the second composition, the second microstructure, and the second density. 8. The method for forming a ceramic, metal, or cermet as recited in claim 7 , wherein the gradient from the first layer to the second layer is abrupt. 9. The method for forming a ceramic, metal, or cermet as recited in claim 7 , wherein the gradient from the first layer to the second layer is gradual. 10. The method for forming a ceramic, metal, or cermet as recited in claim 1 , wherein at least one additional characteristic of the composite layer is selected from the group consisting of: the first and second composition are the same, the first and second microstructure are the same, and the first and second density are the same. 11. The method for forming a ceramic, metal, or cermet as recited in claim 1 , further comprising expelling the first solution from the EPD chamber prior to introducing the second solution to the EPD chamber. 12. The method for forming a ceramic, metal, or cermet as recited in claim 1 , wherein the first layer comprises boron carbide and the second layer comprises aluminum. 13. The method for forming a ceramic, metal, or cermet as recited in claim 1 , wherein the composite layer is planar. 14. A method for forming a ceramic, metal, or cermet, the method comprising: providing an electrophoretic deposition (EPD) device comprising: an EPD chamber; a first electrode positioned at an end of the EPD chamber; and a second electrode positioned at an opposite end of the EPD chamber; providing a first solution to the EPD chamber using an automated injection system, the first solution comprising a first solvent and a first material; applying a first voltage difference across the first electrode and the second electrode after providing the first solution to the EPD chamber; electrophoretically depositing the first material above the first electrode to form a first layer, wherein the first layer has a first composition, a first microstructure, and a first density; introducing a second solution to the EPD chamber using the automated injection system, the second solution comprising a second solvent and a second material; applying a second voltage difference across the first electrode and the second electrode after providing the second solution to the EPD chamber; electrophoretically depositing the second material above the first electrode to form a second layer, wherein the second layer has a second composition, a second microstructure, and a second density, wherein at least one of the following provisos are satisfied: the first and second composition are different; the first and second microstructures are different; and the first and second density are different; providing light in a first pattern to a photoconductive layer positioned near the first electrode, wherein the first electrode is transparent or semi-transparent and the photoconductive layer is between the first electrode and the second electrode, wherein portions of the photoconductive layer become conductive in response to the light according to the first pattern, and wherein the first material is electrophoretically deposited above the photoconductive layer according to the first pattern; and providing light in a second pattern to the photoconductive layer after introducing the second solution to the EPD chamber, wherein portions of the photoconductive layer become conductive in response to the light according to the second pattern, wherein the second material is electrophoretically deposited above the photoconductive layer according to the second pattern, and wherein the first and second patterns direct the deposition of the first and second materials to form a gradient in composition, m
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