Pellicle film including graphite-containing thin film for extreme ultraviolet lithography

Patent metadata

Field	Value
Publication number	US-10394117-B2
Application number	US-201815977283-A
Country	US
Kind code	B2
Filing date	May 11, 2018
Priority date	Dec 17, 2013
Publication date	Aug 27, 2019
Grant date	Aug 27, 2019

Abstract

A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.

First claim

The invention claimed is:

1. A method of manufacturing a pellicle film, the method comprising:
placing a nickel foil in a heating container;
heat-treating the nickel foil during a first time period at a first temperature;
heat-treating the nickel foil during a second time period at a second temperature;
cooling the nickel foil at a third temperature;
separate from the nickel foil a graphite film grown on a surface of the nickel foil, by etching the nickel foil using a first solution;
removing impurities from the graphite film using a second solution and/or water; and
placing the graphite film on a frame to form the pellicle film.

2. The method of claim 1 , wherein the nickel foil has a thickness of 25 μm.

3. The method of claim 1 , wherein the second time period is longer than the first time period.

4. The method of claim 1 , wherein the first solution includes iron (III) chloride.

5. The method of claim 1 , wherein the first solution includes cericammonium nitrate.

6. The method of claim 1 , wherein the second solution is a hydrochloric acid solution.

7. The method of claim 1 , wherein the first temperature is the same as the second temperature, and
the first temperature is higher than the third temperature.

8. The method of claim 1 , wherein the pellicle film includes a graphite film.

9. A method of manufacturing a pellicle film, the method comprising:
heat-treating the nickel foil during a first time period at a first temperature;
cooling the nickel foil at a second temperature;
separate from the nickel foil a graphite film grown on a surface of the nickel foil, by etching the nickel foil;
removing impurities from the graphite film; and
placing the graphite film on a frame to form the pellicle film.

10. The method of claim 9 , further comprising heat-treating the nickel foil during a second time period at a third temperature, before the cooling the nickel foil.

11. The method of claim 9 , wherein the etching the nickel foil is performed by using a first solution.

12. The method of claim 9 , wherein the removing the impurities is performed by using a second solution and/or water.

13. The method of claim 9 , wherein the first time period is 30 minutes, and the second time period is 90 minutes.

14. The method of claim 9 , wherein the first temperature is 1,035° C., and
the second temperature is a room temperature.

15. A pellicle film comprising:
graphite-containing film including a graphite,
wherein the pellicle film is a free-standing film supported by a polygonal frame.

16. The pellicle film of claim 15 , wherein the polygonal frame is a rectangle.

17. The pellicle film of claim 15 , wherein one side of the polygonal frame is between 5 mm and 30 mm.

18. The pellicle film of claim 15 , wherein the graphite has a transmittance of 90% with respect to extreme ultraviolet (EUV) light when a thickness of the graphite is 16.4 nm.

19. The pellicle film of claim 15 , wherein the pellicle film has a transmittance of 60% or more with respect to EUV light having a wavelength of 13.5 nm.

20. The pellicle film of claim 15 , wherein the graphite-containing film is a thin film having a structure in which one selected from the group consisting of silicon, molybdenum, zirconium, ruthenium, and combinations thereof is stacked or patterned on or under the graphite-containing film.

Assignees

• Samsung Electronics Co Ltd
• Research & Business Found Sungkyunkwan Univ
• Fine Semitech Co Ltd

Inventors

• Kim Mun Ja
• Yoo Ji-Beom
• Kim Seul-Gi
• Cho Sang-Jin
• Chang Myung-Shik
• You Jang-Dong

Classifications

• G03F1/64 Primary

  characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title

• G03F1/62

  Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

• G03F1/22 Primary

  Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof · CPC title