Pellicle for reticle and multilayer mirror

Patent metadata

Field	Value
Publication number	US-9482960-B2
Application number	US-201414181076-A
Country	US
Kind code	B2
Filing date	Feb 14, 2014
Priority date	Jun 25, 2010
Publication date	Nov 1, 2016
Grant date	Nov 1, 2016

Abstract

A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

First claim

What is claimed is:

1. A pellicle module constructed and arranged for an EUV reticle, the pellicle module comprising:
a pellicle frame, configured and arranged to hold a pellicle at a fixed distance from the EUV reticle; and
wherein the pellicle comprises a layer of graphene.

2. The pellicle according to claim 1 , wherein the layer of graphene is formed from a single atomic layer of carbon.

3. The pellicle according to claim 1 , wherein the pellicle comprises a plurality of graphene layers.

4. The pellicle according to claim 1 , wherein the pellicle comprises graphene flakes.

5. The pellicle according to claim 1 , wherein the pellicle comprises a grid to support the graphene.

6. The pellicle according to claim 1 , wherein the pellicle does not comprise a grid.

7. The pellicle according to claim 1 , wherein the pellicle is doped.

8. The pellicle according to claim 1 , wherein the pellicle comprises a support member configured to be removable from a lithographic apparatus and/or the reticle.

9. The pellicle according claim 1 , wherein the pellicle comprises alternating layers of graphene and supporting material.

10. The pellicle according to claim 1 , wherein the graphene is configured to function as an anti-diffusion barrier.

11. The pellicle according to claim 1 , wherein the graphene comprises graphene derivatives.

12. The pellicle according to claim 11 , wherein the graphene derivatives are selected from the group consisting of: graphane, graphene fluoride, graphene bromide, graphene chloride and graphene iodide.

13. A lithographic apparatus comprising:
a radiation source configured to produce a radiation beam and a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern to form a patterned radiation beam; wherein the support is provided with a pellicle comprising a layer of graphene.

Assignees

• Asml Netherlands Bv

Inventors

• Yakunin Andrei Mikhailovich
• Banine Vadim Yevgenyevich
• Loopstra Erik Roelof
• Van Der Schoot Harmen Klaas
• Stevens Lucas Henricus Johannes
• Van Kampen Maarten

Classifications

• G02B5/0816

  Multilayer mirrors, i.e. having two or more reflecting layers (G02B5/0883, G02B5/0891 take precedence) · CPC title

• H01B1/24

  the conductive material comprising carbon-silicon compounds, carbon or silicon · CPC title

• G03F1/24

  Reflection masks; Preparation thereof · CPC title

• G03F7/70958 Primary

  Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties · CPC title

• H01B1/04

  mainly consisting of carbon-silicon compounds, carbon or silicon · CPC title