Pellicle for reticle and multilayer mirror
US-9482960-B2 · Nov 1, 2016 · US
Pellicle film including graphite-containing thin film for extreme ultraviolet lithography
US10001700B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10001700-B2 |
| Application number | US-201415034014-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 3, 2014 |
| Priority date | Dec 17, 2013 |
| Publication date | Jun 19, 2018 |
| Grant date | Jun 19, 2018 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
First claim
Opening claim text (preview).
The invention claimed is: 1. A pellicle film for extreme ultraviolet (EUV) lithography, the pellicle film comprising a graphite-containing thin film, wherein the graphite-containing thin film comprises a graphite thin film. 2. The pellicle film of claim 1 , wherein the pellicle film has a transmittance of 60% or more with respect to EUV light having a wavelength of 13.5 nm. 3. The pellicle film of claim 1 , wherein a thickness of the pellicle film is 50 nm or less. 4. The pellicle film of claim 1 , wherein the graphite-containing thin film is a free-standing nano-thin film. 5. The pellicle film of claim 1 , wherein the pellicle film is used in photolithography using an incident beam having a wavelength of 190 nm or less. 6. The pellicle film of claim 1 , wherein the pellicle film is supported by a square frame having one side of 5 mm or more so that the pellicle film is free-standing. 7. The pellicle film of claim 1 , wherein the pellicle film is supported by a round frame having a diameter of 5 mm or more so that the pellicle film is free-standing.
Assignees
Inventors
Classifications
- G03F1/22Primary
Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof · CPC title
- G03F1/64Primary
characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title
Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title
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Frequently asked questions
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- What does patent US10001700B2 cover?
- A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
- Who is the assignee on this patent?
- Samsung Electronics Co Ltd, Research & Business Found Sungkyunkwan Univ, Fine Semitech Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F1/22. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jun 19 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).