Gas nozzle substrate processing apparatus
US-D783351-S · Apr 11, 2017 · US
US10364498B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10364498-B2 |
| Application number | US-201514643165-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 10, 2015 |
| Priority date | Mar 31, 2014 |
| Publication date | Jul 30, 2019 |
| Grant date | Jul 30, 2019 |
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According to one embodiment, a gas supply pipe has a first gas pipe configured to blow a gas which has flowed from an inflow opening via first gas blow holes arranged along a longitudinal direction, and a second gas pipe provided in parallel with the first gas pipe. The second gas pipe has second gas blow holes arranged along the longitudinal direction, and allows the gas to flow in a direction opposite to the first gas pipe.
Opening claim text (preview).
The invention claimed is: 1. A gas supply pipe comprising: a first gas pipe having an inflow opening into which a gas flows and having first gas blow holes arranged apart from one another along a longitudinal direction; and a second gas pipe provided coaxially with the first gas pipe, the second gas pipe having second gas blow holes arranged apart from one another along the longitudinal direction, and allowing the gas to flow in a direction opposite to the first gas pipe, wherein each of the first gas blow holes corresponds to two or more of the second gas blow holes, forming a set of blow holes; in each set of blow holes, the first gas blow hole is sandwiched by the two or more second gas blow holes; two or more sets of blow holes are arranged apart from one another in the first gas pipe and the second gas pipe; and the first gas blow holes and the second gas blow holes allow the gas to blow therefrom toward a center of a treatment target. 2. The gas supply pipe of claim 1 , wherein an end of the first gas pipe opposite to the inflow opening is connected to an inflow side end of the second gas pipe. 3. The gas supply pipe of claim 1 , wherein the pitch of the first gas blow holes is the same as the pitch of the second gas blow holes. 4. Gas treatment equipment comprising: a treatment chamber containing a treatment target; a gas supply pipe configured to supply a gas into the treatment chamber; and a gas supply source connected to an inflow opening of the gas supply pipe, the gas supply pipe comprising a first gas pipe having the inflow opening into which the gas flows and having first gas blow holes arranged apart from one another along a longitudinal direction, and a second gas pipe provided coaxially with the first gas pipe, the second gas pipe having second gas blow holes arranged apart from one another along the longitudinal direction, and allowing the gas to flow in a direction opposite to the first gas pipe, wherein each of the first gas blow holes corresponds to two or more of the second gas blow holes, forming a set of blow holes; in each set of blow holes, the first gas blow hole is sandwiched by the two or more second gas blow holes; two or more sets of blow holes are arranged apart from one another in the first gas pipe and the second gas pipe; and the first gas blow holes and the second gas blow holes allow the gas to blow therefrom toward a center of the treatment target. 5. The gas treatment equipment of claim 4 , wherein an end of the first gas pipe opposite to the inflow opening is connected to an inflow side end of the second gas pipe. 6. The gas treatment equipment of claim 4 , wherein the pitch of the first gas blow holes is the same as the pitch of the second gas blow holes.
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the substrate being rotated · CPC title
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