Ion source repeller shield comprising a labyrinth seal

US10361069B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10361069-B2
Application numberUS-201715477680-A
CountryUS
Kind codeB2
Filing dateApr 3, 2017
Priority dateApr 4, 2016
Publication dateJul 23, 2019
Grant dateJul 23, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An arc chamber liner has first and second surfaces and a hole having a first diameter. A liner lip having a second diameter extends upwardly from the second surface toward the first surface and surrounds the hole. An electrode has a shaft with a third diameter and a head with a fourth diameter. The third diameter is less than the first diameter and passes through the body and hole and is electrically isolated from the liner by an annular gap. The head has a third surface having an electrode lip extending downwardly from the third surface toward the second surface. The electrode lip has a fifth diameter between the second and fourth diameters. A spacing between the liner and electrode lips defines a labyrinth seal to generally prevent contaminants from entering the annular gap. The shaft has an annular groove configured to accept a boron nitride seal.

First claim

Opening claim text (preview).

The invention claimed is: 1. An ion source, comprising: an arc chamber having a body defining an interior region of the arc chamber; a liner operably coupled to the body of the arc chamber, wherein the liner is unitary and generally encloses the interior region of the arc chamber, the liner having a first surface and a second surface, wherein the second surface is recessed from the first surface, therein defining a liner recess region, the liner further having a hole defined therethrough in the liner recess region, wherein the hole has a first diameter, and wherein the liner further comprises a liner lip extending upwardly from the second surface toward the first surface, wherein the liner lip surrounds the hole and has a second diameter associated therewith; and an electrode having a shaft and a head, wherein the shaft has a third diameter that is less than the first diameter, wherein the shaft passes through the body and the hole in the liner and is electrically isolated from the liner by an annular gap, wherein the head has a fourth diameter and comprises a third surface having an electrode lip extending downwardly from the third surface toward the second surface, wherein the electrode lip has a fifth diameter associated therewith, wherein the fifth diameter is between the second diameter and the fourth diameter, wherein a spacing between the liner lip and electrode lip generally defines a labyrinth seal and generally prevents contaminants from entering the annular gap. 2. The ion source of claim 1 , further comprising a boron nitride seal, wherein the shaft further comprises an annular groove defined therein having a sixth diameter, wherein the sixth diameter is less than the third diameter, and wherein the boron nitride seal engages the annular groove, therein sealing the interior region of the arc chamber from an exterior region thereof. 3. The ion source of claim 1 , wherein the spacing between the liner lip and the electrode lip is approximately equal to the annular gap between the shaft and the liner. 4. The ion source of claim 3 , wherein the shaft further comprises an annular groove defined therein, wherein the annular groove has a sixth diameter associated therewith, and wherein the sixth diameter is less than the third diameter. 5. The ion source of claim 4 , wherein the annular groove is configured to accept a boron nitride seal, whereby the annular groove, in conjunction with the liner lip and electrode lip further define the labyrinth seal, therein reducing a gas conductance through the annular gap. 6. The ion source of claim 5 , wherein the boron nitride seal engages the annular groove of the shaft, therein sealing the interior region of the arc chamber from an exterior region thereof. 7. The ion source of claim 5 , wherein the annular groove protects a sealing surface between the boron nitride seal and the shaft from corrosive gases. 8. The ion source of claim 1 , wherein the electrode comprises a repeller. 9. The ion source of claim 1 , wherein the labyrinth seal is further defined in an outer diameter of the shaft, wherein the labyrinth seal is configured to accept a boron nitride seal. 10. The ion source of claim 9 , wherein the labyrinth seal generally protects a sealing surface of the shaft from corrosive gases associated with the ion source by reducing conductance of the corrosive gases into an area associated with the boron nitride seal. 11. An ion source, comprising: an arc chamber having a body defining an interior region of the arc chamber; a liner operably coupled to the body of the arc chamber, wherein the liner is unitary and generally encloses the interior region of the arc chamber, the liner having a first surface and a second surface, wherein the second surface is recessed from the first surface, therein defining a liner recess region, the liner further having a hole defined therethrough in the liner recess region, wherein the hole has a first diameter, and wherein the liner further comprises a liner lip extending upwardly from the second surface toward the first surface, wherein the liner lip surrounds the hole and has a second diameter associated therewith; and an electrode having a shaft and a head, wherein the shaft has a third diameter that is less than the first diameter, wherein the shaft passes through the body and the hole in the liner and is electrically isolated from the liner by an annular gap, wherein the head has a fourth diameter and comprises a third surface having an electrode lip extending downwardly from the third surface toward the second surface, wherein the electrode lip has a fifth diameter associated therewith, wherein the fifth diameter is between the second diameter and the fourth diameter, wherein a spacing between the liner lip and electrode lip generally defines a labyrinth seal and generally prevents contaminants from entering the annular gap, and wherein the shaft further comprises an annular groove defined therein having a sixth diameter, wherein the sixth diameter is less than the third diameter; and a boron nitride seal, wherein the boron nitride seal engages the annular groove, therein sealing the interior region of the arc chamber from an exterior region thereof. 12. The ion source of claim 11 , wherein the annular groove, in conjunction with the liner lip and electrode lip further define the labyrinth seal, therein reducing a gas conductance through the annular gap. 13. The ion source of claim 11 , wherein the annular groove protects a sealing surface between the boron nitride seal and the shaft from corrosive gases. 14. The ion source of claim 11 , wherein the labyrinth seal generally protects a sealing surface of the shaft from corrosive gases associated with the ion source by reducing conductance of the corrosive gases into an area associated with the boron nitride seal. 15. The ion source of claim 11 , wherein the spacing between the liner lip and the electrode lip is approximately equal to the annular gap between the shaft and the liner. 16. The ion source of claim 11 , wherein the electrode comprises a repeller. 17. The ion source of claim 11 , further comprising an arc slit for extraction of ions from the arc chamber. 18. An apparatus for preventing a leakage of gases from an interior region of a body of an arc chamber to an exterior region of the body of the arc chamber, the apparatus comprising: a liner having a first surface and a second surface, wherein the second surface is recessed from the first surface, therein defining a liner recess region, wherein the liner is unitary and generally encloses the interior region of the arc chamber, the liner further having a hole defined therethrough in the liner recess region, wherein the hole has a first diameter, and wherein the liner further comprises a liner lip extending upwardly from the second surface toward the first surface, wherein the liner lip surrounds the hole and has a second diameter associated therewith; and an electrode having a shaft and a head, wherein the shaft has a third diameter that is less than the first diameter, wherein the shaft passes through the body and the hole in the liner and is electrically isolated from the liner by an annular gap, wherein the head has a fourth diameter and comprises a third surface having an electrode lip extending downwardly from the third surface toward the second surface, wherein the electrode lip has a fifth diameter associated therewith, wherein the fifth diameter is between the second diameter and the fourth diameter, wherein a spacing between the liner lip and electrode lip is approximat

Assignees

Inventors

Classifications

  • Mounting, supporting, spacing or insulating electrodes · CPC title

  • Protection means, e.g. coatings · CPC title

  • Avoiding deleterious effects due to interactions between particles and tube elements · CPC title

  • Ion implantation · CPC title

  • Constructional details of the reactor · CPC title

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Frequently asked questions

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What does patent US10361069B2 cover?
An arc chamber liner has first and second surfaces and a hole having a first diameter. A liner lip having a second diameter extends upwardly from the second surface toward the first surface and surrounds the hole. An electrode has a shaft with a third diameter and a head with a fourth diameter. The third diameter is less than the first diameter and passes through the body and hole and is electr…
Who is the assignee on this patent?
Axcelis Tech Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/32431. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 23 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).