Front referenced anode

US10351968B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10351968-B2
Application numberUS-201615093435-A
CountryUS
Kind codeB2
Filing dateApr 7, 2016
Priority dateSep 10, 2010
Publication dateJul 16, 2019
Grant dateJul 16, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Apparatus and methods for electroplating are described. Apparatus described herein include anode supports including positioning mechanisms that maintain a consistent distance between the surface of the wafer and the surface of a consumable anode during plating. Greater uniformity control is achieved. The consumable anode in one implementation has a plurality of through channels and at least one depression on its surface (e.g., a depression surrounding a channel) that is configured for registering with a protrusion on a component of an anode assembly, such as with a support plate. Fasteners may pass through the channels in the anode and attach it to a charge plate.

First claim

Opening claim text (preview).

We claim: 1. An anode for an electroplating apparatus, the anode comprising a first surface and a second surface, substantially parallel to the first surface, wherein the anode is a consumable anode comprising a metal that is dissolvable during electroplating, wherein the consumable anode has a plurality of through channels connecting the first and second surfaces, wherein one of the first and second surfaces has at least one depression configured for registering with a protrusion on a component of an anode assembly, and wherein the at least one depression surrounds at least one through channel of the plurality of the through channels. 2. An anode assembly comprising: (a) a consumable anode for an electroplating apparatus, the consumable anode comprising a first surface and a second surface, substantially parallel to the first surface, wherein the consumable anode has a plurality of through channels connecting the first and second surfaces, and wherein one of the first and second surfaces has a plurality of depressions; (b) a support plate comprising a plurality of protrusions configured to register with the plurality of depressions on the consumable anode; and (c) a base plate comprising a plurality of springs configured to be compressed against the support plate. 3. An anode assembly comprising: (a) a consumable anode for an electroplating apparatus, the consumable anode comprising a first surface and a second surface, substantially parallel to the first surface, wherein the consumable anode has a plurality of through channels connecting the first and second surfaces, and wherein one of the first and second surfaces has a plurality of depressions; (b) a support plate comprising a plurality of protrusions configured to register with the plurality of depressions on the consumable anode; and (c) fasteners passing through the plurality of through channels of the anode. 4. A segment of an anode, the segment comprising: a first surface and a second surface, substantially parallel to the first surface, wherein the anode is a consumable anode and wherein the segment of the consumable anode comprises a metal that is dissolvable during electroplating, wherein the segment of the consumable anode has at least one channel connecting the first and second surfaces, and wherein one of the first and second surfaces has at least one depression configured for registering with a protrusion on a component of an anode assembly. 5. The anode of claim 1 , wherein the at least one depression is a circular depression. 6. The anode of claim 1 , wherein the anode has a unitary body. 7. The anode of claim 1 , wherein the anode dissolvable metal comprises copper. 8. The anode of claim 1 , wherein the anode is disk-shaped. 9. The anode assembly of claim 2 , further comprising a charge plate, wherein the charge plate is connected to a power supply via cables attached to the charge plate. 10. The anode assembly of claim 9 , wherein the anode is bolted to the charge plate. 11. The anode assembly of claim 2 , wherein the base plate further comprises a plurality of guiding rods, wherein said guiding rods are configured to pass through a portion of the plurality of through channels of the consumable anode. 12. The anode assembly of claim 11 , wherein each guiding rod is located in the center of each spring of the plurality of springs. 13. The anode assembly of claim 3 , wherein the fasteners are bolts attaching the anode to a charge plate. 14. The anode segment of claim 4 , wherein the dissolvable metal consumable anode segment comprises copper. 15. The anode segment of claim 4 , wherein the at least one depression surrounds the at least one through channel. 16. The anode segment of claim 4 , wherein the consumable anode segment has a shape of a circular sector. 17. The anode segment of claim 4 , wherein the anode segment has a shape of a circular sector with a central angle of 180 degrees or less. 18. A method of electroplating a metal onto a work piece comprising: (a) providing the work piece into an electroplating apparatus comprising an anode having a first surface and a second surface, substantially parallel to the first surface, wherein the anode is a consumable anode comprising a metal that is dissolvable during electroplating, and wherein the consumable anode has a plurality of through channels connecting the first and second surfaces, and wherein one of the first and second surfaces has at least one depression configured for registering with a protrusion on a component of an anode assembly and wherein the at least one depression surrounds at least one through channel of the plurality of the through channels; and (b) electroplating the metal on the work piece in the electroplating apparatus comprising the consumable anode while dissolving the consumable anode. 19. The method of claim 18 , wherein the consumable anode comprises a plurality of segments. 20. The method of claim 18 , wherein the anode assembly comprises: (i) a support plate comprising at least one protrusion configured to register with the at least one depression on the consumable anode; and (ii) a base plate comprising at least one spring configured to be compressed against the support plate. 21. The method of claim 20 , wherein the consumable anode comprises a plurality of depressions, and wherein the support plate comprises a plurality of protrusions configured to register with the plurality of depressions on the consumable anode. 22. The method of claim 18 , wherein the anode assembly further comprises a charge plate, wherein the charge plate is connected to a power supply via cables attached to the charge plate. 23. The method of claim 18 , wherein the anode assembly comprises: (i) a support plate comprising at least one protrusion configured to register with the at least one depression on the consumable anode; and (ii) at least one fastener passing through the at least one channel of the anode. 24. The method of claim 23 , wherein the anode assembly comprises a plurality of fasteners, and wherein the fasteners are bolts attaching the consumable anode to a charge plate.

Assignees

Inventors

Classifications

  • Electrolytic deposition, i.e. electroplating; Electroless plating · CPC title

  • Suspending or supporting devices for articles to be coated · CPC title

  • Process control or regulation (controlling or regulating in general G05) · CPC title

  • Semiconductors · CPC title

  • Electrodes {, e.g. composition, counter electrode} · CPC title

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What does patent US10351968B2 cover?
Apparatus and methods for electroplating are described. Apparatus described herein include anode supports including positioning mechanisms that maintain a consistent distance between the surface of the wafer and the surface of a consumable anode during plating. Greater uniformity control is achieved. The consumable anode in one implementation has a plurality of through channels and at least one…
Who is the assignee on this patent?
Novellus Systems Inc
What technology area does this patent fall under?
Primary CPC classification C25D17/12. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 16 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).