Position and temperature monitoring of ALD platen susceptor

Patent metadata

Field	Value
Publication number	US-10312120-B2
Application number	US-201414774377-A
Country	US
Kind code	B2
Filing date	Mar 14, 2014
Priority date	Mar 15, 2013
Publication date	Jun 4, 2019
Grant date	Jun 4, 2019

Abstract

Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.

First claim

What is claimed is:

1. A deposition apparatus comprising:
a gas distribution assembly having a front surface;
a susceptor assembly to rotate a plurality of substrates around a central axis and move closer to and further from the gas distribution assembly, the susceptor assembly having a top surface facing the front surface of the gas distribution assembly and a bottom surface, the region between the top surface of the susceptor assembly and the front surface of the gas distribution assembly defining a gap, the top surface having a plurality of recesses to hold a plurality of substrates, each recess having a center, the bottom surface having an alignment reference point opposite each of the plurality of recesses and a temperature reference point comprising a groove at a fixed diameter, the alignment reference point comprising a recess center reference point and a camera reference point, the camera reference point having a shape involving at least two vertices having a known distance, the recess center reference point providing an indication of the position of the center of the recess;
a camera with a field of view directed at the bottom surface of the susceptor assembly and positioned so that when one of the plurality of recesses is positioned adjacent a loading station, the alignment reference point opposite the recess and the temperature reference point are within the field of view of the camera; and
a controller connected to the camera to determine a position of the recess adjacent the loading station from the alignment reference point and a temperature of the susceptor assembly from the position of the temperature reference point, the controller configured to measure a distance between the at least two vertices to determine one or more of a distance of the camera from the susceptor assembly or a distance between the front surface of the gas distribution assembly and the top surface of the susceptor assembly and configured to adjust the gap.

2. The apparatus of claim 1 , wherein the camera reference point provides an indication of the camera alignment relative to the recess center reference point to correct for marking misalignment.

3. The apparatus of claim 2 , wherein the recess center reference point comprises a shallow hole in the bottom surface of the susceptor assembly.

4. The apparatus of claim 2 , wherein the camera reference point comprises a shape made up of at least three vertices having known distances between each vertex.

5. The apparatus of claim 4 , wherein the camera reference point comprises a rectangular shape.

6. The apparatus of claim 1 , wherein the controller includes a memory to store calibrated values of each alignment reference point, the controller determining the position of the recess by comparing the alignment reference point to the stored calibrated values.

7. The apparatus of claim 6 , wherein the controller is in communication with the susceptor assembly to send signals to rotate the susceptor assembly based on the determination of the position of the recess.

8. The apparatus of claim 6 , wherein the controller is in communication with a transfer robot to provide a signal to the robot indicating a location of the recess so that the robot can place a substrate in the recess in a consistent position.

9. The apparatus of claim 1 , wherein the temperature reference point and the alignment reference point are within the field of view at the same time and the controller determines the position of the recess compensating for the temperature of the susceptor assembly.

10. The apparatus of claim 1 , wherein the controller further comprises a feedback circuit in communication with at least one gap control actuation device, the controller providing a signal to the at least one gap control actuation device to direct the device to move one or more of the susceptor assembly and the gas distribution assembly to change the gap.

11. The apparatus of claim 10 , wherein the gap control actuation device comprises one or more actuator.

12. The apparatus of claim 10 , wherein the gap control actuation device comprises a support post.

13. A deposition apparatus comprising:
a gas distribution assembly having a front surface;
a susceptor assembly to rotate a plurality of substrates around a central axis, the susceptor assembly having a top surface facing the front surface and a bottom surface, the region between the top surface and the front surface defining a gap, the top surface having a plurality of recesses to hold the plurality of substrates, each recess having a center, the bottom surface having an alignment reference point opposite each of the plurality of recesses and a temperature reference point comprising a groove at a fixed diameter, the alignment reference point comprising a recess center reference point and a camera reference point, the camera reference point having a shape involving at least two vertices having a known distance, the recess center reference point providing an indication of the position of the center of the recess;
a gap control actuation device connected to the susceptor assembly and configured to adjust the gap by moving the susceptor assembly;
a camera with a field of view directed at the bottom surface of the susceptor assembly and positioned so that when one of the plurality of recesses is positioned adjacent a loading station, the alignment reference point opposite the recess and the temperature reference point are within the field of view of the camera; and
a controller connected to the camera and the gap control actuation device, the controller configured to determine a position of the recess adjacent the loading station from the alignment reference point and to determine a temperature of the susceptor assembly from the position of the temperature reference point, the controller configured to measure a distance between the at least two vertices to determine one or more of a distance of the camera from the susceptor assembly or the gap, the controller configured to control the gap control actuation device to adjust the gap.

14. A method of transferring a substrate to a rotatable susceptor assembly, the method comprising:
rotating the susceptor assembly around a central axis so that one of a plurality of recesses in a top surface of the susceptor assembly is positioned adjacent a loading area of a processing chamber, each recess having a center;
moving the susceptor assembly closer to and further from a gas distribution assembly, the top surface of the susceptor assembly facing a front surface of the gas distribution assembly, the region between the top surface of the susceptor assembly and the front surface of the gas distribution assembly defining a gap;
finding an alignment reference point on a bottom surface of the susceptor assembly opposite the recess in the top surface using a camera with a field of view directed at the bottom surface of the susceptor assembly, the alignment reference point comprising a recess center reference point and a camera reference point, the recess center reference point providing an indication of the position of the center of the recess, the camera reference point having a shape including at least two vertices having a known distance;
finding a temperature reference point on the bottom surface of the susceptor assembly using the camera with a field of view directed at the bottom surface of the susceptor assembly, the temperature reference point comprising a groove at a fixed diameter;
evaluating a position of the recess on the top surface of the susceptor assembly by measuring a position of the alignment reference point on the bottom surface of the susceptor assem

Assignees

• Applied Materials Inc

Inventors

• Ravid Abraham
• Griffin Kevin
• Yudovsky Joseph
• Gangakhedkar Kaushal
• Dzilno Dmitry A
• Minkovich Alex

Classifications

• H10P72/7621

  characterised by supporting two or more semiconductor substrates · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0602

  Temperature monitoring · CPC title

• H10P72/0606 Primary

  Position monitoring, e.g. misposition detection or presence detection · CPC title

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title