Repatternable nanoimprint lithography stamp

Patent metadata

Field	Value
Publication number	US-10310374-B2
Application number	US-201615239875-A
Country	US
Kind code	B2
Filing date	Aug 18, 2016
Priority date	Aug 18, 2016
Publication date	Jun 4, 2019
Grant date	Jun 4, 2019

Abstract

A repatternable nanoimprint lithography stamp includes a magnetic substrate and magnetic core nanoparticles. The magnetic substrate includes a magnet and a magnetic mask, and the magnetic core nanoparticles are arranged in a pattern on a surface of the magnetic substrate. The pattern is defined by selective application of a magnetic field to the magnetic substrate using the magnet and the magnetic mask.

First claim

What is claimed is:

1. A process comprising:
forming a patterned magnetic substrate that includes magnetic core nanoparticles arranged in a pattern on a surface of a magnetic substrate, wherein the magnetic substrate includes a magnet and a magnetic mask, and wherein the pattern of the magnetic core nanoparticles is defined by selective application of a magnetic field to the magnetic substrate using the magnet and the magnetic mask; and
removing the magnetic core nanoparticles from the surface of the magnetic substrate; and

forming a second patterned magnetic substrate that includes magnetic core nanoparticles arranged in a second pattern on the surface of the magnetic substrate; and
utilizing the second patterned magnetic substrate as a second repatternable nanoimprint lithography stamp.

2. The process of claim 1 , further comprising removing the magnetic core nanoparticles from the surface of the magnetic substrate by reversing a polarity of the magnetic field.

3. The process of claim 1 , wherein the pattern of the magnetic core nanoparticles prior to removal of the magnetic core nanoparticles corresponds to the second pattern.

4. The process of claim 1 , wherein the pattern of the magnetic core nanoparticles prior to removal of the magnetic core nanoparticles is different from the second pattern.

5. The process of claim 1 , wherein the magnetic core nanoparticles include magnetic core-silica particles.

6. The process of claim 5 , wherein the magnetic core-silica particles are surface modified with a surface lubricating agent.

7. The process of claim 6 , wherein the surface lubricating agent includes trichloro(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane or a bridged flourosilane.

8. The process of claim 1 , wherein the magnetic core nanoparticles have a porous surface.

9. The process of claim 8 , wherein the porous surface has pores with a pore size of not greater than 30 nm.

10. The process of claim 9 , wherein the magnetic core nanoparticles correspond to mesoporous silica nanoparticles.

11. A nanoimprint lithography process comprising:
forming a patterned magnetic substrate that includes magnetic core nanoparticles arranged in a first pattern on a surface of a magnetic substrate, wherein the magnetic substrate includes a magnet and a magnetic mask, and wherein the first pattern of the magnetic core nanoparticles is defined by selective application of a magnetic field to the magnetic substrate using the magnet and the magnetic mask;
utilizing the patterned magnetic substrate to perform a first nanoimprint lithography stamping operation;
removing the magnetic core nanoparticles from the surface of the magnetic substrate by reversing a polarity of the magnetic field;
forming a second patterned magnetic substrate that includes magnetic core nanoparticles arranged in a second pattern on the surface of the magnetic substrate; and
utilizing the second patterned magnetic substrate to perform a second nanoimprint lithography operation.

12. The nanoimprint lithography process of claim 11 , wherein the first pattern corresponds to the second pattern.

13. The nanoimprint lithography process of claim 11 , wherein the first pattern is different from the second pattern.

14. The nanoimprint lithography process of claim 11 , wherein the magnetic core nanoparticles include magnetic core-silica particles that are surface modified with a surface lubricating agent.

15. The nanoimprint lithography process of claim 14 , wherein the surface lubricating agent includes trichloro(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane or a bridged flourosilane.

16. The nanoimprint lithography process of claim 11 , wherein the magnetic core nanoparticles have a porous surface.

17. The nanoimprint lithography process of claim 16 , wherein the porous surface has pores with a pore size of not greater than 30 nm.

18. The nanoimprint lithography process of claim 17 , wherein the magnetic core nanoparticles correspond to mesoporous silica nanoparticles.

Assignees

• IBM

Inventors

• Kobilka Brandon M
• Kuczynski Joseph
• Wertz Jason T

Classifications

• H01F41/30

  for applying nanostructures, e.g. by molecular beam epitaxy [MBE] · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• H01F1/0045

  Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use (preparation of fullerenes in general C01B32/15) · CPC title

• H01F1/0054

  Coated nanoparticles, e.g. nanoparticles coated with organic surfactant · CPC title

• H01F41/301

  for applying ultrathin or granular layers (ultrathin or granular layers H01F10/007) · CPC title