Process for producing nanoclusters of silicon and/or germanium exhibiting a permanent magnetic and/or electric dipole moment
US-12534796-B2 · Jan 27, 2026 · US
for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
for applying nanostructures, e.g. by molecular beam epitaxy [MBE] · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H01F41/30 |
| Official title | for applying nanostructures, e.g. by molecular beam epitaxy [MBE] |
| Display label | for applying nanostructures, e.g. by molecular beam epitaxy [MBE] |
| Total patents | 36 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 2 |
| 2016 | 2 |
| 2017 | 2 |
| 2018 | 2 |
| 2019 | 4 |
| 2020 | 5 |
| 2021 | 6 |
| 2022 | 4 |
| 2023 | 2 |
| 2024 | 6 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Magnetoresistive stack device fabrication methods
US-2024341199-A1 · Oct 10, 2024 · US
Self-insulating metal vias in magnetic micro-devices
US-12094629-B1 · Sep 17, 2024 · US
Magnetoresistive stack device fabrication methods
US-12052927-B2 · Jul 30, 2024 · US
Fabrication methods for electronic devices integrating magnetic nanostructures
US-12002605-B1 · Jun 4, 2024 · US
Templated fabrication of materials using cold spray deposition
US-2024177927-A1 · May 30, 2024 · US
Products and applications for the templated fabrication of materials using cold spray deposition
US-11923131-B2 · Mar 5, 2024 · US
Magnetic laminate, magnetic structure including same, electronic component including magnetic laminate or magnetic structure, and method for producing magnetic laminate
US-11798725-B2 · Oct 24, 2023 · US
Process for producing nanoclusters of silicon and/or germanium exhibiting a permanent magnetic and/or electric dipole moment
US-2023009716-A1 · Jan 12, 2023 · US
Method for producing a printed magnetic functional element, and printed magnetic functional element
US-2022310322-A1 · Sep 29, 2022 · US
Multilayer free magnetic layer structure for spin-based magnetic memory
US-11430942-B2 · Aug 30, 2022 · US
Products and applications for the templated fabrication of materials using cold spray deposition
US-2022148802-A1 · May 12, 2022 · US
Permanent magnet comprising an antiferromagnetic layer and a ferromagnetic layer
US-11250979-B2 · Feb 15, 2022 · US
Mems system
US-2021380402-A1 · Dec 9, 2021 · US
Magnetic sensor bias point adjustment method
US-11169226-B2 · Nov 9, 2021 · US
Magnetoresistive stack device fabrication methods
US-2021343936-A1 · Nov 4, 2021 · US
Repatternable nanoimprint lithography stamp
US-10942448-B2 · Mar 9, 2021 · US
Magnetic Sensor Bias Point Adjustment Method
US-2021063506-A1 · Mar 4, 2021 · US
Magnetic laminate, magnetic structure including same, electronic component including magnetic laminate or magnetic structure, and method for producing magnetic laminate
US-2021012942-A1 · Jan 14, 2021 · US
Permanent magnet comprising an antiferromagnetic layer and a ferromagnetic layer
US-2020265984-A1 · Aug 20, 2020 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H01F41/30?
- CPC H01F41/30 is the Cooperative Patent Classification code for “for applying nanostructures, e.g. by molecular beam epitaxy [MBE].”
- How many patents are filed under CPC H01F41/30 (for applying nanostructures, e.g. by molecular beam epitaxy [MBE])?
- Our database includes 36 publications tagged with this CPC code.
- Is patent activity under CPC H01F41/30 growing?
- Publication counts under this code: 2 in 2023 vs 6 in 2024 (latest complete years).