Method of manufactuing semiconductor device

Patent metadata

Field	Value
Publication number	US-10297495-B2
Application number	US-201815943080-A
Country	US
Kind code	B2
Filing date	Apr 2, 2018
Priority date	May 23, 2014
Publication date	May 21, 2019
Grant date	May 21, 2019

Abstract

A method of manufacturing a semiconductor device includes forming a first conductive structure on a substrate, forming an insulation layer on a sidewall of the first conductive structure, forming a second conductive structure a distance apart from the first conductive structure with the insulation layer therebetween, first removing a portion of the insulation layer by performing a first dry cleaning operation, second removing a reactant product used in the first dry cleaning operation or a first byproduct generated as a result of the first dry cleaning operation by performing a first purge operation, and third removing at least a portion of the remaining insulation layer by performing a second dry cleaning operation to form an air gap between the first and second conductive structures.

First claim

What is claimed is:

1. A memory cell array structure for a dynamic random access memory (DRAM) device, the memory cell array structure comprising:
a semiconductor substrate;
a device isolation layer formed in the semiconductor substrate to define a plurality of active areas, the plurality of active areas including a first active area and a second active area, and the first active area and the second active area being adjacent to and separated from each other by the device isolation layer;
a first conductive structure formed on the first active area, and at least a portion of the first conductive structure contacting the first active area;
a second conductive structure formed on the second active area, and at least a portion of the second conductive structure contacting the second active area; and
a first insulation spacer and a second insulation spacer formed between the first conductive structure and the second conductive structure, and the first insulation spacer and the second insulation spacer being spaced apart from each other by an air gap formed between the first insulation spacer and the second insulation spacer,
wherein the air gap extends vertically downward into the device isolation layer.

2. The memory cell array structure of claim 1 , wherein the first conductive structure comprises a first conductive layer, a second conductive layer, a third conductive layer, a capping layer, and an insulation layer which are stacked upwardly, and the lower surface of the first conductive layer contacts the first active area.

3. The memory cell array structure of claim 1 , wherein the second conductive structure comprises a buried contact and a metal silicide layer which are stacked upwardly, and the lower portion of the buried contact contacts the second active area.

4. The memory cell array structure of claim 1 , wherein the memory cell array structure further includes a fourth conductive layer formed on the first conductive structure and the second conductive structure, and the fourth conductive layer covers at least of a portion of a side surface of the second insulation spacer.

5. The memory cell array structure of claim 4 , wherein the fourth conductive layer covers an opening of the air gap.

6. The memory cell array structure of claim 5 , wherein an upper surface of fourth conductive layer forms a landing pad pattern, and a bottom electrode of a cell capacitor is formed on the upper surface of the fourth conductive layer.

7. The memory cell array structure of claim 1 , wherein the first insulation spacer and the second insulation spacer extend downward below the semiconductor substrate and contact the device isolation layer respectively.

8. The memory cell array structure of claim 7 , wherein the first insulation spacer and the second insulation spacer comprise a silicon nitride layer respectively.

9. The memory cell array structure of claim 8 , wherein the air gap extends downward below lowermost portions of the first insulation spacer and the second insulation spacer.

10. The memory cell array structure of claim 1 , wherein a lowermost portion of the air gap is located lower than a lowermost portion of the first conductive structure.

11. The memory cell array structure of claim 1 , wherein the first conductive structure includes a bit line contact.

12. A memory cell array structure for a dynamic random access memory (DRAM) device, the memory cell array structure comprising:
a semiconductor substrate;
a device isolation layer formed in the semiconductor substrate to define a plurality of active areas;
a plurality of bit lines disposed across the memory cell array, each of the plurality of bit lines including a conductive structure for contacting corresponding active area; and
a first insulation spacer and a second insulation spacer formed on sidewalls of each of the plurality of bit lines, and the first insulation spacer and the second insulation spacer being spaced apart from each other by an air gap formed between the first insulation spacer and the second insulation spacer,
wherein the air gap extends vertically downward into the device isolation layer.

13. The memory cell array structure of claim 12 , wherein the conductive structure comprises a first conductive layer, a second conductive layer, a third conductive layer, a capping layer, and an insulation layer which are stacked upwardly, and the lower surface of the first conductive layer contacts corresponding active area.

14. The memory cell array structure of claim 13 , wherein the memory cell array structure further includes a fourth conductive layer formed on the conductive structure and the fourth conductive layer covers at least of a portion of a side surface of the second insulation spacer.

15. The memory cell array structure of claim 14 , wherein the fourth conductive layer covers an opening of the air gap.

16. The memory cell array structure of claim 15 , wherein an upper surface of the fourth conductive layer forms a landing pad pattern, and a bottom electrode of a cell capacitor is formed on the upper surface of the fourth conductive layer.

17. The memory cell array structure of claim 12 , wherein the first insulation spacer and the second insulation spacer extend downward below the semiconductor substrate and contact the device isolation layer respectively.

18. The memory cell array structure of claim 17 , wherein the first insulation spacer and the second insulation spacer comprise a silicon nitride layer respectively.

19. The memory cell array structure of claim 18 , wherein the air gap extends downward below lowermost portions of the first insulation spacer and the second insulation spacer.

20. The memory cell array structure of claim 12 , wherein a lowermost portion of the air gap is located lower than a lowermost portion of the conductive structure.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Lee Mong-Sup
• Lee Sang-Jun
• Son Yoon-Ho

Classifications

• H10P74/203

  Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects · CPC title

• H10P74/23

  characterised by multiple measurements, corrections, marking or sorting processes · CPC title

• H10P50/283

  by chemical means · CPC title

• H10W20/0698

  Local interconnections · CPC title

• H10W20/069

  by forming self-aligned vias or self-aligned contact plugs · CPC title