Plating apparatus

Patent metadata

Field	Value
Publication number	US-10294576-B2
Application number	US-201615179835-A
Country	US
Kind code	B2
Filing date	Jun 10, 2016
Priority date	Mar 26, 2013
Publication date	May 21, 2019
Grant date	May 21, 2019

Abstract

A plating apparatus includes a processing bath configured to store a processing liquid therein, a transporter configured to immerse a substrate holder, holding a substrate, in the processing liquid, raise the substrate holder out of the processing bath, and transport the substrate holder in a horizontal direction, and a gas flow generator configured to generate a clean gas flow forward of the substrate with respect to a direction in which the substrate holder is transported. The transporter moves the gas flow generator together with the substrate holder in the horizontal direction while transporting the substrate holder in the horizontal direction.

First claim

What is claimed is:

1. A plating apparatus, comprising:
a processing bath configured to store a processing liquid therein;
a substrate holder configured to hold a substrate;
a transporter configured to immerse the substrate holder, holding the substrate, in the processing liquid held in the processing bath, raise the substrate holder out of the processing bath, and transport the substrate holder in a horizontal direction; and
a gas flow generator configured to generate, during the transport of the substrate holder in the horizontal direction by the transporter, a clean gas downward flow forward of the substrate with respect to a direction in which the substrate holder is transported, the gas flow generator having a gas exit facing downward to form the clean gas downward flow,
the transporter being configured to move the gas flow generator together with the substrate holder in the horizontal direction while transporting the substrate holder in the horizontal direction.

2. The plating apparatus according to claim 1 , wherein the gas flow generator includes a fan filter unit configured to supply a clean air.

3. The plating apparatus according to claim 2 , wherein the gas flow generator includes a flow-rate regulator configured to change a flow rate of the clean air.

4. The plating apparatus according to claim 1 , wherein the gas flow generator includes:
a gas inlet pipe configured to introduce a gas; and
a gas nozzle coupled to the gas inlet pipe and configured to discharge the gas therefrom.

5. The plating apparatus according to claim 1 , further comprising:
a cover member covering the substrate held by the substrate holder,
wherein the gas flow generator is configured to generate the clean gas flow in a space between the cover member and the substrate.

6. The plating apparatus according to claim 5 , further comprising:
a heating element configured to heat the substrate and the substrate holder, the heating element being mounted to the cover member.

7. The plating apparatus according to claim 1 , further comprising:
a static electricity eliminator configured to eliminate a static electricity from the substrate.

8. The plating apparatus according to claim 1 , further comprising:
a liquid-receiving unit configured to receive the processing liquid which has dropped from the substrate holder,
wherein the transporter is configured to move the liquid-receiving unit together with the substrate holder in the horizontal direction.

9. The plating apparatus according to claim 8 , wherein:
the liquid-receiving unit includes a tray disposed below the substrate holder and an actuator configured to move the tray in the horizontal direction; and
the actuator is configured to move the tray to a predetermined retreated position while the substrate holder, holding the substrate, is immersed in the processing liquid in the processing bath.

10. The plating apparatus according to claim 1 , wherein the gas flow generator is located at a distance from the substrate holder.

11. The plating apparatus according to claim 1 , wherein the substrate holder includes a holding member for holding the substrate, and the gas flow generator is located higher than the holding member of the substrate holder.

12. The plating apparatus according to claim 1 , wherein the gas flow generator is located proximate a top portion of the substrate and directs the gas flow downward toward the bottom portion of the substrate, wherein the bottom portion is proximate to the processing bath after raising the substrate out of the processing bath.

13. The plating apparatus according to claim 1 , wherein a top portion of the substrate holder is coupled to the transporter and where the gas flow directs the gas flow downward away from the top portion of the substrate holder.

Assignees

• Ebara Corp

Inventors

• Hirao Tomonori

Classifications

• C25D17/001

  Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

• C23C18/163

  Supporting devices for articles to be coated · CPC title

• C25D21/06

  Filtering {particles other than ions (filtering ions C25D21/22)} · CPC title

• B65G45/26

  for gathering residue after cleaning · CPC title

• C23C18/1628

  Specific elements or parts of the apparatus · CPC title