Heating device

US10273580B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10273580-B2
Application numberUS-201415038731-A
CountryUS
Kind codeB2
Filing dateNov 14, 2014
Priority dateNov 26, 2013
Publication dateApr 30, 2019
Grant dateApr 30, 2019

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  1. Title

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  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A device includes at least a first electrically conductive contact plate, at least a second electrically conductive contact plate and a plurality of heating elements connected electrically in parallel. Each of the plurality of heating elements includes at least one resistance heating unit, respectively. Each of the heating elements is connected by means of a first connecting contact to the heating elements is connected by means of a first connecting contact to the first contact plate and by means of a second connecting contact to the second contact plate, in which both contact plates lie in a common first plane. The resistance heating units are arranged along a spiral or arched line around a center of the device. To expand the service life of the device at reduced manufacturing costs, a plurality of heating units are arranged consecutively or nested with each other along the ached or spiral line, and both the first and second contact plates comprise interlocking comb-like contact extensions.

First claim

Opening claim text (preview).

What is claimed is: 1. A device with at least one first electrically conductive contact plate ( 11 ) and with at least one second electrically conductive contact plate ( 12 ), and with a plurality of electrically parallel-connected first heating elements ( 1 to 9 ) each with at least one resistance heating unit ( 1 . 3 to 9 . 3 ), wherein each of the heating elements ( 1 to 9 ) is connected with the first contact plate ( 11 ) by means of a first terminal contact ( 1 . 1 to 9 . 1 ), and with the second contact plate ( 12 ) by means of a second terminal contact ( 1 . 2 to 9 . 2 ), wherein the two contact plates ( 11 , 12 ) lie in a shared first plane (E 1 ), wherein the resistance heating units ( 1 . 3 to 9 . 3 ) are arranged along a spiral or circular arc line around a center of the device, characterized in that several heating units ( 1 . 3 to 9 . 3 ) are situated along the circular arc or spiral line, lying one behind the other or nestled into each other, and the two first and second contact plates ( 11 , 12 ) lying in a shared first plane (E 1 ) exhibit contact extensions ( 11 ′, 12 ′) that intermesh in a comb-like manner. 2. The device according to claim 1 , characterized in that the at least one resistance heating unit ( 1 . 3 to 9 . 3 ) is situated in a plane (E 2 ) parallel to the shared first plane (E 1 ) under a susceptor ( 21 ) of a process chamber ( 23 ) of a CVD reactor ( 24 ). 3. The device according to claim 2 , characterized by terminal contacts ( 1 . 1 to 9 . 1 , 1 . 2 to 9 . 2 ) running in a direction of a surface normal of the shared first plane, which extend at a 90° angle to the extension direction of the heating elements, wherein the resistance heating units ( 1 . 3 to 9 . 3 ) form an essentially 90° curve, or the terminal contacts ( 1 . 1 to 9 . 2 ) are formed at a 90° angle. 4. The device according to claim 3 , characterized in that the heating elements ( 1 to 9 ) are the same length, and extend over the same arc length. 5. The device according to claim 1 , characterized in that the first and second contact plates ( 11 , 12 ) are spaced apart from each other by a distance ( 13 ), wherein the distance ( 13 ) is comprised in particular of an air gap. 6. The device according to claim 1 , characterized in that the first and second contact plates ( 11 , 12 ) consist of metal and are kept a distance apart from each other by a spacer ( 31 ) formed out of an isolator, wherein a connecting element ( 27 ) is allocated to the spacer ( 31 ). 7. The device according to claim 1 , characterized in that a respective two adjacently arranged terminal contacts ( 1 . 2 , 2 . 2 ; 2 . 1 , 3 . 1 ; 3 . 2 , 4 . 2 . . . , 8 . 2 , 9 . 2 ) are allocated to a shared contact plate ( 11 , 12 ). 8. The device according to claim 1 , characterized by a support plate ( 15 ) that is arranged parallel to the first and second contact plates ( 11 , 12 ) and exhibits support elements ( 17 ), with which the support plate ( 15 ) supports the at least one resistance heating unit ( 1 . 3 to 9 . 3 ). 9. The device according to claim 8 , characterized in that the support elements ( 17 ) fix the first heating elements ( 1 to 9 ) in place with regard to their positional distance from the support plate ( 15 ) and their distance from each other. 10. The device according to claim 9 , characterized in that at least a side of the support plate ( 15 ) facing the first heating elements is designed to reflect heat. 11. The device according to claim 10 , characterized by a cover plate ( 14 ) that is arranged between the support plate ( 15 ) and the first and second contact plates ( 11 , 12 ) and forms openings ( 18 ) through which the terminal contacts ( 1 . 1 to 9 . 2 ) extend. 12. The device according to claim 11 , characterized in that a central heating device ( 10 ) with first heating elements ( 1 to 9 ) is surrounded by outer heating devices ( 26 , 29 ) that exhibit one or more heating elements ( 1 to 9 ), wherein the heating devices ( 10 , 26 , 29 ) exhibit first heating elements ( 1 to 9 ) that can be energized independently of each other. 13. The device according to claim 12 , characterized in that the support plate ( 15 ) is joined with at least one of the first and second contact plates ( 11 , 12 ) by means of a connecting element ( 27 ), wherein the connecting element ( 27 ) is joined with the at least one of the first and second contact plates ( 11 , 12 ) with an isolating body ( 32 , 33 ). 14. The device according to claim 12 , characterized in that the several heating units ( 10 , 26 , 29 ) are arranged in a circle around each other, wherein one first central heating device ( 10 ) exhibits a circular outline contour, and at least one radially outer heating device ( 26 , 29 ) exhibits an annular outline. 15. The device according to claim 14 , characterized in that a radially outermost heating unit ( 29 ) exhibits a plurality of adjacently running heating elements ( 1 to 5 ), which are electrically connected with each other by means of support elements ( 30 ). 16. The device according to claim 14 , characterized in that the heating elements ( 1 to 9 ) are comprised of filaments ( 38 , 39 ) wound into helical turns, wherein the heating elements ( 1 to 9 ) are designed as twin filaments ( 38 , 39 ).

Assignees

Inventors

Classifications

  • H05B3/12Primary

    characterised by the composition or nature of the conductive material · CPC title

  • Heaters using resistive wires or cables not provided for in H05B3/54 · CPC title

  • Heaters specially adapted for heating gaseous material · CPC title

  • Heaters with zones of different power density · CPC title

  • C23C16/46Primary

    characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence) · CPC title

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What does patent US10273580B2 cover?
A device includes at least a first electrically conductive contact plate, at least a second electrically conductive contact plate and a plurality of heating elements connected electrically in parallel. Each of the plurality of heating elements includes at least one resistance heating unit, respectively. Each of the heating elements is connected by means of a first connecting contact to the heat…
Who is the assignee on this patent?
Aixtron Se
What technology area does this patent fall under?
Primary CPC classification H05B3/12. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 30 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).