Film formation apparatus and film formation method

Patent metadata

Field	Value
Publication number	US-10260145-B2
Application number	US-201715461906-A
Country	US
Kind code	B2
Filing date	Mar 17, 2017
Priority date	Mar 17, 2016
Publication date	Apr 16, 2019
Grant date	Apr 16, 2019

Abstract

A film formation apparatus includes a chamber that is a sealed container in which a target formed of a film formation material is placed, and into which the workpiece is carried, a gas discharging unit discharging a gas in the sealed container for a predetermined time period after the workpiece is carried into the chamber to obtain a base pressure, and a sputter gas introducing unit introducing a sputter gas containing oxygen to the interior of the chamber having undergone the discharging and becoming the base pressure. The sputter gas introducing unit decreases an oxygen partial pressure in the sputter gas to be introduced in the chamber in accordance with an increase in the base pressure due to an increase of the film formation material sticking to the interior of the chamber.

First claim

What is claimed is:

1. A film formation method of forming a film on a workpiece by plasma, the method comprising:
carrying the workpiece into an interior of a sealed container in which a target formed of a film formation material is placed;
discharging a gas in the sealed container for a predetermined time period after the workpiece is carried in to obtain a base pressure;
introducing a sputter gas containing oxygen to the interior of the sealed container having undergone the discharging and becoming the base pressure; and
decreasing an oxygen partial pressure in the sputter gas to be introduced in the sealed container in accordance with an increase in the base pressure due to an increase of the film formation material sticking to the interior of the sealed container.

2. A film formation apparatus for forming a film on a workpiece by way of a plasma discharge, the apparatus comprising:
a sealed container including a target formed of a film formation material disposed therein, said sealed container being configured to receive the workpiece onto which a film is to be formed utilizing material obtained from said target;
a control unit programmed to control operation of said film formation apparatus;
a gas discharging unit operably coupled to said control unit, said control unit being programmed to discharge a gas in the sealed container via said gas discharging unit for a predetermined time period after the workpiece is carried into the sealed container in order to establish a base pressure; and
a sputter gas introducing unit operably coupled to said control unit, said control unit being further programmed to introduce a sputter gas containing oxygen to an interior of the sealed container via said sputter gas introducing unit after the base pressure has been established, wherein the control unit adjusts the amount of oxygen delivered in the sputter gas in response to the base pressure of the film formation apparatus.

3. The film formation apparatus of claim 2 , wherein the amount of oxygen to be delivered in the sputter gas is determined by the control unit by referencing data in memory to determine an optimized oxygen partial pressure based on the base pressure.

4. The film formation apparatus of claim 2 , wherein the control unit is programmed to generate an alert when the base pressure exceeds 6 ×10 −3 [Pa].

5. The film formation apparatus of claim 2 , further comprising a power supply unit operably coupled to said control unit, said control unit being programmed to adjust the amount of oxygen delivered in the sputter gas in response to the base pressure determined based on an accumulated amount of power delivered by the power supply unit to the target over time.

Assignees

• Shibaura Mechatronics Corp

Inventors

• Ono Daisuke

Classifications

• C23C14/54

  Controlling or regulating the coating process · CPC title

• C23C14/3457 Primary

  using other particles than noble gas ions (C23C14/0036, C23C14/46 take precedence) · CPC title

• H01J37/3476

  Testing and control · CPC title

• C23C14/086 Primary

  of zinc, germanium, cadmium, indium, tin, thallium or bismuth · CPC title

• H01J37/3426

  Material · CPC title