Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-10248033-B2
Application number	US-201715694537-A
Country	US
Kind code	B2
Filing date	Sep 1, 2017
Priority date	Oct 18, 2004
Publication date	Apr 2, 2019
Grant date	Apr 2, 2019

Abstract

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

First claim

The invention claimed is:

1. A lithographic apparatus comprising:
a substrate table constructed to hold a substrate;
a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and
an evacuation system comprising a chamber and configured to draw a mixture of gas and liquid from the space into the chamber through an inlet in a bottom surface of the chamber, the chamber having an opening of a line to exhaust primarily gas from the chamber, the opening of the line located above the inlet.

2. The lithographic apparatus according to claim 1 , wherein the evacuation system further comprises a pump configured to pump liquid from the chamber.

3. The lithographic apparatus according to claim 1 , wherein the chamber comprises a porous element through which liquid can pass.

4. The lithographic apparatus according to claim 3 , wherein the porous element is arranged such that liquid passes through the porous element in an upward direction.

5. The lithographic apparatus according to claim 3 , wherein the opening of the line is arranged in or on the chamber above at least part of the porous element.

6. The lithographic apparatus according to claim 1 , comprising a further line to remove fluid from the chamber.

7. The lithographic apparatus according to claim 6 , wherein the further line has an opening located at a predominantly liquid filled portion of the chamber.

8. The lithographic apparatus according to claim 6 , wherein at least one line selected from the lines is connected to a pump.

9. The lithographic apparatus according to claim 1 , further comprising a structure to block liquid from passing through the line.

10. The lithographic apparatus according to claim 9 , wherein the structure comprises a filter to block liquid.

11. The lithographic apparatus according to claim 9 , wherein the structure comprises a hydrophobic surface to block liquid.

12. A lithographic apparatus comprising:
a substrate table constructed to hold a substrate;
a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and
an evacuation system comprising:
a first chamber configured to receive a mixture of gas and liquid from the space into the first chamber, the first chamber configured to separate gas from liquid in the mixture received into the first chamber from the space, and
a second chamber configured to receive a mixture of gas and liquid from the space into the second chamber, the second chamber configured to separate gas from liquid in the mixture received into the second chamber.

13. The lithographic apparatus according to claim 12 , further comprising an exhaust line to remove fluid from the first chamber, wherein an opening of the exhaust line of the first chamber is located at a top portion of the first chamber.

14. The lithographic apparatus according to claim 13 , wherein the exhaust line of the first chamber primarily removes gas.

15. The lithographic apparatus according to claim 14 , further comprising an exhaust line to remove fluid from the second chamber, wherein an opening of the exhaust line of the second chamber is located at a top portion of the second chamber.

16. The lithographic apparatus according to claim 15 , further comprising an outlet line to remove primarily liquid from the first chamber, wherein an opening of the outlet line of the first chamber is located at a bottom portion of the first chamber.

17. A lithographic apparatus comprising:
a substrate table constructed to hold a substrate;
a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and
an evacuation system comprising a chamber and configured to draw a mixture of gas and liquid from the space upwardly into the chamber through a porous element located at a bottom portion of the chamber, the chamber comprising an opening of a first line to exhaust primarily gas from the chamber, the opening of the first line located above the porous element, and comprising an opening of a second line to exhaust fluid from the chamber.

18. The lithographic apparatus according to claim 17 , further comprising a structure, at the first line, configured to block liquid from passing through at least part of the first line.

19. The lithographic apparatus according to claim 18 , wherein the structure comprises a hydrophobic surface to block liquid.

20. The lithographic apparatus according to claim 17 , wherein the opening of the first line is located above the opening of the second line.

Assignees

• Asml Netherlands Bv

Inventors

• Mertens Jeroen Johannes Sophia Maria
• Donders Sjoerd Nicolaas Lambertus
• De Graaf Roelof Frederik
• Hoogendam Christiaan Alexander
• Van Der Net Antonius Johannus
• Teunissen Franciscus Johannes Herman Maria
• Tinnemans Patricius Aloysius Jacobus
• Verhagen Martinus Cornelis Maria
• Verspay Jacobus Johannus Leonardus Hendricus
• Van Gompel Edwin Augustinus Matheus

Classifications

• G03F7/70716 Primary

  Stages · CPC title

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/70808

  Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title