Block polymers for sub-10 nm patterning

Patent metadata

Field	Value
Publication number	US-10239982-B2
Application number	US-201715439604-A
Country	US
Kind code	B2
Filing date	Feb 22, 2017
Priority date	Feb 23, 2016
Publication date	Mar 26, 2019
Grant date	Mar 26, 2019

Abstract

The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.

First claim

The invention claimed is:

1. A block copolymer comprising 5-vinylbenzo [d][1,3]dioxole, wherein said block copolymer is part of a layered structure.

2. The block copolymer of claim 1 , wherein said block copolymer further comprises a silicon-containing block.

3. The block copolymer of claim 2 , wherein said block copolymer further comprises pentamethyldisilylstyrene.

4. The block copolymer of claim 3 , wherein said block copolymer is poly(5-vinylbenzo[d][1,3]dioxole)-b-poly(pentamethyldisilylstyrene).

5. Sub-10 nm nanostructures comprising a block copolymer comprising 5-vinylbenzo[d][1,3]dioxole.

6. A method to achieve sub-10 nm nanostructures, comprising a) coating a block copolymer film on a substrate, said block copolymer comprising 5-vinylbenzo [d][1,3]dioxole; b) applying a top coat on top of the block copolymer, and c) annealing under conditions such that sub-10 nm nanostructures form.

7. The method of claim 6 , wherein the surface of said substrate is treated to be neutral or near neutral prior to said coating of step a).

8. The method of claim 6 , wherein said nanostructures are lamella nanostructures.

9. The method of claim 6 , wherein said nanostructures are cylindrical nanostructures.

10. The method of claim 6 , further comprising d) etching said layered structure to remove the top coat and part of the block copolymer revealing said nanostructures.

11. A method of creating a layered structure, comprising: a) providing a surface, a surface treatment layer, a block copolymer comprising 5-vinylbenzo [d][1,3]dioxole, and a top coat composition; b) treating said surface with said surface treatment layer to create a first layer on said surface; c) coating said first layer with block copolymer to create a second layer on said surface comprising a block copolymer film; and d) coating said second layer with said top coat composition so as to create a third layer on said surface, said third layer comprising a top coat on said block copolymer film surface, said first, second and third layers comprising a layered structure.

Assignees

• Univ Texas

Inventors

• Willson Carlton Grant
• Blachut Gregory
• Maher Michael
• Asano Yusuke
• Ellison Christopher John

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• B05D3/108

  Curing · CPC title

• C09D153/00

  Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers · CPC title

• B05D7/26

  synthetic lacquers or varnishes (B05D7/08, B05D7/16 take precedence) · CPC title

• C08F297/00 Primary

  Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer · CPC title