Block polymers for sub-10 nm patterning
US-10239982-B2 · Mar 26, 2019 · US
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 59629675 |
| Family type | — |
| Earliest priority | Feb 23, 2016 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10239982B2 — Block polymers for sub-10 nm patterning |
Best representative member for this family based on priority and filing country.
US10239982B2 — Block polymers for sub-10 nm patterning (published Mar 26, 2019)
Related publications in this family.
US-10239982-B2 · Mar 26, 2019 · US
US-2017240681-A1 · Aug 24, 2017 · US