Wafer carrier for smaller wafers and wafer pieces

US10236201B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10236201-B2
Application numberUS-201615249009-A
CountryUS
Kind codeB2
Filing dateAug 26, 2016
Priority dateDec 6, 2013
Publication dateMar 19, 2019
Grant dateMar 19, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments described herein relate to an apparatus and method for securing and transferring substrates. A substrate carrier, having one or more electrostatic chucking electrodes disposed therein, electrostatically couples a substrate to the carrier. Optionally, a mask may also be electrostatically coupled to the carrier and may be disposed over a region of the carrier not occupied by the substrate. In one embodiment, multiple electrode assemblies are provided such that a first electrode assembly chucks the substrate to the carrier and a second electrode assembly chucks the mask to the carrier. In another embodiment, a pocket is formed in the carrier and an electrode assembly provides chucking capability within the pocket.

First claim

Opening claim text (preview).

The invention claimed is: 1. A substrate carrier apparatus, comprising: a carrier body having a top surface; a first electrode assembly comprising a first pair of interleaving electrodes disposed within the carrier body, the first electrode assembly corresponding to a first region of the top surface; and a second electrode assembly comprising a second pair of interleaving electrodes disposed within the carrier body, the second electrode assembly disposed peripherally outward and circumscribing the first electrode assembly, wherein the second electrode assembly corresponds to a second region of the top surface and wherein the first region of the top surface is disposed below the second region of the top surface. 2. The apparatus of claim 1 , wherein the carrier body is circular in shape. 3. The apparatus of claim 2 , wherein the first region is circular in shape. 4. The apparatus of claim 3 , wherein the second region is ring-shaped. 5. The apparatus of claim 4 , wherein a discontinuity in the second region is sized to allow for passage of the first pair of interleaving electrodes from the first region to an edge of the carrier body. 6. The apparatus of claim 1 , wherein the carrier body further comprises: an insulating base; and an encapsulating member. 7. The apparatus of claim 6 , wherein the first electrode assembly and the second electrode assembly are disposed between the insulating base and the encapsulating member. 8. The apparatus of claim 1 , wherein the second region of the top surface is disposed peripherally outward and circumscribes the first region of the top surface. 9. A substrate carrier apparatus, comprising: an insulative base member; an encapsulating member disposed on the insulative base member, the encapsulating member comprising a top surface; a first electrode assembly comprising a first pair of interleaving electrodes disposed between the insulative base member and the encapsulating member, wherein the first electrode assembly defines a circular region corresponding to a first region of the top surface; a second electrode assembly comprising a second pair of interleaving electrodes disposed between the insulative base member and the encapsulating member, wherein the second electrode assembly defines a ring-like region peripherally outward and circumscribing the circular region defined by the first electrode assembly, the ring-like region corresponding to a second region of the top surface, wherein the first region of the top surface and the second region of the top surface are disposed in different planes. 10. The apparatus of claim 9 , wherein the encapsulating member and the first and second electrode assemblies are formed from one or more materials having substantially matching coefficients of thermal expansion. 11. The apparatus of claim 10 , wherein the encapsulating member and the insulative base member are formed from one or more materials having substantially matching coefficients of thermal expansion. 12. The apparatus of claim 9 , wherein the insulative base member and the encapsulating member are formed from a material or combination of materials selected from the group consisting of silicon oxide, silicon carbide, aluminum nitride, aluminum oxide, yttrium oxide yttrium aluminum garnet, titanium oxide, and titanium nitride. 13. The apparatus of claim 9 , wherein the insulative base member and the encapsulating member are formed from a composite material of a ceramic and a metal. 14. An apparatus for supporting a substrate, comprising: a carrier having a body and a top surface configured to support a substrate; one or more electrostatic chucking electrodes disposed within the carrier body; and a mask capable of being electrostatically coupled to the top surface of the carrier by application of power to the electrostatic chucking electrode, the mask configured to surround and expose one or more selected regions of the top surface of the carrier, wherein a first region of the top surface is disposed below a second region of the top surface, the second region of the top surface being disposed peripherally outward and circumscribing the first region. 15. The apparatus of claim 14 , wherein a first electrostatic chucking electrode is disposed within the carrier below the first region of the top surface and circumscribed by the second region of the top surface. 16. The apparatus of claim 15 , wherein a second electrostatic chucking electrode is disposed within the carrier, the second electrostatic chucking electrode corresponding to the second region of the top surface. 17. The apparatus of claim 16 , wherein the substrate is disposed on the first region of the top surface and the mask is disposed on the second region of the top surface.

Assignees

Inventors

Classifications

  • Horizontal transfer of a single workpiece · CPC title

  • using vacuum or suction, e.g. Bernoulli chucks · CPC title

  • H10P72/722Primary

    Details of electrostatic chucks · CPC title

  • Work holding · CPC title

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US10236201B2 cover?
Embodiments described herein relate to an apparatus and method for securing and transferring substrates. A substrate carrier, having one or more electrostatic chucking electrodes disposed therein, electrostatically couples a substrate to the carrier. Optionally, a mask may also be electrostatically coupled to the carrier and may be disposed over a region of the carrier not occupied by the subst…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/722. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).