Multi tier three-dimensional memory devices including vertically shared bit lines
US-9502471-B1 · Nov 22, 2016 · US
US10217795B1 · US · B1
| Field | Value |
|---|---|
| Publication number | US-10217795-B1 |
| Application number | US-201715684150-A |
| Country | US |
| Kind code | B1 |
| Filing date | Aug 23, 2017 |
| Priority date | Aug 23, 2017 |
| Publication date | Feb 26, 2019 |
| Grant date | Feb 26, 2019 |
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A non-volatile storage apparatus is proposed that includes a plurality of serially connected non-volatile reversible resistance-switching memory cells, a plurality of word lines such that each of the memory cells is connected to a different word line, a bit line connected to a first end of the serially connected memory cells and a switch connected to a second end of the serially connected memory cells. In one embodiment, the memory cells include a reversible resistance-switching structure comprising a first material, a second material and a reversible resistance-switching interface between the first material and the second material, a channel, and means for switching current between current flowing through the channel and current flowing through the reversible resistance-switching interface in order to program and read the reversible resistance-switching interface. A process for manufacturing the memory is also disclosed.
Opening claim text (preview).
What is claimed is: 1. A non-volatile storage apparatus, comprising: a first a reversible resistance-switching structure; a second a reversible resistance-switching structure; and a control region comprising a word line layer and an offset layer adjacent to the word line layer, the word line layer on a first side of the control region facing the first reversible resistance-switching structure, the offset layer on a second side of the control region facing the second reversible resistance-switching structure, the offset layer shielding the word line layer from controlling the second reversible resistance-switching structure. 2. The non-volatile storage apparatus of claim 1 , further comprising: a dielectric region having pockets, the first reversible resistance-switching structure is at least partially positioned in one of the pockets, the second reversible resistance-switching structure is at least partially positioned in one of the pockets. 3. The non-volatile storage apparatus of claim 2 , wherein: the first reversible resistance-switching structure comprises an active layer partially positioned in one of the pockets and a barrier layer in contact with the active layer to form a reversible resistance-switching interface. 4. The non-volatile storage apparatus of claim 1 , further comprising: a channel positioned adjacent the first reversible resistance-switching structure, the second reversible resistance-switching structure and the control region; the channel is positioned between the control region and the first reversible resistance-switching structure; and the channel is positioned between the control region and the second reversible resistance-switching structure. 5. The non-volatile storage apparatus of claim 4 , wherein: the channel is vertically elongated; the first reversible resistance-switching structure is positioned above the second reversible resistance-switching structure; the control region is positioned higher than the second reversible resistance-switching structure; and the control region is positioned lower than the first reversible resistance-switching structure. 6. The non-volatile storage apparatus of claim 4 , wherein: the first reversible resistance-switching structure comprises an active layer partially positioned in one of the pockets and a barrier layer in contact with the active layer to form a reversible resistance-switching interface; and the channel layer is positioned along three sides of the active layer. 7. The non-volatile storage apparatus of claim 1 , wherein: the first reversible resistance-switching structure and the second a reversible resistance-switching structure each include a first material, a second material and a reversible resistance-switching interface between the first material and the second material. 8. The non-volatile storage apparatus of claim 7 , wherein: the first material is a semiconductor material; the second material is a conductive oxide material; and migration of oxygen ions towards or away from the reversible resistance-switching interface modulates a barrier height at the reversible resistance-switching interface, a current through the reversible resistance-switching interface is dependent on the barrier height.
Array wherein the memory cells of a group share an access device, all the memory cells of the group having a common electrode and the access device being not part of a word line or a bit line driver · CPC title
Array wherein the access device being a transistor · CPC title
Array wherein each memory cell has more than one access device · CPC title
Array having a NAND structure comprising, for example, memory cells in series or memory elements in series, a memory element being a memory cell in parallel with an access transistor · CPC title
Three dimensional array · CPC title
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