Thin heated substrate support

US10204805B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10204805-B2
Application numberUS-201615222689-A
CountryUS
Kind codeB2
Filing dateJul 28, 2016
Priority dateMar 1, 2011
Publication dateFeb 12, 2019
Grant dateFeb 12, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure relates to an apparatus for heating and supporting a substrate in a processing chamber. A substrate support assembly includes a heated plate having a substrate supporting surface on a front side and a cantilever arm extending from a backside of the heated plate. The heated plate is configured to support and heat a substrate on the substrate supporting surface. The cantilever arm has a first end attached to the heated plate near a central axis of the heated plate, and a second end extending radially outwards from the central axis.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate support assembly, comprising: a heated plate having a front side and a backside, the front side including a substrate supporting surface; a heating element disposed in the heated plate; a cantilever arm extending from the backside of the heated plate, wherein the cantilever arm has a first end attached to the heated plate near a central axis of the heated plate, and a second end extending radially outwards from the central axis; a pumping pipe disposed in a passage formed in the cantilever arm; and a bi-metal joint disposed on the backside of the heated plate, wherein the bi-metal joint couples to the pumping pipe and is configured to thermally isolate the heated plate from the pumping pipe, wherein the bi-metal joint comprises a first portion formed from a first metal and a second portion formed from a second metal dissimilar to the first metal. 2. The substrate support assembly of claim 1 further comprising: a thermal isolator coupled to the backside of the heated plate at the central axis of the heated plate, wherein the thermal isolator extends through an opening in the cantilever arm. 3. The substrate support assembly of claim 1 , further comprising an extension tube attached to the cantilever arm near the second end, wherein a second bi-metal joint connects between the cantilever arm and the extension tube, the heated plate and the cantilever arm are formed from the first metal and the extension tube is formed from the second metal. 4. The substrate support assembly of claim 3 , wherein the first metal is aluminum and the second metal is stainless steel. 5. The substrate support assembly of claim 3 , wherein the extension tube comprises a bellows. 6. The substrate support assembly of claim 3 , further comprising: a bellows coupled to the extension tube by the second bi-metal joint. 7. The substrate support assembly of claim 1 , wherein the heated plate comprises: an upper heated plate forming the substrate supporting surface; a lower heated plate attached to the upper heated plate, wherein the heating element is sandwiched between the upper heated plate and the lower heated plate; and a heating lead attached to the heating element, the heating lead disposed in a passage formed in the cantilever arm. 8. The substrate support assembly of claim 1 , wherein the pumping pipe is fluidly connected to chucking channels formed on the substrate supporting surface. 9. The substrate support assembly of claim 8 , wherein the pumping pipe comprises: a horizontal tube disposed within a recess formed in the cantilever arm, wherein the heated plate and the horizontal tube are formed from dissimilar metals. 10. The substrate support assembly of claim 1 , further comprising: one or more sensors disposed in the heated plate; and a sensing lead connecting the one or more sensors, wherein the sensing lead is disposed in a passage formed in the cantilever arm. 11. The substrate support assembly of claim 1 , further comprising: a pumping pipe coupled to the heated plate by the bi-metal joint. 12. The substrate support assembly of claim 1 , wherein the first portion and the second portion of the bi-metal joint are coupled together by explosion bond. 13. A method for processing a substrate, comprising: placing the substrate on a substrate supporting surface of a substrate support assembly, wherein the substrate support assembly is supported by a thermal insert disposed in a processing chamber so that the substrate support assembly does not directly contact a chamber body, and the substrate support assembly comprises: a heated plate having a front side and a backside, the front side including the substrate supporting surface; a heating element disposed in the heated plate; a cantilever arm extending from the backside of the heated plate, wherein the cantilever arm has a first end attached to the heated plate near a central axis of the heated plate, and a second end extending radially outwards from the central axis; a pumping pipe disposed in a passage formed in the cantilever arm; and a bi-metal joint disposed on the backside of the heated plate, wherein the bi-metal joint couples to the pumping pipe and is configured to thermally isolate the heated plate form the pumping pipe, wherein the bi-metal joint comprises a first portion formed from a first metal and a second portion formed from a second metal dissimilar to the first metal; and heating the substrate using the heated plate of the substrate support assembly. 14. The method of claim 13 , further comprising cooling the chamber body by supplying a cooling fluid to a cooling adaptor connected to the substrate support assembly and the chamber body. 15. The method of claim 13 , further comprising coupling a thermal isolator to the backside of the heated plate at the central axis of the heated plate, wherein the thermal isolator extends through an opening in the cantilever arm. 16. The method of claim 13 , further comprising thermally isolating the heated plate using the bi-metal joint. 17. The method of claim 16 , further comprising attaching an extension tube to the cantilever arm near the second end, wherein a second bi-metal joint connects between the cantilever arm and the extension tube, the heated plate and the cantilever arm are formed from the first metal and the extension tube is formed from the second. 18. The method of claim 16 , further comprising coupling the first portion and the second portion of the bi-metal joint together by explosion bond. 19. The method of claim 16 , further comprising attaching a heating lead to the heating element, wherein the heating lead is disposed in a passage formed in the cantilever arm.

Assignees

Inventors

Classifications

  • Thermal treatments, e.g. annealing or sintering · CPC title

  • characterised by the construction of the shaft · CPC title

  • Temperature monitoring · CPC title

  • mainly by convection · CPC title

  • using vacuum or suction, e.g. Bernoulli chucks · CPC title

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What does patent US10204805B2 cover?
The present disclosure relates to an apparatus for heating and supporting a substrate in a processing chamber. A substrate support assembly includes a heated plate having a substrate supporting surface on a front side and a cantilever arm extending from a backside of the heated plate. The heated plate is configured to support and heat a substrate on the substrate supporting surface. The cantile…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0432. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 12 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).