Temperature control mechanism, temperature control method and substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-10199246-B2
Application number	US-201415021326-A
Country	US
Kind code	B2
Filing date	Oct 16, 2014
Priority date	Oct 25, 2013
Publication date	Feb 5, 2019
Grant date	Feb 5, 2019

Abstract

There is provided a temperature control mechanism comprising: a plurality of combinations of a heater and a thyristor, wherein at least one combination of the heater and the thyristor is provided on a zone-by-zone basis, and wherein an area of an electrostatic chuck for mounting a substrate is divided into a plurality of zones; a power supply configured to supply current to heaters of the plurality of combinations respectively through the thyristors of the plurality of combinations; a pair of filters disposed at a power supply line for supplying electric power from the power supply to the heaters and configured to eliminate high frequency power applied to the power supply.

First claim

The invention claimed is:

1. A temperature control mechanism comprising:
a plurality of combinations of a heater and a thyristor, wherein at least one combination of the heater and the thyristor is provided on a zone-by-zone basis, and wherein an area of an electrostatic chuck for mounting a substrate is divided into a plurality of zones;
a power supply configured to supply current to heaters of the plurality of combinations respectively through thyristors of the plurality of combinations; and
a pair of filters disposed at a power supply line for supplying electric power from the power supply to the heaters and configured to eliminate high frequency power applied to the power supply, the pair of filters including a first filter provided to an input side relative to the heater and a second filter provided to an output side relative to the heater.

2. The temperature control mechanism according to claim 1 , wherein
the plurality of zones of divided areas of the electrostatic chuck are formed in shapes excluding a concentric shape.

3. The heat control mechanism according to claim 1 , wherein
the plurality of zones of divided areas of the electrostatic chuck are formed in an arc-like shape or a rectangular shape.

4. The temperature control mechanism according to claim 1 , wherein the heater is embedded in the electrostatic chuck and the thyristor is embedded in a mounting table.

5. The heat control mechanism according to claim 1 , wherein the electrostatic chuck is divided into a plurality of circle sectors and each circle sector is further divided into the plurality of zones, each of the plurality of zones having an arc-like shape or a rectangular shape with a different distance from a center of the electrostatic chuck.

Assignees

• Tokyo Electron Ltd

Inventors

• Koizumi Katsuyuki
• Senzaki Shigeru
• Takahashi Tomoyuki
• Kitagawa Dai

Classifications

• H10P72/722

  Details of electrostatic chucks · CPC title

• H10P72/0602 Primary

  Temperature monitoring · CPC title

• H10P72/72

  using electrostatic chucks · CPC title

• H10P72/0432 Primary

  mainly by conduction · CPC title

• F27D11/02

  Ohmic resistance heating · CPC title