Method for slicing workpiece and processing liquid

US10189181B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10189181-B2
Application numberUS-201515124245-A
CountryUS
Kind codeB2
Filing dateMar 6, 2015
Priority dateApr 3, 2014
Publication dateJan 29, 2019
Grant dateJan 29, 2019

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention is a method for slicing a workpiece, including: forming a wire row by a wire spirally wound between a plurality of wire guides and traveling in an axial direction, and pressing a workpiece against the wire row while supplying a processing liquid containing abrasive grains to a contact portion between the workpiece and the wire, wherein a used portion of the abrasive grains are subjected to a treatment with a mixed liquid of sulfuric acid and hydrogen peroxide, and the abrasive grains subjected to the treatment are reused for the slicing of a workpiece. This makes it possible to slice a workpiece with suppressing contamination of a wafer with metal impurities when abrasive grains are reused in slicing a workpiece by use of a wire saw.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for slicing workpieces, comprising: forming a wire row by a wire spirally wound between a plurality of wire guides and traveling in an axial direction, pressing a workpiece against the wire row while supplying a processing liquid comprising abrasive grains to a contact portion between the workpiece and the wire to slice the workpiece and thereby producing a waste slurry comprising at least a portion of the abrasive grains, recovering at least a portion of the abrasive grains from the waste slurry, subjecting the recovered abrasive grains to a treatment with a mixed liquid of sulfuric acid and hydrogen peroxide, dispersing the treated abrasive grains into coolant to make a reused processing liquid, and reusing the treated abrasive grains in the reused processing liquid for slicing of another workpiece. 2. The method of claim 1 , wherein a concentration of copper contained in the treated abrasive grains is 1 ppm or less per 1 g of the treated abrasive grains. 3. The method of claim 1 , wherein the subjecting the recovered abrasive grains to the treatment with the mixed liquid of sulfuric acid and hydrogen peroxide removes copper from the recovered abrasive grains.

Assignees

Inventors

Classifications

  • by cutting with wires or closed-loop blades (B28D5/042 takes precedence) · CPC title

  • Aqueous liquid suspensions · CPC title

  • B28D5/007Primary

    Use, recovery or regeneration of abrasive mediums (for grinding and polishing in general B24B57/00) · CPC title

  • Cross-Sectional Technologies · mapped topic

  • using a cutting wire · CPC title

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Frequently asked questions

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What does patent US10189181B2 cover?
The present invention is a method for slicing a workpiece, including: forming a wire row by a wire spirally wound between a plurality of wire guides and traveling in an axial direction, and pressing a workpiece against the wire row while supplying a processing liquid containing abrasive grains to a contact portion between the workpiece and the wire, wherein a used portion of the abrasive grains…
Who is the assignee on this patent?
Shinetsu Handotai Kk
What technology area does this patent fall under?
Primary CPC classification B28D5/007. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 29 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).