Air data probe corrosion protection
US-12071684-B2 · Aug 27, 2024 · US
US10164265B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10164265-B2 |
| Application number | US-201615284032-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 3, 2016 |
| Priority date | Oct 23, 2015 |
| Publication date | Dec 25, 2018 |
| Grant date | Dec 25, 2018 |
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A method for forming a corrosion-resistant catalyst for fuel cell catalyst layers is provided. The method includes a step of depositing a conformal Pt or platinum alloy thin layer on NbO 2 substrate particles to form Pt-coated NbO 2 . The Pt-coated NbO 2 particles are then incorporated into a fuel cell catalyst layer.
Opening claim text (preview).
What is claimed is: 1. A method for forming a corrosion-resistant catalyst comprising: depositing a conformal platinum layer or platinum alloy layer on NbO 2 substrate particles to form Pt-coated NbO 2 particles, the depositing of the conformal platinum layer or platinum alloy layer comprising a reductive H 2 -plasma atomic layer deposition process during which a surface layer of the NbO 2 substrate particles is reduced to NbO or Nb and platinum or platinum alloy is grown on the surface layer; and incorporating the Pt-coated NbO 2 particles into a fuel cell catalyst layer. 2. The method of claim 1 wherein, following the growth of platinum or platinum alloy on the surface layer of NbO or Nb by the reductive H 2 -plasma atomic layer deposition process, platinum or platinum alloy is grown on the already-deposited platinum or platinum alloy by a H 2 thermal atomic layer deposition process. 3. The method of claim 1 wherein a platinum alloy layer is deposited, the platinum alloy layer including a component selected from the group consisting of platinum-iridium alloys, platinum-palladium alloys, and platinum-gold alloys. 4. The method of claim 1 wherein the platinum layer or platinum alloy layer has a thickness from about 0.3 to 20 nm. 5. The method of claim 1 wherein a conformal platinum layer is deposited on NbO 2 substrate particles, and wherein the reductive H 2 -plasma atomic layer deposition process comprises a deposition cycle in which (1) the NbO 2 substrate particles are contacted with vapor of a platinum-containing compound such that at least a portion of the vapor of the platinum-containing compound adsorbs or reacts with a surface of the NbO 2 substrate particles to form a modified surface and (2) the modified surface of the NbO 2 substrate particles is contacted with H 2 plasma to deposit platinum and form at least a portion of the conformal platinum layer. 6. The method of claim 5 wherein the platinum-containing compound is trimethyl(methylcyclopentadienyl)platinum. 7. The method of claim 5 wherein the deposition cycle is at a temperature from about 50 to 400 °C. 8. The method of claim 5 wherein a pressure for the deposition cycle is from about 10 −6 Torr to about 760 Torr. 9. The method of claim 5 wherein a pressure for the deposition cycle is from about 0.1 millitorr to about 10 Torr. 10. The method of claim 5 wherein the NbO 2 substrate particles are subjected to 1 to 5000 deposition cycles. 11. The method of claim 5 wherein the NbO 2 substrate particles are subjected to 10 to 300 deposition cycles.
Alloys or mixtures with metallic elements · CPC title
of metallic sub-layers (C23C16/029 takes precedence) · CPC title
supported on carriers, e.g. powder carriers · CPC title
Use of plasma, radiation or electromagnetic fields · CPC title
Vapour deposition · CPC title
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