Breaking-in and cleaning method and apparatus for wafer-cleaning brush
US-2024066566-A1 · Feb 29, 2024 · US
US10160015B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10160015-B2 |
| Application number | US-201615089680-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 4, 2016 |
| Priority date | Apr 9, 2015 |
| Publication date | Dec 25, 2018 |
| Grant date | Dec 25, 2018 |
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An apparatus for removing at least one foreign substance includes a detection unit detecting the at least one foreign substance adhered to a holding surface of a suction holding unit configured to suck and hold a substrate, a removal unit removing the at least one foreign substance adhered to the holding surface using fluid, and a movement mechanism configured to move the detection unit and the removal unit.
Opening claim text (preview).
What is claimed is: 1. An apparatus for removing at least one foreign substance, comprising: a detection unit detecting the at least one foreign substance adhered to a rotatable holding surface of a suction holding unit configured to suck and hold a substrate, the suction holding unit having a suction space communicating with an outer portion; a removal unit removing the at least one foreign substance adhered to the holding surface using fluid; a movement mechanism being rotatably supported and configured to move the detection unit and the removal unit; and a control unit configured to control the detection unit, the removal unit and the movement mechanism, wherein the movement mechanism causes the detection unit and the removal unit to be moved in a reciprocating path between an outer peripheral portion of the suction holding unit and a central portion of the suction holding unit, wherein the detection unit is disposed frontward in an advancing direction in an outward path of the reciprocating path, and the removal unit is disposed rearward in the advancing direction, so that the detection and the removal of the foreign substance can be performed at the same time, and wherein the control unit determines whether a residue after removal of the at least one foreign substance is present, based on a result detected by the detection unit in a return path of the reciprocating path. 2. The apparatus of claim 1 , wherein: the removal unit comprises an ejection part that selectively ejects one of gas and liquid to the holding surface; and the control unit controls movement in the reciprocating path to be performed for a first time while the gas is ejected from the ejection part, and controls movement in the reciprocating path to be performed for a second time while the liquid is ejected from the ejection part when the residue after removal of the at least one foreign substance is determined to be present during movement in the reciprocating path. 3. The apparatus of claim 1 , wherein, when a foreign substance having a height exceeding a distance from the holding surface to the removal unit is detected by the detection unit in the outward path of the reciprocating path, the control unit stops movement of the detection unit and the removal unit by the movement mechanism. 4. The apparatus of claim 1 , wherein the movement mechanism allows movement speeds of the detection unit and the removal unit in the central portion of the suction holding unit to be faster than those in the outer peripheral portion of the suction holding unit.
Monitoring of warpages, curvatures, damages, defects or the like · CPC title
Process monitoring, e.g. flow or thickness monitoring · CPC title
for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title
Cleaning by suction, with or without auxiliary action · CPC title
Cleaning by the force of jets or sprays · CPC title
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