Pyrometry filter for thermal process chamber

Patent metadata

Field	Value
Publication number	US-10147623-B2
Application number	US-201715668647-A
Country	US
Kind code	B2
Filing date	Aug 3, 2017
Priority date	Mar 11, 2013
Publication date	Dec 4, 2018
Grant date	Dec 4, 2018

Abstract

Embodiments of the invention generally relate to pyrometry during thermal processing of semiconductor substrates. More specifically, embodiments of the invention relate to a pyrometry filter for a thermal process chamber. In certain embodiments, the pyrometry filter selectively filters selected wavelengths of energy to improve a pyrometer measurement. The pyrometry filter may have various geometries which may affect the functionality of the pyrometry filter.

First claim

The invention claimed is:

1. A thermal processing apparatus, comprising:
a window comprising quartz having a plurality of surfaces including a top surface and a bottom surface, the window having a geometric shape, wherein a thickness of the window at a center region is less than a thickness of the window at a peripheral region, and wherein the top surface tapers inwardly from the peripheral region to the center region;
a reflective coating disposed on the top surface and the bottom surface;
an index matching material disposed on the reflective coating adjacent the top surface; and
an absorptive coating disposed on the peripheral region.

2. The apparatus of claim 1 , wherein the index matching material is selected in relationship to a refractive index of the window.

3. The apparatus of claim 2 , wherein the reflective coating is selected to reflect a predetermined range of wavelengths between about 700 nm to about 1000 nm.

4. The apparatus of claim 1 , wherein the reflective coating comprises a dielectric material.

5. The apparatus of claim 4 , wherein the dielectric material comprises multiple layers.

6. The apparatus of claim 1 , wherein the window is symmetric around a vertical axis.

7. The apparatus of claim 6 , wherein the window is asymmetric around a horizontal axis.

8. The apparatus of claim 1 , wherein the plurality of surfaces are linear.

9. A system for processing a substrate, comprising:
a radiation source;
a pyrometer; and
a window comprising quartz disposed between the radiation source and the pyrometer, the window further comprising:
a plurality of surfaces including a top surface and a bottom surface, the window having a geometric shape, wherein a thickness of the window at a center region is less than a thickness of the window at a peripheral region, and wherein the top surface tapers inwardly from the peripheral region to the center region;
a reflective coating disposed on the top surface and the bottom surface;
an index matching material disposed on the reflective coating adjacent the top surface; and
an absorptive coating disposed on the peripheral region.

10. The system of claim 9 , wherein the pyrometer detects wavelengths between about 700 nm to about 1000 nm.

11. The system of claim 9 , wherein the index matching material is selected in relationship to a refractive index of the window.

12. The apparatus of claim 11 , wherein the reflective coating is selected to reflect a predetermined range of wavelengths between about 700 nm to about 1000 nm.

13. The apparatus of claim 9 , wherein the reflective coating comprises a dielectric material.

14. The apparatus of claim 9 , wherein the window is symmetric around a vertical axis.

15. The apparatus of claim 14 , wherein the window is asymmetric around a horizontal axis.

16. The apparatus of claim 9 , wherein the plurality of surfaces are linear.

17. A thermal processing apparatus, comprising:
a window having a plurality of surfaces including a top surface and a bottom surface, the window having a geometric shape, wherein a thickness of the window at a center region is less than a thickness of the window at a peripheral region, and wherein the top surface tapers inwardly from the peripheral region to the center region;
a reflective coating disposed on the top surface and the bottom surface; and
an absorptive coating disposed on the peripheral region.

Assignees

• Applied Materials Inc

Inventors

• Ranish Joseph M
• Adams Bruce E

Classifications

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0602 Primary

  Temperature monitoring · CPC title

• H01L21/67248 Primary

  Electricity · mapped topic

• H01L21/67115

  Electricity · mapped topic

• H10P95/90 Primary

  Thermal treatments, e.g. annealing or sintering · CPC title