Electrodeposition processes for magnetostrictive resonators

Patent metadata

Field	Value
Publication number	US-10132699-B1
Application number	US-201514876652-A
Country	US
Kind code	B1
Filing date	Oct 6, 2015
Priority date	Oct 6, 2014
Publication date	Nov 20, 2018
Grant date	Nov 20, 2018

Abstract

The present invention relates to magnetoelastic resonators, sensors, and tunable devices, as well as methods for making such components. The resonators can be used as tags and/or sensors. In general, the resonators include one or more micron-sized resonator portions affixed on a substrate. For use as a tag, each tag includes a plurality of resonator portions that allow for multiplexed coding, and methods for making tags and arrays of such tags include use of electrodeposition processes. In particular embodiments, these components include an electrodeposited material that exhibits magnetostrictive properties.

First claim

The invention claimed is:

1. A tunable microfabricated device comprising:
a substrate;
a stationary anchor disposed on the substrate;
a stationary electrode disposed on the substrate;
a stationary actuation electrode disposed on the substrate and located between the stationary anchor and the stationary electrode; and
a cantilever comprising an extended arm having a first end and a second end, wherein the first end is affixed to the stationary anchor, the second end is suspended over the stationary electrode, and a center portion of the extended arm is suspended over the stationary actuation electrode;
wherein a top surface of the cantilever comprises a layer of an electrodeposited material comprising cobalt and iron; and
wherein the electrodeposited material comprises an alloy having of from about 70 to 80 at. % cobalt and about 20 to 30 at. % iron.

2. The device of claim 1 , wherein the cantilever includes a conductive material conformed to provide a capacitive element between a portion of the cantilever and the stationary electrode.

3. The device of claim 1 , wherein the cantilever includes a movable electrode located near the second end of extended cantilever arm so as to provide a capacitive element between the first movable electrode and the stationary electrode.

4. The device of claim 1 , wherein the cantilever includes a movable actuation electrode positioned across from the stationary actuation electrode.

5. The device of claim 1 , wherein the electrodeposited material is a magnetostrictive material.

6. The device of claim 1 , wherein the stationary actuation electrode is disposed on a surface of a dielectric layer disposed on the substrate.

7. The device of claim 1 , wherein the cantilever is composed of a conductive metal.

8. The device of claim 1 , further comprising a magnetic field source configured to expose the electrodeposited material to a magnetic field.

9. The device of claim 1 , wherein the substrate is a silicon substrate.

10. The device of claim 1 , wherein the stationary anchor comprises an anchor portion and a pedestal portion, the anchor portion is codeposited with the stationary electrode, and the pedestal portion overlies the anchor portion.

Assignees

• Nat Tech & Eng Solutions Sandia Llc

Inventors

• Pillars Jamin Ryan
• Langlois Eric
• Arrington Christian Lew
• Monson Todd

Classifications

• C25D7/00

  Electroplating characterised by the article coated · CPC title

• C25D5/18

  Electroplating using modulated, pulsed or reversing current · CPC title

• G01L1/125 Primary

  by using magnetostrictive means (magnetostrictive sensors H10N35/101) · CPC title

• C25D3/562

  containing more than 50% by weight of iron or nickel or cobalt · CPC title

• C25D5/02

  Electroplating of selected surface areas · CPC title