Unit for supplying fluid, apparatus and method for treating substrate with the unit

US10109506B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10109506-B2
Application numberUS-201715604141-A
CountryUS
Kind codeB2
Filing dateMay 24, 2017
Priority dateMay 26, 2016
Publication dateOct 23, 2018
Grant dateOct 23, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is an apparatus and method for supplying a fluid. The substrate treating apparatus comprises a treating unit for treating a substrate and a fluid supply unit for supplying fluid to the treating unit, wherein the fluid supply unit comprises a supply tank in which the fluid is stored, a supply line connecting the supply tank and the treating unit to supply the fluid from the supply tank to the treating unit, a filter installed on the supply line, and an exhaust line branching from the supply line, wherein a branch point of the exhaust line in the supply line is located upstream of the filter.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate treating apparatus comprising: a treating unit for treating a substrate; and a fluid supply unit for supplying fluid to the treating unit, wherein the fluid supply unit comprises: a supply tank in which the fluid is stored; a supply line connecting the supply tank and the treating unit to supply the fluid from the supply tank to the treating unit; a filter installed on the supply line; and an exhaust line branching from the supply line, wherein a branch point of the exhaust line in the supply line is located upstream of the filter. 2. The apparatus of claim 1 , wherein the fluid supply unit further comprising: a pressure-reducing member provided on the exhaust line for reducing the pressure of the exhaust line; and a controller for controlling a valve installed on the exhaust line, wherein the controller closes the exhaust line while treating the substrate in the treating unit, and control the valve to open the exhaust line when treating the substrate in the treating unit is completed. 3. The apparatus of claim 2 , wherein the treating unit comprising: a housing having a treatment space therein; and a substrate support member for supporting the substrate in the treatment space, wherein the treatment space is sealed from outside during treating the substrate. 4. The apparatus of claim 1 , wherein the treating unit is a unit for treating a substrate with supercritical fluid and the fluid comprises supercritical carbon dioxide (CO 2 ). 5. A fluid supply unit comprises: a supply tank in which fluid is stored; a supply line connecting the supply tank and a treating unit to supply the fluid from the supply tank to the treating unit; a filter installed on the supply line; and an exhaust line that branches off from the supply line, wherein a branch point of the exhaust line in the supply line is located upstream of the filter. 6. The fluid supply unit of claim 5 , wherein the unit comprising: a pressure-reducing member provided on the exhaust line for reducing the pressure of the exhaust line; and a controller for controlling a valve installed on the exhaust line, wherein the controller controls the valve to move the fluid bi-directionally based on the filter. 7. A substrate treating method comprises supplying a fluid filtered by a filter installed in a supply line to a treating unit to treat the substrate, wherein the fluid is bi-directionally moved through the supply line in a first direction and a second direction opposite to the first direction based on the filter, respectively, wherein the fluid is further moved through an exhaust line branching from the supply line, and a branch point of the exhaust line in the supply line is located upstream of the filter with respect to the first direction. 8. The method of claim 7 comprises a movement of the fluid in both directions comprising: a processing step in which the fluid is moved in the first direction from the filter and supplied to the treating unit; and a post-treatment step in which the fluid is moved in the second direction after the processing step. 9. The method of claim 8 , wherein the post-treatment step is vented the fluid through the exhaust line branching from the supply line. 10. The method of claim 7 , wherein fluid may include supercritical carbon dioxide (CO2).

Assignees

Inventors

Classifications

  • characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

  • Cleaning only by supercritical fluids · CPC title

  • using mainly spraying means, e.g. nozzles · CPC title

  • for drying · CPC title

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What does patent US10109506B2 cover?
Provided is an apparatus and method for supplying a fluid. The substrate treating apparatus comprises a treating unit for treating a substrate and a fluid supply unit for supplying fluid to the treating unit, wherein the fluid supply unit comprises a supply tank in which the fluid is stored, a supply line connecting the supply tank and the treating unit to supply the fluid from the supply tank …
Who is the assignee on this patent?
Semes Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/0402. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 23 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).