Coater and surface treatment method

US10105732B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10105732-B2
Application numberUS-201614988677-A
CountryUS
Kind codeB2
Filing dateJan 5, 2016
Priority dateJan 5, 2016
Publication dateOct 23, 2018
Grant dateOct 23, 2018

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A coater includes a chuck, a source of a coating material, a dispensing head, an exhaust system, and a liner. The chuck is configured to support a wafer. The dispensing head is configured to dispense the coating material onto the wafer. The exhaust system is configured to exhaust the excess coating material. The liner is present at least partially on an inner surface of the exhaust system. The liner has a stick resistance to the coating material, and the stick resistance of the liner is greater than a stick resistance of the inner surface of the exhaust system.

First claim

Opening claim text (preview).

What is claimed is: 1. A coater, comprising: a chuck configured to support a wafer; a source of a coating material; a dispensing head configured to dispense the coating material onto the wafer; an exhaust system configured to exhaust the excess coating material, wherein the exhaust system comprises an exhaust pipe below the chuck; a pressure sensor coupled to the exhaust pipe through a sampling pipe and configured to monitor an extent of clogging in the exhaust pipe, wherein the sampling pipe has a smaller diameter than the exhaust pipe; and a liner at least partially on an inner surface of the exhaust pipe, wherein the liner has a stick resistance to the coating material, and the stick resistance of the liner is greater than a stick resistance of the inner surface of the exhaust pipe to the coating material. 2. The coater of claim 1 , wherein the liner is made of a hydrophobic material. 3. The coater of claim 1 , wherein the liner is made of a material comprising fluorine. 4. The coater of claim 1 , wherein the liner is made of a material comprising a fluorocarbon-based polymer. 5. The coater of claim 1 , wherein the exhaust system comprises a drain opening present below the chuck and fluidly communicating with the exhaust pipe. 6. The coater of claim 1 , wherein the exhaust system further comprises: an exhaust fan fluidly communicating with the exhaust pipe. 7. The coater of claim 1 , wherein the exhaust system comprises a cup below the chuck and having a drain opening therein, the liner is at least on an inner surface of the cup, and the stick resistance of the liner is greater than a stick resistance of the inner surface of the cup to the coating material. 8. The coater of claim 1 , wherein the exhaust system comprises a drain opening present below the chuck and fluidly communicating with the exhaust pipe, wherein the sampling pipe is fluidly communicating with the exhaust pipe, the liner is at least on an inner surface of the sampling pipe, and the stick resistance of the liner is greater than a stick resistance of the inner surface of the sampling pipe to the coating material. 9. The coater of claim 8 , wherein the liner on the inner surface of the exhaust pipe is a first liner and the liner on the inner surface of the sampling pipe is a second liner and the first liner and the second liner are made of different materials. 10. The coater of claim 1 , wherein the sampling pipe is free of the liner. 11. The coater of claim 1 , wherein the exhaust system comprises a cup surrounding the chuck and free of the liner. 12. A coater, comprising: a chuck configured to support a wafer; a cup surrounding the chuck and having an opening, wherein a center of the chuck is offset from a center of the opening of the cup; a source of a coating material; a dispensing head configured to dispense the coating material onto the wafer; a drain opening below the chuck; a fluid transportation mechanism fluidly communicating with the drain opening; and a liner on an inner surface of the fluid transportation mechanism, wherein the liner has a first coating that is on the inner surface of the fluid transportation mechanism and that has a water contact angle greater than a water contact angle of the inner surface of the fluid transportation mechanism. 13. The coater of claim 12 , wherein the fluid transportation mechanism comprises an exhaust pipe fluidly communicating with the drain opening, the liner is at least on an inner surface of the exhaust pipe, and the water contact angle of the first coating is greater than a water contact angle of the inner surface of the exhaust pipe. 14. The coater of claim 12 , wherein the fluid transportation mechanism comprises an exhaust pipe fluidly communicating with the drain opening and a sampling pipe fluidly communicating with the exhaust pipe, the liner is at least on an inner surface of the sampling pipe, and the water contact angle of the first coating is greater than a water contact angle of the inner surface of the sampling pipe.

Assignees

Inventors

Classifications

  • Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

  • Apparatus for applying a liquid, a resin, an ink or the like · CPC title

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

  • H10P14/00Primary

    Formation of materials, e.g. in the shape of layers or pillars · CPC title

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US10105732B2 cover?
A coater includes a chuck, a source of a coating material, a dispensing head, an exhaust system, and a liner. The chuck is configured to support a wafer. The dispensing head is configured to dispense the coating material onto the wafer. The exhaust system is configured to exhaust the excess coating material. The liner is present at least partially on an inner surface of the exhaust system. The …
Who is the assignee on this patent?
Taiwan Semiconductor Mfg Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P14/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 23 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).