Fabrication of multilayer nanograting structures

Patent metadata

Field	Value
Publication number	US-10103357-B2
Application number	US-201715543150-A
Country	US
Kind code	B2
Filing date	Feb 7, 2017
Priority date	Feb 17, 2016
Publication date	Oct 16, 2018
Grant date	Oct 16, 2018

Abstract

Provided are nanograting structures and methods of fabrication thereof that allow for stable, robust gratings and nanostructure embedded gratings that enhance electromagnetic field, fluorescence, and photothermal coupling through surface plasmon or, photonic resonance. The gratings produced exhibit long term stability of the grating structure and improved shelf life without degradation of the properties such as fluorescence enhancement. Embodiments of the invention build nanograting structures layer-by-layer to optimize structural and optical properties and to enhance durability.

First claim

Having thus described various embodiments of the invention, what is claimed as new and desired to be protected by Letters Patent includes the following:

1. A method of manufacturing a nanograting structure, comprising the steps of:
coating a mold in a solution of a polymer dissolved in a solvent to obtain a grating;
transferring the grating to a substrate;
vapor treating the grating with a crosslinker;
annealing the grating;
treating the grating with a hydrophilicity agent;
depositing a fluorescence-enhancing reflective layer on the grating; and
depositing a capping layer on top of the reflective layer.

2. The method of claim 1 , wherein the mold is made of polydimethylsiloxane.

3. The method of claim 1 , wherein the polymer is selected from the group consisting of poly(methyl silsesquioxane), nitrocellulose, THV, polytetrafluoroethylene, and PVA.

4. The method of claim 1 , wherein the solvent is selected from the group consisting of ethanol and PGMEA.

5. The method of claim 1 , wherein the crosslinker is selected from the group consisting of 3-aminopropyltriethoxysilane and trimethylchlorosilane.

6. The method of claim 1 , wherein the step of annealing the grating comprises the substeps of:
annealing the grating at a temperature between 40 degrees Celsius and 200 degrees Celsius for approximately three hours; and
annealing the grating at approximately between 200 degrees Celsius and 500 degrees Celsius for approximately one hour.

7. The method of claim 1 , further comprising the step of depositing an adhesion layer made from a material selected from the set consisting of chromium, titanium, germanium, and nickel on the grating prior to depositing the reflective layer on the grating.

8. The method of claim 1 , wherein the reflective layer is made from a material selected from the group consisting of silver, gold, platinum, and aluminum and is between approximately 10 nanometers and approximately 300 nanometers thick.

9. The method of claim 1 , wherein the reflective layer is made from a material selected from the group consisting of titania, silica, alumina, and ITO and is between approximately 10 nanometers and approximately 300 nanometers thick.

10. The method of claim 1 , wherein the reflective layer is deposited using a process selected from the group consisting of thermal evaporation, e-beam deposition, and sputtering deposition.

11. The method of claim 1 , wherein the capping layer is made from a dielectric selected from the group consisting of alumina, silica and titania and is between approximately one nanometer and approximately 100 nanometers thick.

12. The method of claim 1 , wherein the capping layer is deposited using a process selected from the set consisting of atomic layer deposition, thermal evaporation, e-beam deposition, and sputtering deposition.

13. The method of claim 1 ,
wherein the polymer is poly(methylsilsesquioxane);
wherein the crosslinker is of 3-aminopropyltriethoxysilane;
wherein the step of annealing the grating is performed at approximately 60 degrees Celsius for three hours, at a temperature increasing by approximately one degree per minute until the temperature reaches approximately 400 degrees Celsius, and then at 400 degrees Celsius for one hour;
wherein the hydrophilicity agent is oxygen plasma;
wherein the reflective layer is made from silver and is approximately 100 nanometers thick;
wherein the capping layer is made from alumina and is approximately 10 nanometers thick; and
wherein the method further comprises the step of annealing the nanograting structure for approximately 2 hours at a temperature of approximately 60 degrees Celsius.

14. A nanograting structure, comprising:
a substrate;
a polymer grating treated with a crosslinker,
wherein the polymer grating has been annealed for further crosslinking, and
wherein the polymer grating has been treated a hydrophilicity agent to render a surface of the polymer grating hydrophilic;
a fluorescence-enhancing reflective layer over the polymer grating; and
a capping layer on top of the reflective layer.

15. The nanograting structure of claim 14 , wherein the polymer is selected from the set consisting of poly(methylsilsesquioxane), nitrocellulose, THV, and PVA.

16. The nanograting structure of claim 14 , wherein the polymer grating has a height between approximately 20 nanometers and approximately 70 nanometers.

17. The nanograting structure of claim 14 , wherein the crosslinker is selected from the set consisting of 3-aminopropyltriethoxysilane and trimethylchlorosilane.

18. The nanograting structure of claim 14 , wherein the polymer grating has been annealed at a temperature between approximately 40 degrees Celsius and approximately 200 degrees Celsius for approximately three hours and at a temperature between approximately 200 degrees Celsius and approximately 500 degrees Celsius for approximately one hour.

19. The nanograting structure of claim 14 , further comprising an adhesion layer between the polymer grating and the reflective layer.

20. The nanograting structure of claim 14 , wherein the adhesion layer is made from a material selected from the set consisting of chromium, germanium, titanium, and nickel and is between approximately one nanometer and approximately ten nanometers thick.

21. The nanograting structure of claim 14 , wherein the capping layer is made from a dielectric selected from the set consisting of alumina, silica and titania and is between approximately one nanometer and 100 nanometers thick.

22. The nanograting structure of claim 14 ,
wherein the polymer grating is made from poly(methylsilsesquioxane);
wherein the crosslinker is of 3-aminopropyltriethoxysilane;
wherein the wherein the polymer grating has been annealed at approximately 60 degrees Celsius for three hours, at a temperature increasing by approximately one degree per minute until the temperature reaches approximately 400 degrees Celsius, and then at 400 degrees Celsius for one hour;
wherein the hydrophilicity agent is oxygen plasma;
wherein the reflective layer is made from silver and is approximately 100 nanometers thick;
wherein the capping layer is made from alumina and is approximately 10 nanometers thick; and
wherein the nanograting structure is annealed for approximately 2 hours at a temperature of approximately 60 degrees Celsius.

23. The nanograting structure of claim 14 , wherein the reflective layer is a metallic layer.

24. The nanograting structure of claim 23 , wherein the metallic layer is made from a metal selected from the set consisting of silver, gold, platinum, and aluminum and is between approximately 30 and approximately 300 nanometers thick.

25. The nanograting structure of claim 14 , wherein the reflective layer is a dielectric layer.

26. The nanograting structure of claim 25 , wherein the dielectric layer is made from a dielectric selected from the set consisting of titania, silica, alumina and ITO and is between approximately 30 and approximately 300 nanometers thick.

27. The nanograting structure of claim 14 , wherein the fluorescence-enhancing reflective layer includes a nanogap in a longitudinal valley of the polymer grating measuring less than 100 nanometers.

28. The nanograting structure of claim 27 , wherein the nanogap measures approximately 20 nanomaters.

29. The nanograting structure of claim

Assignees

• Univ Missouri

Inventors

• Gangopadhyay Shubhra
• Bok Sangho
• Pathan Samiullah
• Mathai Cherian Joseph
• Basuray Sagnik
• Gangopadhyay Keshab
• Chen Biyan
• Grant Sheila
• Wood Aaron

Classifications

• H10P14/68

  Organic materials, e.g. photoresists · CPC title

• H10P14/66

  characterised by the type of materials · CPC title

• H10P14/60

  of insulating materials · CPC title

• G02B5/1866

  Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials (G02B5/1809, G02B5/1828, G02B5/1833, G02B5/1838 and G02B5/1847 take precedence) · CPC title

• G02B27/42

  Diffraction optics {, i.e. systems including a diffractive element being designed for providing a diffractive effect}(G02B27/60 takes precedence) · CPC title