Apparatus for treating substrate

Patent metadata

Field	Value
Publication number	US-10103018-B2
Application number	US-201313953009-A
Country	US
Kind code	B2
Filing date	Jul 29, 2013
Priority date	Jul 31, 2012
Publication date	Oct 16, 2018
Grant date	Oct 16, 2018

Abstract

Provided is a substrate treatment apparatus using plasma. The substrate treatment apparatus includes a housing having an inner space in which a substrate is treated, a support member disposed within the housing to support the substrate, a gas supply unit supplying a gas into the housing, a plasma source generating plasma from the gas supplied into the housing, and a baffle unit disposed to surround the support member within the housing, the baffle unit including a baffle in which through holes for exhausting the gas into the inner space of the housing are defined. The baffle is divided into a plurality of areas when viewed from an upper side, and each of portions of the plurality of areas is formed of a metallic material, and each of the other portions of the plurality of areas is formed of a nonmetallic material.

First claim

What is claimed is:

1. A substrate treatment apparatus comprising:
a housing having an inner space configured to receive a substrate;
a support member within the housing to support the substrate;
a gas supply unit configured to supply a gas into the housing;
a plasma source configured to generate plasma from the gas supplied into the housing; and
a baffle unit surrounding the support member within the housing, the baffle unit comprising a baffle in which through holes for exhausting the gas in the inner space of the housing are defined,
wherein the baffle is divided into a plurality of rings of metallic material and a plurality of rings of nonmetallic material,
wherein the plurality of rings of metallic material and the plurality of rings of nonmetallic material are concentric, horizontally adjacent, and non-overlapping when viewed from an upper side, and individual rings from among the plurality of rings of metallic material alternate with individual rings from among the plurality of rings of nonmetallic material,
wherein the through holes are defined in a boundary between each of the plurality of rings of metallic material and the plurality of rings of nonmetallic material,
wherein top surfaces of the baffle unit have a rounded shape or are upwardly inclined outward from a central area to an edge area thereof; and
wherein each of the plurality of rings of nonmetallic material is a solid material.

2. The substrate treatment apparatus of claim 1 , wherein rings from among the plurality of rings of metallic material are on both sides of each ring from among the plurality of rings of nonmetallic material.

3. The substrate treatment apparatus of claim 1 , wherein portions of the plurality of rings of metallic material and the plurality of rings of nonmetallic material have thicknesses different from each other.

4. The substrate treatment apparatus of claim 1 , wherein each ring from among the plurality of rings of metallic material and the plurality of rings of nonmetallic material has a thickness gradually increasing from a central area to an edge area thereof.

5. The substrate treatment apparatus of claim 1 , wherein the nonmetallic material comprises a dielectric substance.

6. The substrate treatment apparatus of claim 5 , wherein the baffle unit further comprises a baffle grounding plate having a top surface contacting a bottom surface of the baffle, the baffle grounding plate being connected to the housing to ground the baffle.

7. A baffle unit comprising:
a baffle defining through holes for exhausting a gas in a space configured to receive a substrate;
a grounding plate contacting the baffle to ground the baffle,
wherein the baffle is divided into a plurality of horizontally adjacent rings when viewed from an upper side, and
each individual horizontally adjacent ring alternates between solid metallic material and solid nonmetallic material,
wherein a plurality of rings of the metallic material from among the plurality of horizontally adjacent rings and a plurality of rings of the nonmetallic material from among the plurality of horizontally adjacent rings are concentric, and non-overlapping when viewed from an upper side,
wherein the through holes are defined in a boundary between each of the plurality of rings of the metallic material and the plurality of rings of the nonmetallic material,
wherein top surfaces of the baffle have a rounded shape or are upwardly inclined outward from a central area to an edge area thereof; and
wherein each of the plurality of rings of nonmetallic material is a solid material.

8. The baffle of claim 7 , wherein portions of the plurality of horizontally adjacent rings have thicknesses different from each other.

9. The baffle of claim 7 , wherein each of the plurality of horizontally adjacent rings has a thickness gradually increasing from a central area to an edge area thereof.

10. The substrate treatment apparatus of claim 1 , wherein an entry portion and an exit portion of the through holes are within the housing.

11. The baffle unit of claim 7 , wherein an entry portion and an exit portion of the through holes are within the space configured to receive the substrate.

12. A substrate treatment apparatus comprising:
a housing having an inner space configured to receive a substrate;
a support member within the housing to support the substrate;
a gas supply unit configured to supply a gas into the housing;
a plasma source configured to generate plasma from the gas supplied into the housing; and
a baffle unit surrounding the support member within the housing, the baffle unit comprising a baffle in which through holes for exhausting the gas in the inner space of the housing are defined,
wherein the baffle is divided into a plurality of horizontally adjacent non-overlapping rings when viewed from an upper side, and each individual horizontally adjacent non-overlapping ring alternates between solid metallic material and solid non-metallic material; and
wherein each of the plurality of rings of nonmetallic material is a solid material.

Assignees

• Semes Co Ltd

Inventors

• Kim Hyung Joon
• Lee Seung Pyo
• Woo Hyung Je

Classifications

• H10P95/00 Primary

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H01J37/32834

  Exhausting · CPC title

• H01L21/02 Primary

  Electricity · mapped topic

• C23C16/4412

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

• H01J37/32633 Primary

  Baffles · CPC title