System and method for imaging a secondary charged particle beam with adaptive secondary charged particle optics

Patent metadata

Field	Value
Publication number	US-10103004-B2
Application number	US-201514790950-A
Country	US
Kind code	B2
Filing date	Jul 2, 2015
Priority date	Jul 2, 2015
Publication date	Oct 16, 2018
Grant date	Oct 16, 2018

Abstract

A method of imaging a secondary charged particle beam emanating from a sample by impingement of a primary charged particle beam is provided. The method includes setting a first operating parameter to a first value. The first operating parameter is selected from a group including: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample. The method further includes controlling, while the first operating parameter is set to the first value, the excitation of a first lens and of a second lens to map the secondary charged particle beam onto a first region on an aperture plate. The first region overlaps with a first opening of the aperture plate and with a second opening of the aperture plate. The method further includes setting the first operating parameter to a second value different from the first value. The method further includes controlling, while the first operating parameter is set to the second value, the excitation of the first lens and of the second lens to map the secondary charged particle beam onto the first region on the aperture plate.

First claim

The invention claimed is:

1. A method of imaging a secondary charged particle beam emanating from a sample by impingement of a primary charged particle beam, the method comprising:
setting a first operating parameter to a first value, the first operating parameter selected from a group comprising: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample;
controlling, while the first operating parameter is set to the first value, an excitation of a first lens to a first excitation value of the first lens and an excitation of a second lens to a first excitation value of the second lens to map the secondary charged particle beam onto a region of a first size on an aperture plate in a topography detection mode, wherein the region of the first size overlaps with a first opening of the aperture plate and with a second opening of the aperture plate, wherein the first excitation value of the first lens and the first excitation value of the second lens are each controlled individually to adjust an opening angle of the secondary charged particle beam in two dimensions to provide the secondary charged particle beam onto the region of the first size, and the aperture plate separates the secondary charged particle beam into secondary charged particle sub-beams corresponding to the first opening of the aperture plate and the second opening of the aperture plate;
setting the first operating parameter to a second value different from the first value;
controlling, while the first operating parameter is set to the second value, the excitation of the first lens to a second excitation value of the first lens and the excitation of the second lens to a second excitation value of the second lens to map the secondary charged particle beam onto the region of the first size on the aperture plate in the topography detection mode, wherein the second excitation value of the first lens and the second excitation value of the second lens are each controlled individually to adjust the opening angle of the secondary charged particle beam in two dimensions to provide the secondary charged particle beam onto the region of the first size, and wherein the first excitation value of the first lens is different from the second excitation value of the first lens, and the first excitation value of the second lens is different from the second excitation value of the second lens;
setting the first operating parameter to a third value different from the first and second values; and
controlling, while the first operating parameter is set to the third value, the excitation of the first lens to a third excitation value of the first lens and the excitation of the second lens to a third excitation value of the second lens to map the secondary charged particle beam onto a region of a second size on the aperture plate in the topography detection mode, wherein the region of the second size overlaps with the first opening and with the second opening, wherein the third excitation value of the first lens and the third excitation value of the second lens are each controlled individually to adjust the opening angle of the secondary charged particle beam in two dimensions to provide the secondary charged particle beam onto the region of the second size, wherein the second size is different from the first size.

2. The method according to claim 1 , wherein the region of the first size also overlaps with a central opening of the aperture plate, wherein the first opening and the second opening are located radially outward from the central opening with respect to an optical axis that is defined by the aperture plate.

3. The method according to claim 2 , further comprising:
setting a second operating parameter to a third value, the second operating parameter selected from a group comprising: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample; and
controlling, while the second operating parameter is set to the third value, the excitation of the first lens and the excitation of the second lens to map the secondary charged particle beam onto a second region on the aperture plate, the second region fully overlapping with the central opening and being contained in the region of the first size.

4. The method of claim 1 , wherein the first operating parameter is the magnetic field strength of the objective lens, and wherein controlling the excitation of the first lens and the excitation of the second lens, while the first operating parameter is set to the second value, comprises compensating, relative to a situation where the first operating parameter is set to the first value, a Larmor rotation of the secondary charged particle beam by a magnetic field of the first lens, by a magnetic field of the second lens or by magnetic fields of both the first lens and the second lens.

Assignees

• Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh

Inventors

• Firnkes Matthias
• Lanio Stefan
• Winkler Dieter

Classifications

• H01J37/26

  Electron or ion microscopes; Electron or ion diffraction tubes · CPC title

• G01N2223/418

  electron microscope · CPC title

• H01J37/222

  Image processing arrangements associated with the tube · CPC title

• H01J2237/1202

  Associated circuits · CPC title

• G01N2223/6116

  semiconductor wafer · CPC title