Illumination system for microlithography

Patent metadata

Field	Value
Publication number	US-10088754-B2
Application number	US-201715464899-A
Country	US
Kind code	B2
Filing date	Mar 21, 2017
Priority date	Jan 29, 2009
Publication date	Oct 2, 2018
Grant date	Oct 2, 2018

Abstract

A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.

First claim

What is claimed is:

1. A raster arrangement, comprising:
at least one raster element of a first type in an illumination plane; and
at least one raster element of a second type in the illumination plane,
wherein:
each raster element of the first type has a first bundle-influencing effect;
each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect;
each raster element of the first type is located in a first area of the raster arrangement;
each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement; and
the second area of the raster arrangement comprises two subareas which are spaced apart from each other.

2. The raster arrangement of claim 1 , wherein the first area of the raster arrangement is between the two subareas of the second area of the raster arrangement.

3. The raster arrangement of claim 1 , wherein each raster element of the first type comprises an aspheric lens, and each raster element of the second type comprises an aspheric lens.

4. The raster arrangement of claim 1 , wherein a lens surface of each raster element of the first type is describable by a first aspheric equation including a first conical constant, and a lens surface of each raster element of the second type is describable by a second aspheric equation including a second conical constant.

5. The raster arrangement of claim 4 , wherein the first conical constant is different from the second conical constant.

6. The raster arrangement of claim 1 , wherein the first area of the raster arrangement is shaped as a first column, and the second area of the raster arrangement is shaped as a second column.

7. The raster arrangement of claim 1 , wherein the raster arrangement comprises a plurality of raster elements of the first type and a plurality of raster elements of the second type.

8. The raster arrangement of claim 1 , further comprising at least one raster element of a third type, wherein:
each raster element of the third type has a third bundle-influencing effect which is different from both the first and second bundle-influencing effects; and
each raster element of the third type is located in a third area of the raster arrangement which is different from both the first and second raster areas.

9. The raster arrangement of claim 8 , wherein each raster element of the first type comprises an aspheric lens, each raster element of the second type comprises an aspheric lens, and each raster element of the third type comprises an aspheric lenses.

10. The raster arrangement of claim 8 , wherein a lens surface of each raster element of the first type is describable by a first aspheric equation including a first conical constant, a lens surface of each raster element of the second type is describable by a second aspheric equation including a second conical constant, and a lens surface of each raster element of the third type is describable by a third aspheric equation including a third conical constant.

11. The raster arrangement of claim 8 , wherein the first area of the raster arrangement is shaped as a first column, the second area of the raster arrangement is shaped as a second column, and the third area of the raster arrangement is shaped as a third column.

12. The raster element of claim 8 , wherein the raster arrangement comprises a plurality of raster elements of the first type, a plurality of raster elements of the second type, and a plurality of raster elements of the third type.

13. An illumination system, comprising:
a first raster arrangement according to claim 1 ,
wherein the illumination system is a microlithography illumination system.

14. The illumination system of claim 13 , further comprising a second raster arrangement.

15. The illumination system of claim 14 , wherein the second raster arrangement comprises a raster arrangement according to claim 1 .

16. The illumination system of claim 13 , wherein the first raster arrangement is a first raster arrangement of the illumination system along a path of light through the illumination system during use of the illumination system.

17. A projection exposure apparatus, comprising:
an illumination system comprising a raster arrangement according to claim 1 ,
wherein the projection exposure apparatus is a microlithography projection exposure apparatus.

18. The projection exposure apparatus of claim 17 , further comprising a projection objective.

19. A method of using a projection exposure apparatus comprising an illumination system and a projection objective, the method comprising:
using the illumination system to illuminate a reticle; and
using the projection object to image at least a portion of the illuminated reticle onto a photosensitive material,
wherein the illumination system comprises a raster arrangement according to claim 1 .

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Scholz Axel
• Schlesener Frank
• Haverkamp Nils
• Davydenko Vladimir
• Gerhard Michael
• Ziegler Gerhard-Wilhelm
• Kern Mirco
• Bischoff Thomas
• Stammler Thomas
• Kellner Stephan
• Maul Manfred
• Walldorf Daniel
• Hurevich Igor
• Deguenther Markus

Classifications

• G02B3/0043

  Inhomogeneous or irregular arrays, e.g. varying shape, size, height · CPC title

• G03F7/70058

  Mask illumination systems · CPC title

• G03F7/70083

  Non-homogeneous intensity distribution in the mask plane · CPC title

• G03F7/70075 Primary

  Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection · CPC title

• G03F7/70191 Primary

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title