Sintered ceramic component and a process of forming the same

US10081575B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10081575-B2
Application numberUS-201715466321-A
CountryUS
Kind codeB2
Filing dateMar 22, 2017
Priority dateNov 10, 2014
Publication dateSep 25, 2018
Grant dateSep 25, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A sintered ceramic component can have a final composition including at least 50 wt. % MgO and at least one desired dopant, wherein each dopant of the at least one desired dopant has a desired dopant content of at least 0.1 wt. %. All impurities (not including the desired dopant(s)) are present at a combined impurity content of less than 0.7 wt. %. A remainder can include Al 2 O 3 . The selection of dopants can allow for better control over the visual appearance of the sintered ceramic component, reduces the presence of undesired impurities that may adversely affect another part of an apparatus, or both. The addition of the dopant(s) can help to improve the sintering characteristics and density as compared to a sintered ceramic component that includes the material with no dopant and a relatively low impurity content.

First claim

Opening claim text (preview).

What is claimed is: 1. A sintered ceramic component, comprising: at least 50 wt. % MgO; at least one dopant including CaO, TiO 2 , or a combination thereof, wherein each dopant of the at least one dopant has a dopant content of at least 0.1 wt. %, and all impurities are present at a combined impurity content of less than 0.7 wt. %, wherein the sintered ceramic component comprises MgAl 2 O 4 and has a density that is at least 90% of theoretical density; and wherein when the sintered ceramic component comprises SiO 2 , the SiO 2 is one of the impurities. 2. The sintered ceramic component of claim 1 , wherein the density is at least 94% of the theoretical density. 3. The sintered ceramic component of claim 1 , wherein MgO is in a content from 50 wt. % to 80 wt. %. 4. The sintered ceramic component of claim 1 , wherein the dopant content is in a range of 0.2 wt. % to 5 wt. %. 5. The sintered ceramic component of claim 1 , wherein the at least one dopant includes CaO. 6. The sintered ceramic component of claim 5 , wherein CaO is in a content of at least 0.2 wt. %. 7. The sintered ceramic component of claim 1 , wherein the at least one dopant includes TiO 2 . 8. The sintered ceramic component of claim 7 , wherein TiO 2 is in a content of no greater than 3 wt. %. 9. The sintered ceramic component of claim 1 , wherein the at least one dopant consists essentially of CaO, TiO 2 , or a combination thereof. 10. A sintered ceramic gas manifold, comprising; at least 50 wt. % MgO; at least one dopant including CaO, TiO 2 , or a combination thereof, wherein each dopant of the at least one dopant has a dopant content of at least 0.1 wt. %, and all impurities are present at a combined impurity content of less than 0.7 wt. %, wherein the sintered ceramic component comprises MgAl 2 O 4 and has a density that is at least 90% of theoretical density. 11. The sintered ceramic component of claim 1 , wherein the sintered ceramic component is a component of a gas-to-liquid membrane system. 12. The sintered ceramic component of claim 1 , wherein the sintered ceramic component has a coefficient of thermal expansion from 25° C. to 1200° C. in a range of 9.0 ppm/° C. to 13.0 ppm/° C. 13. A process of forming a sintered ceramic component including MgAl 2 O 4 comprising: combining a binder and at least one powder to form a green mixture, wherein the at least one powder includes: at least 50 wt. % MgO; at least one dopant material including CaO, CaCO 3 , TiO 2 , or a combination thereof, wherein each dopant material of the at least one desired dopant material has a desired content of at least 0.1 wt. %; and all impurities are present at a combined impurity content of less than 0.7 wt. %; shaping the green mixture to form an object having a shape corresponding to the sintered ceramic component; and sintering the object to form the sintered ceramic component including MgAl 2 O 4 and having a density of at least 90% of theoretical density, wherein when the sintered ceramic component comprises SiO 2 , the SiO 2 is one of the impurities. 14. The process of claim 13 , wherein the at least one powder includes a material including MgAl 2 O 4 . 15. The process of claim 13 , wherein the at least one powder includes MgO and spinel. 16. The process of claim 13 , wherein the at least one powder includes Al 2 O 3 . 17. The process of claim 13 , wherein the at least one dopant material includes CaO, CaCO 3 , or a combination thereof. 18. The process of claim 13 , wherein the at least one dopant material includes Y 2 O 3 . 19. The process of claim 13 , wherein the at least one dopant material consists essentially of CaO, CaCO 3 , TiO 2 or a combination thereof. 20. The process of claim 13 , wherein sintering is performed at a temperature less than 1600° C.

Assignees

Inventors

Classifications

  • Burning or sintering processes (C04B33/32 takes precedence {; powder metallurgy B22F}) · CPC title

  • Products characterised by the absence or the low content of specific components, e.g. alkali metal free alumina ceramics · CPC title

  • the electrolyte consisting of oxides · CPC title

  • Aluminum oxide or oxide forming salts thereof, e.g. bauxite, alpha-alumina · CPC title

  • C04B35/053Primary

    Fine ceramics · CPC title

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What does patent US10081575B2 cover?
A sintered ceramic component can have a final composition including at least 50 wt. % MgO and at least one desired dopant, wherein each dopant of the at least one desired dopant has a desired dopant content of at least 0.1 wt. %. All impurities (not including the desired dopant(s)) are present at a combined impurity content of less than 0.7 wt. %. A remainder can include Al 2 O 3 . The selectio…
Who is the assignee on this patent?
Saint Gobain Ceramics, Saint Gobain Ct Recherches, Saint Gobain Ct Recherches
What technology area does this patent fall under?
Primary CPC classification C04B35/053. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 25 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).